KR102476609B1 - 연마방법 및 연마장치 - Google Patents

연마방법 및 연마장치 Download PDF

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Publication number
KR102476609B1
KR102476609B1 KR1020180065801A KR20180065801A KR102476609B1 KR 102476609 B1 KR102476609 B1 KR 102476609B1 KR 1020180065801 A KR1020180065801 A KR 1020180065801A KR 20180065801 A KR20180065801 A KR 20180065801A KR 102476609 B1 KR102476609 B1 KR 102476609B1
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KR
South Korea
Prior art keywords
polishing
holding
holding plate
polishing head
plate
Prior art date
Application number
KR1020180065801A
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English (en)
Korean (ko)
Other versions
KR20180135412A (ko
Inventor
아츠시 와타나베
카츠야 요코카와
히로타카 쿠리모토
Original Assignee
신에쯔 한도타이 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 신에쯔 한도타이 가부시키가이샤 filed Critical 신에쯔 한도타이 가부시키가이샤
Publication of KR20180135412A publication Critical patent/KR20180135412A/ko
Application granted granted Critical
Publication of KR102476609B1 publication Critical patent/KR102476609B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/005—Control means for lapping machines or devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/12—Lapping plates for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
KR1020180065801A 2017-06-12 2018-06-08 연마방법 및 연마장치 KR102476609B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017115077A JP6312229B1 (ja) 2017-06-12 2017-06-12 研磨方法及び研磨装置
JPJP-P-2017-115077 2017-06-12

Publications (2)

Publication Number Publication Date
KR20180135412A KR20180135412A (ko) 2018-12-20
KR102476609B1 true KR102476609B1 (ko) 2022-12-12

Family

ID=61968269

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020180065801A KR102476609B1 (ko) 2017-06-12 2018-06-08 연마방법 및 연마장치

Country Status (4)

Country Link
JP (1) JP6312229B1 (zh)
KR (1) KR102476609B1 (zh)
CN (1) CN109015115B (zh)
TW (1) TWI763844B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7363978B1 (ja) 2022-07-04 2023-10-18 株式会社Sumco ウェーハ研磨条件の決定方法、ウェーハの製造方法およびウェーハ片面研磨システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002222784A (ja) 2001-01-24 2002-08-09 Toshiba Mach Co Ltd 平面研磨方法及び平面研磨装置
JP2004239718A (ja) 2003-02-05 2004-08-26 Shin Etsu Handotai Co Ltd バッキングパッドの形状測定方法及び被加工物の研磨方法、並びにバッキングパッドの形状測定装置

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US4313284A (en) * 1980-03-27 1982-02-02 Monsanto Company Apparatus for improving flatness of polished wafers
JP2535943B2 (ja) * 1987-08-31 1996-09-18 大同特殊鋼株式会社 自動車トンネルの排ガス除塵装置
JP2560611B2 (ja) 1993-07-26 1996-12-04 日本電気株式会社 保護膜およびその製造方法
JPH0740231A (ja) * 1993-07-30 1995-02-10 Sumitomo Sitix Corp 半導体ウェーハの研磨方法および研磨装置
JPH07307317A (ja) * 1994-05-16 1995-11-21 Nippon Steel Corp 半導体ウェーハ研磨装置
JPH07314327A (ja) * 1994-05-20 1995-12-05 Sony Corp ウエハ研磨装置およびその方法
TW400567B (en) * 1995-04-10 2000-08-01 Matsushita Electric Ind Co Ltd The polishing device and its polishing method for the substrate
JPH09193003A (ja) * 1996-01-16 1997-07-29 Nippon Steel Corp 研磨装置
JPH1058315A (ja) * 1996-08-20 1998-03-03 Sony Corp 研磨装置及び研磨方法
JP4033632B2 (ja) * 1999-02-02 2008-01-16 株式会社荏原製作所 基板把持装置及び研磨装置
JP3926565B2 (ja) * 1999-03-19 2007-06-06 富士通株式会社 研磨装置、研磨方法及び磁気ヘッドの製造方法
DE60128768T2 (de) * 2000-01-31 2007-10-11 Shin-Etsu Handotai Co., Ltd. Polierverfahren und vorrichtung
JP2003260644A (ja) * 2002-03-07 2003-09-16 Asahi Glass Co Ltd 板状体の加工方法および加工装置
WO2004087371A1 (ja) * 2003-03-31 2004-10-14 Fujitsu Limited 加工方法及び装置
JP2005332982A (ja) * 2004-05-20 2005-12-02 Renesas Technology Corp 半導体装置の製造方法
JP5001877B2 (ja) * 2008-02-26 2012-08-15 株式会社ディスコ 板状物搬送装置および板状物搬送方法
JP2010056366A (ja) * 2008-08-29 2010-03-11 Showa Denko Kk ウェーハの研削装置及び半導体発光素子の製造方法
JP2013004928A (ja) * 2011-06-21 2013-01-07 Shin Etsu Handotai Co Ltd 研磨ヘッド、研磨装置及びワークの研磨方法
JP2014053356A (ja) * 2012-09-05 2014-03-20 Disco Abrasive Syst Ltd ウエーハの加工方法
JP5870960B2 (ja) * 2013-05-16 2016-03-01 信越半導体株式会社 ワークの研磨装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002222784A (ja) 2001-01-24 2002-08-09 Toshiba Mach Co Ltd 平面研磨方法及び平面研磨装置
JP2004239718A (ja) 2003-02-05 2004-08-26 Shin Etsu Handotai Co Ltd バッキングパッドの形状測定方法及び被加工物の研磨方法、並びにバッキングパッドの形状測定装置

Also Published As

Publication number Publication date
TW201902618A (zh) 2019-01-16
CN109015115B (zh) 2021-08-31
JP2019000917A (ja) 2019-01-10
JP6312229B1 (ja) 2018-04-18
TWI763844B (zh) 2022-05-11
CN109015115A (zh) 2018-12-18
KR20180135412A (ko) 2018-12-20

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