KR102327569B1 - 표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 - Google Patents
표면-활성 접합 기를 가진 블록 공중합체, 이의 조성물 및 방법 Download PDFInfo
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- KR102327569B1 KR102327569B1 KR1020177026238A KR20177026238A KR102327569B1 KR 102327569 B1 KR102327569 B1 KR 102327569B1 KR 1020177026238 A KR1020177026238 A KR 1020177026238A KR 20177026238 A KR20177026238 A KR 20177026238A KR 102327569 B1 KR102327569 B1 KR 102327569B1
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- 229920001400 block copolymer Polymers 0.000 title claims abstract description 261
- 238000000034 method Methods 0.000 title claims abstract description 118
- 125000005647 linker group Chemical group 0.000 title claims abstract description 60
- 239000000203 mixture Substances 0.000 title claims abstract description 59
- 229920000642 polymer Polymers 0.000 claims abstract description 137
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 39
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 38
- 239000011737 fluorine Substances 0.000 claims abstract description 30
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 29
- 239000000178 monomer Substances 0.000 claims description 84
- 125000002947 alkylene group Chemical group 0.000 claims description 43
- 238000007151 ring opening polymerisation reaction Methods 0.000 claims description 39
- 125000000217 alkyl group Chemical group 0.000 claims description 37
- 239000002904 solvent Substances 0.000 claims description 36
- 125000004122 cyclic group Chemical group 0.000 claims description 31
- 229920002554 vinyl polymer Polymers 0.000 claims description 30
- 239000001257 hydrogen Substances 0.000 claims description 27
- 229910052739 hydrogen Inorganic materials 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 26
- 150000002596 lactones Chemical class 0.000 claims description 22
- 150000005676 cyclic carbonates Chemical class 0.000 claims description 21
- 150000003951 lactams Chemical class 0.000 claims description 16
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 15
- 150000002431 hydrogen Chemical class 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 13
- 125000004665 trialkylsilyl group Chemical group 0.000 claims description 13
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 12
- 125000005011 alkyl ether group Chemical group 0.000 claims description 11
- 239000007983 Tris buffer Substances 0.000 claims description 7
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- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims description 6
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 6
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 238000005191 phase separation Methods 0.000 claims description 4
- 125000006835 (C6-C20) arylene group Chemical group 0.000 claims description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 3
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- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims description 3
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims description 3
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 2
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- SNOOUWRIMMFWNE-UHFFFAOYSA-M sodium;6-[(3,4,5-trimethoxybenzoyl)amino]hexanoate Chemical compound [Na+].COC1=CC(C(=O)NCCCCCC([O-])=O)=CC(OC)=C1OC SNOOUWRIMMFWNE-UHFFFAOYSA-M 0.000 claims 1
- 238000001338 self-assembly Methods 0.000 abstract description 55
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- 229910052727 yttrium Inorganic materials 0.000 abstract description 4
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- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 72
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- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 46
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- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 36
- 238000012876 topography Methods 0.000 description 35
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- 229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 32
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 31
- 239000003153 chemical reaction reagent Substances 0.000 description 31
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- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 30
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 29
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- 229920002120 photoresistant polymer Polymers 0.000 description 23
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 21
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 20
- 238000000576 coating method Methods 0.000 description 20
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- 238000001878 scanning electron micrograph Methods 0.000 description 16
- 229910052757 nitrogen Inorganic materials 0.000 description 15
- 239000003708 ampul Substances 0.000 description 14
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- 150000001875 compounds Chemical class 0.000 description 14
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- 229910052760 oxygen Inorganic materials 0.000 description 14
- 239000001301 oxygen Substances 0.000 description 13
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 12
- 238000004630 atomic force microscopy Methods 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 12
- 229910052799 carbon Inorganic materials 0.000 description 12
- 238000001556 precipitation Methods 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229920005604 random copolymer Polymers 0.000 description 11
- JJTUDXZGHPGLLC-IMJSIDKUSA-N 4511-42-6 Chemical compound C[C@@H]1OC(=O)[C@H](C)OC1=O JJTUDXZGHPGLLC-IMJSIDKUSA-N 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 10
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 229910052794 bromium Inorganic materials 0.000 description 10
- 239000000460 chlorine Substances 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
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- 125000000623 heterocyclic group Chemical group 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 10
