KR102329391B1 - 광경화성 수지 조성물, 이 조성물로 형성되는 경화 피막 및 피막을 갖는 기재와, 경화 피막 및 피막을 갖는 기재의 제조방법 - Google Patents
광경화성 수지 조성물, 이 조성물로 형성되는 경화 피막 및 피막을 갖는 기재와, 경화 피막 및 피막을 갖는 기재의 제조방법 Download PDFInfo
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- KR102329391B1 KR102329391B1 KR1020170084058A KR20170084058A KR102329391B1 KR 102329391 B1 KR102329391 B1 KR 102329391B1 KR 1020170084058 A KR1020170084058 A KR 1020170084058A KR 20170084058 A KR20170084058 A KR 20170084058A KR 102329391 B1 KR102329391 B1 KR 102329391B1
- Authority
- KR
- South Korea
- Prior art keywords
- photocurable resin
- resin composition
- meth
- acrylate
- cured film
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 107
- 239000000463 material Substances 0.000 title claims description 30
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000203 mixture Substances 0.000 title description 26
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 104
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 77
- 239000002245 particle Substances 0.000 claims abstract description 75
- 239000000178 monomer Substances 0.000 claims abstract description 38
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims abstract description 34
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 34
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims abstract description 33
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- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000011737 fluorine Substances 0.000 claims abstract description 14
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- 239000007787 solid Substances 0.000 claims description 40
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- 239000000758 substrate Substances 0.000 claims description 17
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- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 13
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- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 10
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- 239000006096 absorbing agent Substances 0.000 claims description 6
- HIFVAOIJYDXIJG-UHFFFAOYSA-N benzylbenzene;isocyanic acid Chemical class N=C=O.N=C=O.C=1C=CC=CC=1CC1=CC=CC=C1 HIFVAOIJYDXIJG-UHFFFAOYSA-N 0.000 claims description 6
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
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- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 1
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- 230000001771 impaired effect Effects 0.000 description 1
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- 230000005764 inhibitory process Effects 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
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- 150000002576 ketones Chemical class 0.000 description 1
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- 238000000691 measurement method Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
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- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
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- YLHXLHGIAMFFBU-UHFFFAOYSA-N methyl phenylglyoxalate Chemical compound COC(=O)C(=O)C1=CC=CC=C1 YLHXLHGIAMFFBU-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
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- 229920006289 polycarbonate film Polymers 0.000 description 1
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- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
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- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
