TWI713494B - 具有表面活性接合基團之嵌段共聚物及其組合物與製法 - Google Patents

具有表面活性接合基團之嵌段共聚物及其組合物與製法 Download PDF

Info

Publication number
TWI713494B
TWI713494B TW105104994A TW105104994A TWI713494B TW I713494 B TWI713494 B TW I713494B TW 105104994 A TW105104994 A TW 105104994A TW 105104994 A TW105104994 A TW 105104994A TW I713494 B TWI713494 B TW I713494B
Authority
TW
Taiwan
Prior art keywords
block copolymer
integer
block
group
moiety
Prior art date
Application number
TW105104994A
Other languages
English (en)
Chinese (zh)
Other versions
TW201638125A (zh
Inventor
安克特 芙拉
平原衣梨
鄭雅如
杜拉 巴卡朗
澳瑞斯特 波利希丘克
梅莉 蔣
馬格瑞塔 保尼斯庫
丹尼爾 桑德斯
觀陽 林
Original Assignee
德商馬克專利公司
美商萬國商業機器公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 德商馬克專利公司, 美商萬國商業機器公司 filed Critical 德商馬克專利公司
Publication of TW201638125A publication Critical patent/TW201638125A/zh
Application granted granted Critical
Publication of TWI713494B publication Critical patent/TWI713494B/zh

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/06Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from hydroxycarboxylic acids
    • C08G63/08Lactones or lactides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/64Polyesters containing both carboxylic ester groups and carbonate groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/02Aliphatic polycarbonates
    • C08G64/0208Aliphatic polycarbonates saturated
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D167/04Polyesters derived from hydroxycarboxylic acids, e.g. lactones
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D169/00Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D169/00Coating compositions based on polycarbonates; Coating compositions based on derivatives of polycarbonates
    • C09D169/005Polyester-carbonates
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D187/00Coating compositions based on unspecified macromolecular compounds, obtained otherwise than by polymerisation reactions only involving unsaturated carbon-to-carbon bonds
    • C09D187/005Block or graft polymers not provided for in groups C09D101/00 - C09D185/04
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2438/00Living radical polymerisation
    • C08F2438/01Atom Transfer Radical Polymerization [ATRP] or reverse ATRP
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/04Polyesters derived from hydroxy carboxylic acids, e.g. lactones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2369/00Characterised by the use of polycarbonates; Derivatives of polycarbonates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Graft Or Block Polymers (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Laminated Bodies (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polyethers (AREA)
TW105104994A 2015-02-20 2016-02-19 具有表面活性接合基團之嵌段共聚物及其組合物與製法 TWI713494B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/628,002 2015-02-20
US14/628,002 US10259907B2 (en) 2015-02-20 2015-02-20 Block copolymers with surface-active junction groups, compositions and processes thereof

Publications (2)

Publication Number Publication Date
TW201638125A TW201638125A (zh) 2016-11-01
TWI713494B true TWI713494B (zh) 2020-12-21

Family

ID=55443232

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105104994A TWI713494B (zh) 2015-02-20 2016-02-19 具有表面活性接合基團之嵌段共聚物及其組合物與製法

Country Status (9)