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 description 9
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 9
- 125000005250 alkyl acrylate group Chemical group 0.000 description 9
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 9
- 238000000231 atomic layer deposition Methods 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 9
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 9
- 150000004820 halides Chemical class 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 9
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 7
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- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 7
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- FIONWRDVKJFHRC-UHFFFAOYSA-N trimethyl(2-phenylethenyl)silane Chemical compound C[Si](C)(C)C=CC1=CC=CC=C1 FIONWRDVKJFHRC-UHFFFAOYSA-N 0.000 description 7
- OZJPLYNZGCXSJM-UHFFFAOYSA-N 5-valerolactone Chemical compound O=C1CCCCO1 OZJPLYNZGCXSJM-UHFFFAOYSA-N 0.000 description 6
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- VKSWWACDZPRJAP-UHFFFAOYSA-N 1,3-dioxepan-2-one Chemical compound O=C1OCCCCO1 VKSWWACDZPRJAP-UHFFFAOYSA-N 0.000 description 4
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- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 3
- ULKFLOVGORAZDI-UHFFFAOYSA-N 3,3-dimethyloxetan-2-one Chemical compound CC1(C)COC1=O ULKFLOVGORAZDI-UHFFFAOYSA-N 0.000 description 3
- MQLRHBIRPJOGSC-UHFFFAOYSA-N 5-phenylmethoxyoxepan-2-one Chemical compound C1COC(=O)CCC1OCC1=CC=CC=C1 MQLRHBIRPJOGSC-UHFFFAOYSA-N 0.000 description 3
- BCVOCJHUBCSGHB-UHFFFAOYSA-N 5-phenyloxepan-2-one Chemical compound C1COC(=O)CCC1C1=CC=CC=C1 BCVOCJHUBCSGHB-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
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- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 3
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- FPXMWTIQAUOFBN-UHFFFAOYSA-N benzyl 5-methyl-2-oxo-1,3-dioxane-5-carboxylate Chemical compound C=1C=CC=CC=1COC(=O)C1(C)COC(=O)OC1 FPXMWTIQAUOFBN-UHFFFAOYSA-N 0.000 description 3
- GSCLMSFRWBPUSK-UHFFFAOYSA-N beta-Butyrolactone Chemical compound CC1CC(=O)O1 GSCLMSFRWBPUSK-UHFFFAOYSA-N 0.000 description 3
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- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 3
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
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- C—CHEMISTRY; METALLURGY
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
- C09D167/04—Polyesters derived from hydroxycarboxylic acids, e.g. lactones
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
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- C09D169/00—Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D169/00—Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
- C09D169/005—Polyester-carbonates
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
- C09D187/005—Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/01—Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
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- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Graft Or Block Polymers (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Polyethers (AREA)
- Polyesters Or Polycarbonates (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Laminated Bodies (AREA)
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| US9982097B2 (en) * | 2016-02-11 | 2018-05-29 | International Business Machines Corporation | Thin film self assembly of topcoat-free silicon-containing diblock copolymers |
| TW201800434A (zh) * | 2016-02-22 | 2018-01-01 | Az電子材料(盧森堡)股份有限公司 | 具有線性表面活性接合基團之嵌段共聚物及其組合物與製法 |
| US9768059B1 (en) * | 2016-04-07 | 2017-09-19 | International Business Machines Corporation | High-chi block copolymers for interconnect structures by directed self-assembly |
| JP2018082033A (ja) | 2016-11-16 | 2018-05-24 | 東芝メモリ株式会社 | パターン形成方法 |
| WO2018112121A1 (en) * | 2016-12-14 | 2018-06-21 | Brewer Science Inc. | High-chi block copolymers for directed self-assembly |
| CN108227412A (zh) * | 2016-12-15 | 2018-06-29 | Imec 非营利协会 | 光刻掩模层 |
| US10082736B2 (en) * | 2017-01-13 | 2018-09-25 | International Business Machines Corporation | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning |
| TWI805617B (zh) | 2017-09-15 | 2023-06-21 | 南韓商Lg化學股份有限公司 | 層壓板 |
| JP2019099749A (ja) | 2017-12-06 | 2019-06-24 | 東芝メモリ株式会社 | パターン形成方法、ブロックコポリマー、及びパターン形成材料 |
| US10656527B2 (en) * | 2017-12-21 | 2020-05-19 | International Business Machines Corporation | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer |
| WO2019131953A1 (ja) * | 2017-12-27 | 2019-07-04 | Jsr株式会社 | パターン形成方法及び感放射線性組成物 |
| KR102136470B1 (ko) * | 2018-12-24 | 2020-07-22 | (주)서영 | 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법 |
| WO2020179918A1 (ja) * | 2019-03-06 | 2020-09-10 | Jsr株式会社 | 基板の製造方法及びブロック共重合体 |
| FR3105786A1 (fr) * | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de nanostructuration d’un substrat |
| KR20230119186A (ko) * | 2020-12-17 | 2023-08-16 | 메르크 파텐트 게엠베하 | 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 |
| US20240247093A1 (en) * | 2021-04-23 | 2024-07-25 | Merck Patent Gmbh | Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications |
| KR20240064273A (ko) * | 2022-11-04 | 2024-05-13 | 주식회사 엘지화학 | 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자 |
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| JPH11322869A (ja) * | 1998-05-19 | 1999-11-26 | Jsr Corp | ブロック共重合体の製造方法 |
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| US20120238652A1 (en) | 2009-09-10 | 2012-09-20 | National University Corporation Gunma University | Method for producing stereo complex crystals of polylactic acid, polylactic acid, and molded body, synthetic fiber, porous body and ion conductor comprising same |
| US20140363572A1 (en) | 2012-02-21 | 2014-12-11 | Dow Global Technologies Llc | Composite membrane |
| US20140377465A1 (en) | 2013-06-24 | 2014-12-25 | Rohm And Haas Electronic Materials Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
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