TWI713494B - 具有表面活性接合基團之嵌段共聚物及其組合物與製法 - Google Patents
具有表面活性接合基團之嵌段共聚物及其組合物與製法 Download PDFInfo
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- TWI713494B TWI713494B TW105104994A TW105104994A TWI713494B TW I713494 B TWI713494 B TW I713494B TW 105104994 A TW105104994 A TW 105104994A TW 105104994 A TW105104994 A TW 105104994A TW I713494 B TWI713494 B TW I713494B
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- block copolymer
- integer
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Images
Classifications
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F297/00—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
- C08F297/02—Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/06—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
- C08G63/08—Lactones or lactides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/64—Polyesters containing both carboxylic ester groups and carbonate groups
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- C—CHEMISTRY; METALLURGY
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- C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
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- C09D187/00—Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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| KR102511757B1 (ko) * | 2015-07-23 | 2023-03-20 | 디아이씨 가부시끼가이샤 | 함불소 화합물, 리빙 중합개시제, 함불소 중합체, 함불소 중합체의 제조 방법 및 레지스트 조성물 |
| US9982097B2 (en) * | 2016-02-11 | 2018-05-29 | International Business Machines Corporation | Thin film self assembly of topcoat-free silicon-containing diblock copolymers |
| WO2017144385A1 (en) * | 2016-02-22 | 2017-08-31 | AZ Electronic Materials (Luxembourg) S.à.r.l. | Block copolymers with linear surface-active junction groups, compositions and processes thereof |
| US9768059B1 (en) * | 2016-04-07 | 2017-09-19 | International Business Machines Corporation | High-chi block copolymers for interconnect structures by directed self-assembly |
| JP2018082033A (ja) | 2016-11-16 | 2018-05-24 | 東芝メモリ株式会社 | パターン形成方法 |
| EP3554830B1 (en) * | 2016-12-14 | 2023-10-18 | Brewer Science Inc. | High-chi block copolymers for directed self-assembly |
| CN108227412A (zh) * | 2016-12-15 | 2018-06-29 | Imec 非营利协会 | 光刻掩模层 |
| US10082736B2 (en) * | 2017-01-13 | 2018-09-25 | International Business Machines Corporation | Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning |
| TWI805617B (zh) | 2017-09-15 | 2023-06-21 | 南韓商Lg化學股份有限公司 | 層壓板 |
| JP2019099749A (ja) | 2017-12-06 | 2019-06-24 | 東芝メモリ株式会社 | パターン形成方法、ブロックコポリマー、及びパターン形成材料 |
| US10656527B2 (en) * | 2017-12-21 | 2020-05-19 | International Business Machines Corporation | Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer |
| JPWO2019131953A1 (ja) * | 2017-12-27 | 2020-12-24 | Jsr株式会社 | パターン形成方法及び感放射線性組成物 |
| KR102136470B1 (ko) * | 2018-12-24 | 2020-07-22 | (주)서영 | 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법 |
| WO2020179918A1 (ja) * | 2019-03-06 | 2020-09-10 | Jsr株式会社 | 基板の製造方法及びブロック共重合体 |
| FR3105786A1 (fr) * | 2019-12-31 | 2021-07-02 | Arkema France | Procédé de nanostructuration d’un substrat |
| KR20230119186A (ko) * | 2020-12-17 | 2023-08-16 | 메르크 파텐트 게엠베하 | 지향성 자기 조립을 위한 교호 공중합체 세그먼트로이루어진 조정 가능한 하이 카이 디블록 공중합체 및 그의 적용 |
| WO2022223670A1 (en) * | 2021-04-23 | 2022-10-27 | Merck Patent Gmbh | Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications |
| KR20240064273A (ko) * | 2022-11-04 | 2024-05-13 | 주식회사 엘지화학 | 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자 |
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2016
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| US20140377465A1 (en) * | 2013-06-24 | 2014-12-25 | Rohm And Haas Electronic Materials Llc | Neutral layer polymers, methods of manufacture thereof and articles comprising the same |
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| EP3259292A1 (en) | 2017-12-27 |
| SG11201705648TA (en) | 2017-08-30 |
| US10259907B2 (en) | 2019-04-16 |
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| JP7089618B2 (ja) | 2022-06-22 |
| JP2018507301A (ja) | 2018-03-15 |
| JP6978318B2 (ja) | 2021-12-08 |
| CN107257813A (zh) | 2017-10-17 |
| US20160244557A1 (en) | 2016-08-25 |
| IL253371A0 (en) | 2017-09-28 |
| JP2021130821A (ja) | 2021-09-09 |
| CN107257813B (zh) | 2020-08-21 |
| KR20170140171A (ko) | 2017-12-20 |
| WO2016131900A1 (en) | 2016-08-25 |
| KR102327569B1 (ko) | 2021-11-17 |
| TW201638125A (zh) | 2016-11-01 |
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