KR102269697B1 - 기판 반송 로봇, 진공 처리 장치 - Google Patents

기판 반송 로봇, 진공 처리 장치 Download PDF

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Publication number
KR102269697B1
KR102269697B1 KR1020170093481A KR20170093481A KR102269697B1 KR 102269697 B1 KR102269697 B1 KR 102269697B1 KR 1020170093481 A KR1020170093481 A KR 1020170093481A KR 20170093481 A KR20170093481 A KR 20170093481A KR 102269697 B1 KR102269697 B1 KR 102269697B1
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KR
South Korea
Prior art keywords
support plate
substrate
quartz
plate
hand
Prior art date
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KR1020170093481A
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English (en)
Korean (ko)
Other versions
KR20180013737A (ko
Inventor
요스케 진보
겐지 에토
겐 후지이
Original Assignee
가부시키가이샤 알박
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Application filed by 가부시키가이샤 알박 filed Critical 가부시키가이샤 알박
Publication of KR20180013737A publication Critical patent/KR20180013737A/ko
Application granted granted Critical
Publication of KR102269697B1 publication Critical patent/KR102269697B1/ko

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
    • H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manipulator (AREA)
KR1020170093481A 2016-07-29 2017-07-24 기판 반송 로봇, 진공 처리 장치 KR102269697B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016149937A JP6742849B2 (ja) 2016-07-29 2016-07-29 基板搬送ロボット、真空処理装置
JPJP-P-2016-149937 2016-07-29

Publications (2)

Publication Number Publication Date
KR20180013737A KR20180013737A (ko) 2018-02-07
KR102269697B1 true KR102269697B1 (ko) 2021-06-25

Family

ID=61075966

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020170093481A KR102269697B1 (ko) 2016-07-29 2017-07-24 기판 반송 로봇, 진공 처리 장치

Country Status (4)

Country Link
JP (1) JP6742849B2 (ja)
KR (1) KR102269697B1 (ja)
CN (1) CN107665845B (ja)
TW (1) TWI721190B (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004018215A (ja) 2002-06-18 2004-01-22 Tokyo Electron Ltd フラット・パネル・ディスプレイ用熱処理装置及び熱処理方法
JP2009111393A (ja) 2007-10-31 2009-05-21 Applied Materials Inc 高温下での基板取り出しのための進化したｆｉブレード
JP2013103331A (ja) 2011-11-16 2013-05-30 Nidec Sankyo Corp 産業用ロボット

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0721458Y2 (ja) * 1989-10-31 1995-05-17 大日本スクリーン製造株式会社 ウエハ搬送アーム
JPH03217041A (ja) * 1990-01-22 1991-09-24 Dainippon Screen Mfg Co Ltd 基板搬送用アーム
JPH0529431A (ja) * 1991-07-25 1993-02-05 Matsushita Electric Ind Co Ltd 基板搬送用アーム
JP3238432B2 (ja) * 1991-08-27 2001-12-17 東芝機械株式会社 マルチチャンバ型枚葉処理装置
JPH0722489A (ja) * 1993-06-29 1995-01-24 Toshiba Corp ウェハーフォーク
JPH08330385A (ja) * 1995-05-31 1996-12-13 Kokusai Electric Co Ltd 基板搬送ツィーザ
US5746460A (en) * 1995-12-08 1998-05-05 Applied Materials, Inc. End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector
JP2003045937A (ja) * 2001-07-31 2003-02-14 Ishikawajima Harima Heavy Ind Co Ltd 高温炉用ハンド
JP2003224173A (ja) * 2002-01-29 2003-08-08 Komatsu Electronic Metals Co Ltd 半導体製造装置
US7073834B2 (en) * 2004-06-25 2006-07-11 Applied Materials, Inc. Multiple section end effector assembly
US8545165B2 (en) * 2005-03-30 2013-10-01 Brooks Automation, Inc. High speed substrate aligner apparatus
JP2008227200A (ja) * 2007-03-14 2008-09-25 Ihi Corp 基板容器用ロボットハンドと蓋付基板容器
US8057602B2 (en) * 2007-05-09 2011-11-15 Applied Materials, Inc. Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber
JP5548163B2 (ja) * 2010-09-14 2014-07-16 株式会社日立国際電気 基板搬送機構、基板処理装置および半導体装置の製造方法
WO2012148568A1 (en) * 2011-03-01 2012-11-01 Applied Materials, Inc. Method and apparatus for substrate transfer and radical confinement
JP6256909B2 (ja) * 2013-10-21 2018-01-10 株式会社アルバック 基板搬送装置および基板処理装置
US9415519B2 (en) * 2014-07-01 2016-08-16 Varian Semiconductor Equipment Associates, Inc. Composite end effector and method of making a composite end effector

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004018215A (ja) 2002-06-18 2004-01-22 Tokyo Electron Ltd フラット・パネル・ディスプレイ用熱処理装置及び熱処理方法
JP2009111393A (ja) 2007-10-31 2009-05-21 Applied Materials Inc 高温下での基板取り出しのための進化したｆｉブレード
JP2013103331A (ja) 2011-11-16 2013-05-30 Nidec Sankyo Corp 産業用ロボット

Also Published As

Publication number Publication date
TW201807768A (zh) 2018-03-01
JP2018019015A (ja) 2018-02-01
TWI721190B (zh) 2021-03-11
KR20180013737A (ko) 2018-02-07
CN107665845B (zh) 2023-04-14
JP6742849B2 (ja) 2020-08-19
CN107665845A (zh) 2018-02-06

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