Country Link
US (1) US10259907B2 (enExample)
EP (1) EP3259292B1 (enExample)
JP (2) JP6978318B2 (enExample)
KR (1) KR102327569B1 (enExample)
CN (1) CN107257813B (enExample)
IL (1) IL253371A0 (enExample)
SG (1) SG11201705648TA (enExample)
TW (1) TWI713494B (enExample)
WO (1) WO2016131900A1 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107848947B (zh) * 2015-07-23 2025-06-20 Dic株式会社 含氟化合物、活性聚合引发剂、含氟聚合物、含氟聚合物的制造方法及抗蚀剂组合物
US9982097B2 (en) * 2016-02-11 2018-05-29 International Business Machines Corporation Thin film self assembly of topcoat-free silicon-containing diblock copolymers
WO2017144385A1 (en) * 2016-02-22 2017-08-31 AZ Electronic Materials (Luxembourg) S.à.r.l. Block copolymers with linear surface-active junction groups, compositions and processes thereof
US9768059B1 (en) * 2016-04-07 2017-09-19 International Business Machines Corporation High-chi block copolymers for interconnect structures by directed self-assembly
JP2018082033A (ja) 2016-11-16 2018-05-24 東芝メモリ株式会社 パターン形成方法
EP3554830B1 (en) * 2016-12-14 2023-10-18 Brewer Science Inc. High-chi block copolymers for directed self-assembly
CN108227412A (zh) * 2016-12-15 2018-06-29 Imec 非营利协会 光刻掩模层
US10082736B2 (en) * 2017-01-13 2018-09-25 International Business Machines Corporation Approach to lowering extreme ultraviolet exposure dose for inorganic hardmasks for extreme ultraviolet patterning
TWI805617B (zh) 2017-09-15 2023-06-21 南韓商Lg化學股份有限公司 層壓板
JP2019099749A (ja) 2017-12-06 2019-06-24 東芝メモリ株式会社 パターン形成方法、ブロックコポリマー、及びパターン形成材料
US10656527B2 (en) 2017-12-21 2020-05-19 International Business Machines Corporation Patterning material film stack with hard mask layer configured to support selective deposition on patterned resist layer
WO2019131953A1 (ja) * 2017-12-27 2019-07-04 Jsr株式会社 パターン形成方法及び感放射線性組成物
KR102136470B1 (ko) * 2018-12-24 2020-07-22 (주)서영 기판과 평행방향으로 자기조립된 실린더 블록공중합체를 이용한 대면적 나노패턴 제조 방법
WO2020179918A1 (ja) * 2019-03-06 2020-09-10 Jsr株式会社 基板の製造方法及びブロック共重合体
FR3105786A1 (fr) * 2019-12-31 2021-07-02 Arkema France Procédé de nanostructuration d’un substrat
CN116761831A (zh) * 2020-12-17 2023-09-15 默克专利股份有限公司 用于定向自组装的由交替共聚物段所构成的可调式高chi二嵌段共聚物及其应用
CN117279967A (zh) * 2021-04-23 2023-12-22 默克专利股份有限公司 用于定向自组装应用的具有强化动力的可容许多间距的嵌段共聚物
KR20240064273A (ko) * 2022-11-04 2024-05-13 주식회사 엘지화학 불소계 화합물, 광중합성 조성물, 홀로그램 기록 매체, 이의 제조 방법 및 이를 포함하는 광학 소자
US12582017B2 (en) 2023-01-31 2026-03-17 Tokyo Electron Limited Bonding layer and process
JP2025002574A (ja) * 2023-06-22 2025-01-09 東京応化工業株式会社 ブロックコポリマー、下地剤、相分離構造形成用組成物成用樹脂組成物、及び相分離構造を含む構造体の製造方法
WO2026041747A1 (en) 2024-08-22 2026-02-26 Merck Patent Gmbh Carbon and silicone enriched new high-chi block copolymers of novel architectures for thin-film self-assembly applications

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140377465A1 (en) * 2013-06-24 2014-12-25 Rohm And Haas Electronic Materials Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187244A (en) * 1988-07-22 1993-02-16 Mitsubishi Rayon Co., Ltd. Preparation process of block copolymers and resulting block copolymers
WO1993006184A1 (en) 1991-09-23 1993-04-01 Minnesota Mining And Manufacturing Company PRESSURE SENSITIVE ADHESIVE COMPOSITION WHICH IS REPULPABLE UNDER ACIDIC pH CONDITIONS
US5622764A (en) 1995-06-07 1997-04-22 Minnesota Mining And Manufacturing Company Sterilization indicators and methods
JPH11322869A (ja) * 1998-05-19 1999-11-26 Jsr Corp ブロック共重合体の製造方法
NO990119D0 (no) 1999-01-12 1999-01-12 Jotun As Blokk-kopolymerer med blokker med perfluorerte sidekjeder, og fremgangsmÕte for fremstilling derav
US8133534B2 (en) 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US8080615B2 (en) 2007-06-19 2011-12-20 Micron Technology, Inc. Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
US20090092803A1 (en) 2007-09-27 2009-04-09 Massachusetts Institute Of Technology Self-assembly technique applicable to large areas and nanofabrication
US7763319B2 (en) 2008-01-11 2010-07-27 International Business Machines Corporation Method of controlling orientation of domains in block copolymer films
US7989026B2 (en) 2008-01-12 2011-08-02 International Business Machines Corporation Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
US8999492B2 (en) * 2008-02-05 2015-04-07 Micron Technology, Inc. Method to produce nanometer-sized features with directed assembly of block copolymers
US8425982B2 (en) 2008-03-21 2013-04-23 Micron Technology, Inc. Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
US8119017B2 (en) 2008-06-17 2012-02-21 Hitachi Global Storage Technologies Netherlands B.V. Method using block copolymers for making a master mold with high bit-aspect-ratio for nanoimprinting patterned magnetic recording disks
WO2011030766A1 (ja) * 2009-09-10 2011-03-17 国立大学法人群馬大学 ポリ乳酸ステレオコンプレックス結晶の製造方法、ポリ乳酸、その成形体、合成繊維、多孔体およびイオン伝導体
US8623458B2 (en) 2009-12-18 2014-01-07 International Business Machines Corporation Methods of directed self-assembly, and layered structures formed therefrom
US8828253B2 (en) 2010-09-09 2014-09-09 Asml Netherlands B.V. Lithography using self-assembled polymers
US9299381B2 (en) 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
US8642086B2 (en) 2011-03-31 2014-02-04 International Business Machines Corporation Antimicrobial compositions, methods of preparation thereof, and uses thereof
CN103562245B (zh) * 2011-04-22 2015-11-25 Lg化学株式会社 新的二嵌段共聚物、其制备方法以及使用其形成纳米图案的方法
US9182673B2 (en) 2011-07-18 2015-11-10 Asml Netherlands B.V. Method for providing a template for a self-assemblable polymer for use in device lithography
TW201323461A (zh) * 2011-09-06 2013-06-16 Univ Cornell 嵌段共聚物及利用彼等之蝕印圖案化
NL2010004A (en) 2012-01-13 2013-07-16 Asml Netherlands Bv Self-assemblable polymer and methods for use in lithography.
US9314819B2 (en) 2012-02-10 2016-04-19 Board Of Regents, The University Of Texas System Anhydride copolymer top coats for orientation control of thin film block copolymers
SG11201404416RA (en) 2012-02-10 2014-08-28 Univ Texas Polyactide/silicon-containing block copolymers for nanolithography
US9440196B2 (en) * 2012-02-21 2016-09-13 Dow Global Technologies Llc Composite membrane
US9127113B2 (en) 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same
US9012545B2 (en) 2012-08-31 2015-04-21 Rohm And Haas Electronic Materials Llc Composition and method for preparing pattern on a substrate
US9382444B2 (en) * 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US9802400B2 (en) 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9574107B2 (en) 2015-02-16 2017-02-21 International Business Machines Corporation Fluoro-alcohol additives for orientation control of block copolymers

