CN113574079B - Euv光用感光性组合物、图案形成方法及电子器件的制造方法 - Google Patents

Euv光用感光性组合物、图案形成方法及电子器件的制造方法 Download PDF

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CN113574079B
CN113574079B CN202080021545.4A CN202080021545A CN113574079B CN 113574079 B CN113574079 B CN 113574079B CN 202080021545 A CN202080021545 A CN 202080021545A CN 113574079 B CN113574079 B CN 113574079B
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group
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atom
general formula
euv light
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CN113574079A (zh
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崎田享平
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Fujifilm Corp
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Emergency Medicine (AREA)
  • Materials For Photolithography (AREA)
CN202080021545.4A 2019-03-29 2020-03-09 Euv光用感光性组合物、图案形成方法及电子器件的制造方法 Active CN113574079B (zh)

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JP2019067401 2019-03-29
JP2019-067401 2019-03-29
JP2020-030660 2020-02-26
JP2020030660 2020-02-26
PCT/JP2020/010050 WO2020203073A1 (ja) 2019-03-29 2020-03-09 Ｅｕｖ光用感光性組成物、パターン形成方法、電子デバイスの製造方法

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KR (1) KR102635086B1 (https=)
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