KR102327569B1 - 표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 - Google Patents

표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 Download PDF

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KR102327569B1
KR102327569B1 KR1020177026238A KR20177026238A KR102327569B1 KR 102327569 B1 KR102327569 B1 KR 102327569B1 KR 1020177026238 A KR1020177026238 A KR 1020177026238A KR 20177026238 A KR20177026238 A KR 20177026238A KR 102327569 B1 KR102327569 B1 KR 102327569B1
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moiety
integer
block
block copolymer
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KR20170140171A (ko
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앤킷 보라
에리 히라하라
조이 쳉
두라이라즈 바스카란
오레스트 폴리슈츄크
멜리아 티지오
마가레타 파네스쿠
다니엘 샌더스
광양 린
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리지필드 액퀴지션
인터내셔널 비지네스 머신즈 코포레이션
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
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    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
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    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/06Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
    • C08G63/08Lactones or lactides
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    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/64Polyesters containing both carboxylic ester groups and carbonate groups
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
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    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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    • C09D167/00Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
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    • C09D169/00Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
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    • C09D187/00Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • C09D187/005Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
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    • C08F2438/00Living radical polymerisation
    • C08F2438/01Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
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    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/04Polyesters derived from hydroxy carboxylic acids, e.g. lactones
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08J2369/00Characterised by the use of polycarbonates; Derivatives of polycarbonates

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  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polyethers (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
KR1020177026238A 2015-02-20 2016-02-18 표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 Active KR102327569B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/628,002 2015-02-20
US14/628,002 US10259907B2 (en) 2015-02-20 2015-02-20 Block copolymers with surface-active junction groups, compositions and processes thereof
PCT/EP2016/053415 WO2016131900A1 (en) 2015-02-20 2016-02-18 Block copolymers with surface-active junction groups, compositions and processes thereof

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KR20170140171A KR20170140171A (ko) 2017-12-20
KR102327569B1 true KR102327569B1 (ko) 2021-11-17

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US (1) US10259907B2 (enExample)
EP (1) EP3259292B1 (enExample)
JP (2) JP6978318B2 (enExample)
KR (1) KR102327569B1 (enExample)
CN (1) CN107257813B (enExample)
IL (1) IL253371A0 (enExample)
SG (1) SG11201705648TA (enExample)
TW (1) TWI713494B (enExample)
WO (1) WO2016131900A1 (enExample)

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KR102136470B1 (ko) * 2018-12-24 2020-07-22 (주)서영 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법
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KR20230119186A (ko) * 2020-12-17 2023-08-16 메르크 파텐트 게엠베하 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용
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KR20240064273A (ko) * 2022-11-04 2024-05-13 주식회사 엘지화학 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자

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JP6978318B2 (ja) 2021-12-08
SG11201705648TA (en) 2017-08-30
JP2018507301A (ja) 2018-03-15
IL253371A0 (en) 2017-09-28
CN107257813B (zh) 2020-08-21
WO2016131900A1 (en) 2016-08-25
CN107257813A (zh) 2017-10-17
US10259907B2 (en) 2019-04-16
JP7089618B2 (ja) 2022-06-22
JP2021130821A (ja) 2021-09-09
EP3259292B1 (en) 2020-04-08
US20160244557A1 (en) 2016-08-25
KR20170140171A (ko) 2017-12-20
EP3259292A1 (en) 2017-12-27
TWI713494B (zh) 2020-12-21
TW201638125A (zh) 2016-11-01

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