KR102426267B1 - 펌프, 펌프 장치 및 액 공급 시스템 - Google Patents
펌프, 펌프 장치 및 액 공급 시스템 Download PDFInfo
- Publication number
- KR102426267B1 KR102426267B1 KR1020150146396A KR20150146396A KR102426267B1 KR 102426267 B1 KR102426267 B1 KR 102426267B1 KR 1020150146396 A KR1020150146396 A KR 1020150146396A KR 20150146396 A KR20150146396 A KR 20150146396A KR 102426267 B1 KR102426267 B1 KR 102426267B1
- Authority
- KR
- South Korea
- Prior art keywords
- tube
- liquid
- pump
- housing
- unit
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Reciprocating Pumps (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2014-216312 | 2014-10-23 | ||
JP2014216312 | 2014-10-23 | ||
JPJP-P-2015-144946 | 2015-07-22 | ||
JP2015144946A JP6442377B2 (ja) | 2014-10-23 | 2015-07-22 | ポンプ装置セット及び液供給システム |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160047997A KR20160047997A (ko) | 2016-05-03 |
KR102426267B1 true KR102426267B1 (ko) | 2022-07-28 |
Family
ID=55971676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020150146396A KR102426267B1 (ko) | 2014-10-23 | 2015-10-21 | 펌프, 펌프 장치 및 액 공급 시스템 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6442377B2 (ja) |
KR (1) | KR102426267B1 (ja) |
TW (1) | TWI623355B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6809887B2 (ja) * | 2016-12-12 | 2021-01-06 | 株式会社リコー | 流体搬送システム、画像形成装置及び流体搬送方法 |
JP6966265B2 (ja) * | 2017-08-31 | 2021-11-10 | 株式会社Screenホールディングス | ポンプ装置、処理液供給装置、基板処理装置、液抜き方法および液置換方法 |
JP7042639B2 (ja) * | 2018-02-07 | 2022-03-28 | 株式会社コガネイ | 液体供給装置 |
CN114930027A (zh) * | 2019-12-27 | 2022-08-19 | 学校法人中央大学 | 泵单元、泵以及输送物的特性检测方法 |
JP2022105836A (ja) | 2021-01-05 | 2022-07-15 | 東京エレクトロン株式会社 | 液供給装置、液供給方法及びコンピュータ記憶媒体 |
KR102666311B1 (ko) | 2022-04-05 | 2024-05-16 | 세메스 주식회사 | 펌프, 액 공급장치 및 기판처리장치 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001520723A (ja) * | 1998-02-05 | 2001-10-30 | バクスター インターナショナル インコーポレイテッド | 精度を向上させた蠕動ポンプのためのチューブ復元バンパー |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6197597U (ja) * | 1985-11-15 | 1986-06-23 | ||
JPH07324680A (ja) * | 1994-05-30 | 1995-12-12 | Hitachi Ltd | 流動体供給方法および装置 |
JPH09183467A (ja) * | 1995-12-29 | 1997-07-15 | Umezawa Seisakusho:Kk | 吐出用容器装置 |
TWM243720U (en) * | 2003-07-02 | 2004-09-11 | Wan-Chiuan Tzeng | Wireless transmission device between computer and computer peripheral equipment |
JP4124712B2 (ja) * | 2003-09-11 | 2008-07-23 | 株式会社コガネイ | 薬液供給用の可撓性チューブ |
TWI281457B (en) * | 2004-12-31 | 2007-05-21 | Ind Tech Res Inst | Microfluidic driving and speed controlling apparatus and application thereof |
JP4425807B2 (ja) * | 2005-02-02 | 2010-03-03 | 東京エレクトロン株式会社 | 塗布液供給装置および塗布処理装置 |
JP4794401B2 (ja) * | 2006-09-28 | 2011-10-19 | シャープ株式会社 | マイクロポンプ及びそれを備えた徐放装置 |
JP5018255B2 (ja) | 2007-06-07 | 2012-09-05 | 東京エレクトロン株式会社 | 薬液供給システム及び薬液供給方法並びに記憶媒体 |
JP5416672B2 (ja) * | 2010-09-28 | 2014-02-12 | 株式会社コガネイ | 薬液供給装置 |
TWM405643U (en) * | 2010-12-17 | 2011-06-11 | jun-ming Lai | Light emitting diode spraying device |
JP5255660B2 (ja) | 2011-01-18 | 2013-08-07 | 東京エレクトロン株式会社 | 薬液供給方法及び薬液供給システム |
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2015
- 2015-07-22 JP JP2015144946A patent/JP6442377B2/ja active Active
- 2015-10-19 TW TW104134145A patent/TWI623355B/zh active
- 2015-10-21 KR KR1020150146396A patent/KR102426267B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001520723A (ja) * | 1998-02-05 | 2001-10-30 | バクスター インターナショナル インコーポレイテッド | 精度を向上させた蠕動ポンプのためのチューブ復元バンパー |
Also Published As
Publication number | Publication date |
---|---|
KR20160047997A (ko) | 2016-05-03 |
TW201632266A (zh) | 2016-09-16 |
TWI623355B (zh) | 2018-05-11 |
JP6442377B2 (ja) | 2018-12-19 |
JP2016084803A (ja) | 2016-05-19 |
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