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- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
- C08F290/147—Polyurethanes; Polyureas
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/74—Polyisocyanates or polyisothiocyanates cyclic
- C08G18/76—Polyisocyanates or polyisothiocyanates cyclic aromatic
- C08G18/7657—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
- C08G18/7664—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
- C08G18/7671—Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups containing only one alkylene bisphenyl group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
- C08K5/3475—Five-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/16—Solid spheres
- C08K7/18—Solid spheres inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/002—Physical properties
- C08K2201/005—Additives being defined by their particle size in general
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
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| JPJP-P-2016-136286 | 2016-07-08 | ||
| JP2016136286A JP6822792B2 (ja) | 2016-07-08 | 2016-07-08 | 光硬化性樹脂組成物、該組成物から形成される硬化被膜および被膜付き基材、並びに硬化被膜および被膜付き基材の製造方法 |
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| KR20180006309A KR20180006309A (ko) | 2018-01-17 |
| KR102329391B1 true KR102329391B1 (ko) | 2021-11-22 |
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| KR (1) | KR102329391B1 (ja) |
| CN (1) | CN107586511B (ja) |
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| CN112088171B (zh) * | 2018-05-30 | 2023-08-01 | 三键有限公司 | 光固化性组合物及其固化物 |
| JP6811215B2 (ja) * | 2018-08-08 | 2021-01-13 | パーカーアサヒ株式会社 | アクリルゾル組成物 |
| CN113423749A (zh) * | 2019-02-06 | 2021-09-21 | 日产化学株式会社 | 防眩性硬涂用固化性组合物 |
| JP7332988B2 (ja) * | 2019-02-06 | 2023-08-24 | 日産化学株式会社 | 耐光性ハードコート用硬化性組成物 |
| JP7420595B2 (ja) * | 2020-03-03 | 2024-01-23 | アイカ工業株式会社 | 光硬化性塗料組成物 |
| CN115135727B (zh) * | 2020-04-28 | 2023-07-18 | 东曹硅化工株式会社 | 能量射线固化型涂料消光用疏水性硅胶 |
| WO2022025175A1 (ja) * | 2020-07-30 | 2022-02-03 | 中国塗料株式会社 | 光硬化性樹脂組成物、硬化被膜、および硬化被膜付き成形品 |
| JP7428668B2 (ja) * | 2021-01-20 | 2024-02-06 | 株式会社豊田自動織機 | 樹脂ガラス用コーティング剤および樹脂ガラス |
| BR112023010175A2 (pt) * | 2021-04-08 | 2023-11-07 | Sun Chemical Corp | Tinta curável, composição, artigo impresso, laminado, método para fabricar a tinta ou revestimento, método de impressão da tinta ou revestimento e uso da tinta ou revestimento |
| CN114591639B (zh) * | 2022-03-10 | 2023-04-18 | 宁波惠之星新材料科技股份有限公司 | 用于制备uv阻隔膜的原料组合物、涂液、uv阻隔膜及光学膜组件 |
| JP7343023B1 (ja) * | 2022-09-30 | 2023-09-12 | 大日本印刷株式会社 | 光学フィルム、並びに、前記光学フィルムを用いた偏光板、表面板、画像表示パネル及び画像表示装置、並びに、前記光学フィルムの製造方法、並びに、光学フィルムの選定方法 |
| JP7343024B1 (ja) * | 2022-09-30 | 2023-09-12 | 大日本印刷株式会社 | 光学フィルム、並びに、前記光学フィルムを用いた偏光板、表面板、画像表示パネル及び画像表示装置、並びに、前記光学フィルムの製造方法、並びに、光学フィルムの選定方法、並びに、指紋拭き取り性の評価方法 |
| CN115851111A (zh) * | 2022-12-29 | 2023-03-28 | 宁波惠之星新材料科技股份有限公司 | 一种保护层涂料及保护膜 |
| JP7454777B1 (ja) | 2023-08-23 | 2024-03-25 | ａｒｔｉｅｎｃｅ株式会社 | 透明基材上にハードコート層を形成するための活性エネルギー線硬化性組成物、それを用いたハードコートフィルムおよびその積層体。 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103952073A (zh) * | 2014-05-14 | 2014-07-30 | 张家港康得新光电材料有限公司 | 防眩光用涂料及其制备方法 |
| CN105733434A (zh) * | 2014-12-26 | 2016-07-06 | 中国涂料株式会社 | 光固化性树脂组合物、及固化膜、带膜基材及其制造方法 |
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| JP4159314B2 (ja) | 2002-06-28 | 2008-10-01 | 大日本印刷株式会社 | 防眩フィルム |
| JP4199679B2 (ja) * | 2004-01-07 | 2008-12-17 | 株式会社日本触媒 | 吸水性樹脂組成物およびその製造方法、並びに、それらを用いた吸収体、吸収性物品 |
| KR101574351B1 (ko) * | 2008-09-16 | 2015-12-03 | 닛본 페인트 홀딩스 가부시키가이샤 | 내지문성 광경화성 조성물 및 내지문성 코팅층이 설치된 도장물 |
| WO2014077205A1 (ja) * | 2012-11-13 | 2014-05-22 | 中国塗料株式会社 | 防汚塗料組成物、防汚塗膜、防汚基材、および防汚塗料組成物の貯蔵安定性の改善方法 |
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