KR102512456B1 - 기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램 - Google Patents

기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램 Download PDF

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Publication number
KR102512456B1
KR102512456B1 KR1020217000321A KR20217000321A KR102512456B1 KR 102512456 B1 KR102512456 B1 KR 102512456B1 KR 1020217000321 A KR1020217000321 A KR 1020217000321A KR 20217000321 A KR20217000321 A KR 20217000321A KR 102512456 B1 KR102512456 B1 KR 102512456B1
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KR
South Korea
Prior art keywords
substrate processing
correlation curve
reaction chamber
processing system
monitored
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KR1020217000321A
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English (en)
Korean (ko)
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KR20210019057A (ko
Inventor
유키나오 카가
카즈요시 야마모토
히데모토 하야시하라
카즈히데 아사이
Original Assignee
가부시키가이샤 코쿠사이 엘렉트릭
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Publication of KR20210019057A publication Critical patent/KR20210019057A/ko
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Publication of KR102512456B1 publication Critical patent/KR102512456B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0221—Preprocessing measurements, e.g. data collection rate adjustment; Standardization of measurements; Time series or signal analysis, e.g. frequency analysis or wavelets; Trustworthiness of measurements; Indexes therefor; Measurements using easily measured parameters to estimate parameters difficult to measure; Virtual sensor creation; De-noising; Sensor fusion; Unconventional preprocessing inherently present in specific fault detection methods like PCA-based methods
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/0227—Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions
    • G05B23/0235—Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions based on a comparison with predetermined threshold or range, e.g. "classical methods", carried out during normal operation; threshold adaptation or choice; when or how to compare with the threshold
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0267—Fault communication, e.g. human machine interface [HMI]
    • G05B23/027—Alarm generation, e.g. communication protocol; Forms of alarm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Human Computer Interaction (AREA)
KR1020217000321A 2018-09-18 2018-09-18 기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램 KR102512456B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2018/034419 WO2020059011A1 (ja) 2018-09-18 2018-09-18 基板処理装置、半導体装置の製造方法およびプログラム

Publications (2)

Publication Number Publication Date
KR20210019057A KR20210019057A (ko) 2021-02-19
KR102512456B1 true KR102512456B1 (ko) 2023-03-20

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Application Number Title Priority Date Filing Date
KR1020217000321A KR102512456B1 (ko) 2018-09-18 2018-09-18 기판 처리 장치, 반도체 장치의 제조 방법 및 프로그램

Country Status (4)

Country Link
JP (1) JP7186236B2 (zh)
KR (1) KR102512456B1 (zh)
CN (1) CN112740358B (zh)
WO (1) WO2020059011A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114200879A (zh) * 2021-12-08 2022-03-18 长江存储科技有限责任公司 气体泄露监测方法及装置、计算机存储介质
JP2023103123A (ja) * 2022-01-13 2023-07-26 株式会社Ｓｃｒｅｅｎホールディングス 適正判定装置および適正判定方法
JP2023132914A (ja) * 2022-03-11 2023-09-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置管理システム、管理装置、基板処理装置、基板処理装置管理方法および基板処理装置管理プログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007088035A (ja) 2005-09-20 2007-04-05 Toshiba Corp 工程制御システム、工程制御方法及び電子装置の製造方法
JP2011014658A (ja) 2009-06-30 2011-01-20 Canon Anelva Corp 電子部品製造装置、アラーム通知プログラム、及びアラーム通知システム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004152999A (ja) * 2002-10-30 2004-05-27 Matsushita Electric Ind Co Ltd プラズマ処理方法およびプラズマ処理装置
JP4882239B2 (ja) * 2005-02-16 2012-02-22 東京エレクトロン株式会社 半導体製造装置、コンピュータプログラム及び記憶媒体
US7751921B2 (en) * 2004-12-28 2010-07-06 Tokyo Electron Limited Semiconductor manufacturing apparatus, method of detecting abnormality, identifying cause of abnormality, or predicting abnormality in the semiconductor manufacturing apparatus, and storage medium storing computer program for performing the method
KR20150055180A (ko) * 2013-11-12 2015-05-21 (주)플러스비젼 유량 제어 모니터링 장치 및 그 방법
JP2016115738A (ja) * 2014-12-12 2016-06-23 東京エレクトロン株式会社 エッチング処理方法及びベベルエッチング装置
JP6484525B2 (ja) * 2015-08-03 2019-03-13 東芝三菱電機産業システム株式会社 警報装置およびプロセス制御システム
WO2017168676A1 (ja) 2016-03-31 2017-10-05 株式会社日立国際電気 基板処理装置、装置管理コントローラ及び記録媒体
JP6594931B2 (ja) 2016-10-31 2019-10-23 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、監視プログラム及び半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007088035A (ja) 2005-09-20 2007-04-05 Toshiba Corp 工程制御システム、工程制御方法及び電子装置の製造方法
JP2011014658A (ja) 2009-06-30 2011-01-20 Canon Anelva Corp 電子部品製造装置、アラーム通知プログラム、及びアラーム通知システム

Also Published As

Publication number Publication date
JPWO2020059011A1 (ja) 2021-08-30
KR20210019057A (ko) 2021-02-19
CN112740358B (zh) 2024-03-08
JP7186236B2 (ja) 2022-12-08
CN112740358A (zh) 2021-04-30
WO2020059011A1 (ja) 2020-03-26

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