KR102565020B1 - 성막장치 - Google Patents

성막장치 Download PDF

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Publication number
KR102565020B1
KR102565020B1 KR1020187003080A KR20187003080A KR102565020B1 KR 102565020 B1 KR102565020 B1 KR 102565020B1 KR 1020187003080 A KR1020187003080 A KR 1020187003080A KR 20187003080 A KR20187003080 A KR 20187003080A KR 102565020 B1 KR102565020 B1 KR 102565020B1
Authority
KR
South Korea
Prior art keywords
film
film formation
plasma
chamber
vacuum chamber
Prior art date
Application number
KR1020187003080A
Other languages
English (en)
Korean (ko)
Other versions
KR20180034463A (ko
Inventor
히사시 키타미
토시유키 사케미
테쯔야 야마모토
쥰이치 노모토
Original Assignee
스미도모쥬기가이고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미도모쥬기가이고교 가부시키가이샤 filed Critical 스미도모쥬기가이고교 가부시키가이샤
Priority to KR1020207008153A priority Critical patent/KR102573358B1/ko
Priority claimed from PCT/JP2016/071438 external-priority patent/WO2017014278A1/ja
Publication of KR20180034463A publication Critical patent/KR20180034463A/ko
Application granted granted Critical
Publication of KR102565020B1 publication Critical patent/KR102565020B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
KR1020187003080A 2015-07-21 2016-07-21 성막장치 KR102565020B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020207008153A KR102573358B1 (ko) 2015-07-21 2016-07-21 음이온생성장치

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2015143798 2015-07-21
JPJP-P-2015-143798 2015-07-21
JP2016046649A JP6584982B2 (ja) 2015-07-21 2016-03-10 成膜装置
JPJP-P-2016-046649 2016-03-10
PCT/JP2016/071438 WO2017014278A1 (ja) 2015-07-21 2016-07-21 成膜装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020207008153A Division KR102573358B1 (ko) 2015-07-21 2016-07-21 음이온생성장치

Publications (2)

Publication Number Publication Date
KR20180034463A KR20180034463A (ko) 2018-04-04
KR102565020B1 true KR102565020B1 (ko) 2023-08-07

Family

ID=57945589

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187003080A KR102565020B1 (ko) 2015-07-21 2016-07-21 성막장치

Country Status (3)

Country Link
JP (1) JP6584982B2 (ja)
KR (1) KR102565020B1 (ja)
CN (1) CN107849690B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7185487B2 (ja) * 2018-03-14 2022-12-07 住友重機械工業株式会社 負イオン生成装置
US20210305016A1 (en) 2018-06-14 2021-09-30 National University Corporation Kyoto Institute Of Technology Specific type ion source and plasma film forming apparatus
JP7246628B2 (ja) * 2018-06-26 2023-03-28 住友重機械工業株式会社 成膜・イオン照射システム、及び成膜・イオン照射方法
JP7120540B2 (ja) * 2018-06-26 2022-08-17 住友重機械工業株式会社 イオン照射装置、イオン照射方法、成膜装置、及び成膜方法
JP7316770B2 (ja) * 2018-09-03 2023-07-28 住友重機械工業株式会社 成膜装置、及び膜構造体の製造装置
JP7336863B2 (ja) * 2019-03-28 2023-09-01 住友重機械工業株式会社 負イオン生成装置
JP7209572B2 (ja) * 2019-03-28 2023-01-20 住友重機械工業株式会社 負イオン生成装置
JP7313929B2 (ja) 2019-06-26 2023-07-25 住友重機械工業株式会社 負イオン照射装置
KR20210006108A (ko) 2019-07-08 2021-01-18 스미도모쥬기가이고교 가부시키가이샤 부이온생성장치
TWI756742B (zh) * 2019-07-09 2022-03-01 日商住友重機械工業股份有限公司 負離子生成裝置
TWI700967B (zh) * 2019-07-09 2020-08-01 日商住友重機械工業股份有限公司 負離子生成裝置
CN112226734A (zh) * 2019-07-15 2021-01-15 住友重机械工业株式会社 负离子生成装置
KR102180979B1 (ko) * 2019-08-19 2020-11-19 참엔지니어링(주) 처리 장치 및 방법
JP7349910B2 (ja) 2019-12-27 2023-09-25 住友重機械工業株式会社 負イオン生成装置、及び負イオン生成方法
JP7404119B2 (ja) * 2020-03-19 2023-12-25 住友重機械工業株式会社 負イオン生成装置
US11915910B2 (en) * 2021-03-25 2024-02-27 Tokyo Electron Limited Fast neutral generation for plasma processing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS571586B2 (ja) * 1974-05-22 1982-01-12
JPH0674767B2 (ja) * 1984-07-18 1994-09-21 富士重工業株式会社 エンジンのアイドル回転数制御方法
JPH0417669A (ja) * 1990-05-08 1992-01-22 Jeol Ltd プラズマを用いた成膜方法およびｒｆイオンプレーティング装置
JPH06128732A (ja) * 1992-10-15 1994-05-10 Ricoh Co Ltd 薄膜形成装置および薄膜形成方法
JPH0980200A (ja) * 1995-09-08 1997-03-28 Nissin Electric Co Ltd イオン発生装置
JP2823834B2 (ja) * 1996-03-28 1998-11-11 中外炉工業株式会社 蒸着装置におけるるつぼ部機構
JPH11273894A (ja) * 1998-03-23 1999-10-08 Jeol Ltd 薄膜形成装置
JP2000282226A (ja) 1999-04-01 2000-10-10 Nippon Sheet Glass Co Ltd 真空成膜装置及び方法
JP3765990B2 (ja) * 2001-03-16 2006-04-12 住友重機械工業株式会社 導体の形成方法及び装置
JP4339562B2 (ja) * 2002-09-06 2009-10-07 住友重機械工業株式会社 イオンプレーティング方法およびその装置
CN101298667A (zh) * 2003-01-31 2008-11-05 东京毅力科创株式会社 半导体处理用的成膜方法
JP4613050B2 (ja) * 2004-11-04 2011-01-12 大日本印刷株式会社 圧力勾配型イオンプレーティング式成膜装置
CN203049026U (zh) * 2013-01-23 2013-07-10 中国科学院金属研究所 一种低温低损伤多功能复合镀膜的装置
JP5951542B2 (ja) * 2013-03-28 2016-07-13 住友重機械工業株式会社 成膜装置

Also Published As

Publication number Publication date
KR20180034463A (ko) 2018-04-04
CN107849690A (zh) 2018-03-27
CN107849690B (zh) 2020-02-18
JP2017025407A (ja) 2017-02-02
JP6584982B2 (ja) 2019-10-02

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