KR102438896B1 - 기판 액처리 장치 - Google Patents

기판 액처리 장치 Download PDF

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Publication number
KR102438896B1
KR102438896B1 KR1020150144634A KR20150144634A KR102438896B1 KR 102438896 B1 KR102438896 B1 KR 102438896B1 KR 1020150144634 A KR1020150144634 A KR 1020150144634A KR 20150144634 A KR20150144634 A KR 20150144634A KR 102438896 B1 KR102438896 B1 KR 102438896B1
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KR
South Korea
Prior art keywords
liquid
arm
cleaning
nozzle
processing
Prior art date
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Active
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KR1020150144634A
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English (en)
Korean (ko)
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KR20160047394A (ko
Inventor
시게히사 이노우에
지로 히가시지마
마사미 아키모토
Original Assignee
도쿄엘렉트론가부시키가이샤
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Publication of KR20160047394A publication Critical patent/KR20160047394A/ko
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Publication of KR102438896B1 publication Critical patent/KR102438896B1/ko
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    • H01L21/02052—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0221—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
    • B05B13/0228—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts the movement of the objects being rotative
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/70—Arrangements for moving spray heads automatically to or from the working position
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H01L21/67051—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1020150144634A 2014-10-22 2015-10-16 기판 액처리 장치 Active KR102438896B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2014-214944 2014-10-22
JP2014214944A JP6331961B2 (ja) 2014-10-22 2014-10-22 基板液処理装置

Publications (2)

Publication Number Publication Date
KR20160047394A KR20160047394A (ko) 2016-05-02
KR102438896B1 true KR102438896B1 (ko) 2022-08-31

Family

ID=55792559

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150144634A Active KR102438896B1 (ko) 2014-10-22 2015-10-16 기판 액처리 장치

Country Status (3)

Country Link
US (1) US9508569B2 (https=)
JP (1) JP6331961B2 (https=)
KR (1) KR102438896B1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10786835B2 (en) * 2015-06-29 2020-09-29 Hitachi High-Tech Corporation Ultrasonic cleaner and automatic analyzer using the same
US20170084470A1 (en) * 2015-09-18 2017-03-23 Tokyo Electron Limited Substrate processing apparatus and cleaning method of processing chamber
JP6473409B2 (ja) * 2015-11-10 2019-02-20 株式会社Ｓｃｒｅｅｎホールディングス ノズル待機装置および基板処理装置
US10388537B2 (en) * 2016-04-15 2019-08-20 Samsung Electronics Co., Ltd. Cleaning apparatus, chemical mechanical polishing system including the same, cleaning method after chemical mechanical polishing, and method of manufacturing semiconductor device including the same
KR20170128801A (ko) 2016-05-16 2017-11-24 삼성전자주식회사 기판 세정 방법 및 이를 수행하기 위한 장치
WO2018030255A1 (ja) * 2016-08-09 2018-02-15 近藤工業株式会社 半導体製造装置
JP6865008B2 (ja) * 2016-09-30 2021-04-28 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
JP6793048B2 (ja) * 2017-01-27 2020-12-02 東京エレクトロン株式会社 基板処理装置、ダミーディスペンス方法及びコンピュータ読み取り可能な記録媒体
IT201800002124A1 (it) * 2018-01-29 2019-07-29 Corob Spa Dispositivo pulitore e relativo metodo
US20210039127A1 (en) * 2018-01-29 2021-02-11 Corob S.P.A. Cleaning device and corresponding method
JP7236318B2 (ja) * 2019-04-26 2023-03-09 東京エレクトロン株式会社 液処理装置、及び液処理方法
US11256180B2 (en) * 2019-04-29 2022-02-22 Taiwan Semiconductor Manufacturing Co., Ltd. Processing apparatus and method thereof
US11534804B2 (en) * 2019-07-31 2022-12-27 Illinois Tool Works Inc. Systems and methods to clean a continuous substrate
CN112676065A (zh) * 2020-12-17 2021-04-20 江西环境工程职业学院 一种家具喷涂装置
JP7560354B2 (ja) 2020-12-28 2024-10-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
KR20230080839A (ko) * 2021-11-30 2023-06-07 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
JP7782313B2 (ja) * 2022-02-28 2025-12-09 Ａｇｃ株式会社 洗浄槽、洗浄機、洗浄方法、ガラス基板の製造方法、およびｅｕｖｌ用マスクブランクの製造方法
KR102875958B1 (ko) * 2023-12-28 2025-10-24 세메스 주식회사 기판 처리 방법 및 장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005205329A (ja) * 2004-01-23 2005-08-04 Tokyo Electron Ltd 塗布装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04367214A (ja) * 1991-06-14 1992-12-18 Fujitsu Ltd レジスト現像装置および方法
JP3808649B2 (ja) * 1998-12-10 2006-08-16 大日本スクリーン製造株式会社 基板処理装置
JP3836305B2 (ja) * 2000-07-24 2006-10-25 東京エレクトロン株式会社 現像処理装置
JP3713447B2 (ja) * 2001-04-05 2005-11-09 東京エレクトロン株式会社 現像処理装置
JP4011900B2 (ja) 2001-12-04 2007-11-21 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP5694118B2 (ja) 2011-01-18 2015-04-01 東京エレクトロン株式会社 液処理装置および液処理方法
JP5734705B2 (ja) * 2011-03-02 2015-06-17 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP6014312B2 (ja) 2011-07-20 2016-10-25 株式会社Ｓｃｒｅｅｎホールディングス 洗浄処理方法
KR101870664B1 (ko) * 2011-08-04 2018-06-26 세메스 주식회사 기판처리장치
US9082802B2 (en) * 2011-11-28 2015-07-14 Macronix International Co., Ltd. Wafer centering hardware design and process
JP2013211367A (ja) * 2012-03-30 2013-10-10 Dainippon Screen Mfg Co Ltd 処理液供給装置およびその処理液供給装置を備えた基板処理装置および基板処理方法
JP5965729B2 (ja) * 2012-05-31 2016-08-10 東京エレクトロン株式会社 ノズル洗浄装置、ノズル洗浄方法および基板処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005205329A (ja) * 2004-01-23 2005-08-04 Tokyo Electron Ltd 塗布装置

Also Published As

Publication number Publication date
JP2016082177A (ja) 2016-05-16
JP6331961B2 (ja) 2018-05-30
US20160118275A1 (en) 2016-04-28
KR20160047394A (ko) 2016-05-02
US9508569B2 (en) 2016-11-29

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