KR102262072B1 - 헤이즈의 평가 방법 - Google Patents

헤이즈의 평가 방법 Download PDF

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Publication number
KR102262072B1
KR102262072B1 KR1020177032618A KR20177032618A KR102262072B1 KR 102262072 B1 KR102262072 B1 KR 102262072B1 KR 1020177032618 A KR1020177032618 A KR 1020177032618A KR 20177032618 A KR20177032618 A KR 20177032618A KR 102262072 B1 KR102262072 B1 KR 102262072B1
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South Korea
Prior art keywords
haze
scattered light
standard
standard sample
intensity
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Korean (ko)
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KR20180006912A (ko
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히사유키 사이토
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신에쯔 한도타이 가부시키가이샤
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1486—Counting the particles

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
KR1020177032618A 2015-05-13 2016-03-10 헤이즈의 평가 방법 Active KR102262072B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015098286A JP6299668B2 (ja) 2015-05-13 2015-05-13 ヘイズの評価方法
JPJP-P-2015-098286 2015-05-13
PCT/JP2016/001315 WO2016181592A1 (ja) 2015-05-13 2016-03-10 ヘイズの評価方法

Publications (2)

Publication Number Publication Date
KR20180006912A KR20180006912A (ko) 2018-01-19
KR102262072B1 true KR102262072B1 (ko) 2021-06-09

Family

ID=57249125

Family Applications (1)

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KR1020177032618A Active KR102262072B1 (ko) 2015-05-13 2016-03-10 헤이즈의 평가 방법

Country Status (6)

Country Link
US (1) US10234281B2 (enExample)
JP (1) JP6299668B2 (enExample)
KR (1) KR102262072B1 (enExample)
CN (1) CN107615468B (enExample)
DE (1) DE112016001802B4 (enExample)
WO (1) WO2016181592A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201918700A (zh) 2017-05-05 2019-05-16 美商3M新設資產公司 散射測量系統及其使用方法
JP7054634B2 (ja) * 2018-02-21 2022-04-14 セーレン株式会社 測定装置
CN109916945A (zh) * 2019-04-10 2019-06-21 浙江众泰汽车制造有限公司 一种雾度评价装置及雾度评价方法
US12241845B2 (en) * 2021-06-24 2025-03-04 Beijing Tongmei Xtal Technology Co., Ltd. Method and setup for detecting surface haze of materials
JP7700751B2 (ja) * 2021-09-10 2025-07-01 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198869A (en) * 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
JP2001356092A (ja) * 2000-06-15 2001-12-26 Suga Test Instr Co Ltd ヘーズ値測定装置及び測定方法
JP2007114183A (ja) * 2005-07-22 2007-05-10 Commiss Energ Atom 絶縁薄膜上にナノ構造体を含むヘイズノイズ標準の製造方法
US8675182B2 (en) * 2008-04-11 2014-03-18 Microsoft Corporation Method and system to reduce stray light reflection error in time-of-flight sensor arrays

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2719257B2 (ja) 1991-12-18 1998-02-25 住友電気工業株式会社 分光分析装置
US5599464A (en) 1995-10-06 1997-02-04 Vlsi Standards, Inc. Formation of atomic scale vertical features for topographic instrument calibration
US5691812A (en) 1996-03-22 1997-11-25 Ade Optical Systems Corporation Calibration standard for calibrating a defect inspection system and a method of forming same
DE69930700T2 (de) * 1998-09-04 2006-11-09 Canon K.K. Halbleitersubstrat und Verfahren zu seiner Herstellung
JP2002310902A (ja) * 2001-04-16 2002-10-23 Central Glass Co Ltd 波長選択性のある散乱光測定方法
KR100675216B1 (ko) * 2005-08-23 2007-01-29 삼성전기주식회사 헤이즈 측정 방법 및 그 장치
KR100871876B1 (ko) * 2006-09-26 2008-12-03 나노전광 주식회사 광검출기를 이용한 포토마스크 표면의 헤이즈 검출장치 및그 검출방법
JP5357509B2 (ja) 2008-10-31 2013-12-04 株式会社日立ハイテクノロジーズ 検査装置、検査方法および検査装置の校正システム
JP5223998B2 (ja) * 2010-11-29 2013-06-26 大日本印刷株式会社 評価用基板

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198869A (en) * 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
JP2001356092A (ja) * 2000-06-15 2001-12-26 Suga Test Instr Co Ltd ヘーズ値測定装置及び測定方法
JP2007114183A (ja) * 2005-07-22 2007-05-10 Commiss Energ Atom 絶縁薄膜上にナノ構造体を含むヘイズノイズ標準の製造方法
US8675182B2 (en) * 2008-04-11 2014-03-18 Microsoft Corporation Method and system to reduce stray light reflection error in time-of-flight sensor arrays

Also Published As

Publication number Publication date
DE112016001802B4 (de) 2024-07-18
US20180128606A1 (en) 2018-05-10
WO2016181592A1 (ja) 2016-11-17
JP2016213411A (ja) 2016-12-15
CN107615468A (zh) 2018-01-19
US10234281B2 (en) 2019-03-19
JP6299668B2 (ja) 2018-03-28
KR20180006912A (ko) 2018-01-19
DE112016001802T5 (de) 2018-01-25
CN107615468B (zh) 2020-06-19

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