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140377465A1 (en) * 2013-06-24 2014-12-25 Rohm And Haas Electronic Materials Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
"One pot" synthesis of fluorinated block copolymers using a surface-active ATRP initiator under emulsion polymerization conditions, (2011) 67:1185-1200 *
"One pot" synthesis of fluorinated block copolymers using a surface-active ATRP initiator under emulsion polymerization conditions, (2011) 67:1185-1200。
Yue Sun et al., Journal of Fluorine Chemistry 132,Synthesis and characterization of a new fluorinated macroinitiator and its diblock copolymer by AGET ATRP, (2011) 9-14 *
Yue Sun et al., Journal of Fluorine Chemistry 132,Synthesis and characterization of a new fluorinated macroinitiator and its diblock copolymer by AGET ATRP, (2011) 9-14。

Also Published As

Publication number Publication date
KR20170140171A (ko) 2017-12-20
JP6978318B2 (ja) 2021-12-08
US20160244557A1 (en) 2016-08-25
JP7089618B2 (ja) 2022-06-22
TW201638125A (zh) 2016-11-01
KR102327569B1 (ko) 2021-11-17
CN107257813B (zh) 2020-08-21
JP2018507301A (ja) 2018-03-15
SG11201705648TA (en) 2017-08-30
EP3259292A1 (en) 2017-12-27
CN107257813A (zh) 2017-10-17
IL253371A0 (en) 2017-09-28
US10259907B2 (en) 2019-04-16
WO2016131900A1 (en) 2016-08-25
JP2021130821A (ja) 2021-09-09
EP3259292B1 (en) 2020-04-08

Similar Documents

Publication Publication Date Title
JP7089618B2 (ja) 表面活性連結基を有するブロックコポリマー、組成物及びそれの方法
US9556353B2 (en) Orientation control materials for block copolymers used in directed self-assembly applications
US10040879B2 (en) Fluoro-alcohol additives for orientation control of block copolymers
TWI832955B (zh) 在低玻璃轉移溫度(Tg)寡聚物存在下用於形成圖案的增強定向自組裝
US9458353B1 (en) Additives for orientation control of block copolymers
CN110114377B (zh) 嵌段共聚物自组装的新组合物和方法
US12583961B2 (en) Tunable high-chi diblock copolymers consisting of alternating copolymer segments for directed self-assembly and application thereof
EP4326791A1 (en) Multi-pitch tolerable block copolymers with enhanced kinetics for directed self-assembly applications
US20260042876A1 (en) LOW Tg MULTI-TETHER COPOLYMERIZED DIBLOCK COPOLYMERS FOR DIRECTED SELF-ASSEMBLY
TW201800434A (zh) 具有線性表面活性接合基團之嵌段共聚物及其組合物與製法
Vora et al. Synthesis and thin-film self-assembly of cylinder-forming high-χ block copolymers
JP2026005619A (ja) 下地材、及び相分離構造を含む構造体の製造方法
WO2023021016A2 (en) Development of novel hydrophilic pinning mat
KR20240178662A (ko) 블록 코폴리머, 하지제, 상 분리 구조 형성용 수지 조성물, 및 상 분리 구조를 포함하는 구조체의 제조 방법