CN107615468B - 雾度的评价方法 - Google Patents

雾度的评价方法 Download PDF

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Publication number
CN107615468B
CN107615468B CN201680027570.7A CN201680027570A CN107615468B CN 107615468 B CN107615468 B CN 107615468B CN 201680027570 A CN201680027570 A CN 201680027570A CN 107615468 B CN107615468 B CN 107615468B
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CN
China
Prior art keywords
haze
scattered light
value
standard sample
light intensity
Prior art date
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Active
Application number
CN201680027570.7A
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English (en)
Chinese (zh)
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CN107615468A (zh
Inventor
齐藤久之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
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Shin Etsu Handotai Co Ltd
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Publication of CN107615468A publication Critical patent/CN107615468A/zh
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Publication of CN107615468B publication Critical patent/CN107615468B/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D18/00—Testing or calibrating apparatus or arrangements provided for in groups G01D1/00 - G01D15/00
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/10—Investigating individual particles
    • G01N15/14—Optical investigation techniques, e.g. flow cytometry
    • G01N2015/1486—Counting the particles

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Sampling And Sample Adjustment (AREA)
CN201680027570.7A 2015-05-13 2016-03-10 雾度的评价方法 Active CN107615468B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015098286A JP6299668B2 (ja) 2015-05-13 2015-05-13 ヘイズの評価方法
JP2015-098286 2015-05-13
PCT/JP2016/001315 WO2016181592A1 (ja) 2015-05-13 2016-03-10 ヘイズの評価方法

Publications (2)

Publication Number Publication Date
CN107615468A CN107615468A (zh) 2018-01-19
CN107615468B true CN107615468B (zh) 2020-06-19

Family

ID=57249125

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201680027570.7A Active CN107615468B (zh) 2015-05-13 2016-03-10 雾度的评价方法

Country Status (6)

Country Link
US (1) US10234281B2 (enExample)
JP (1) JP6299668B2 (enExample)
KR (1) KR102262072B1 (enExample)
CN (1) CN107615468B (enExample)
DE (1) DE112016001802B4 (enExample)
WO (1) WO2016181592A1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201918700A (zh) 2017-05-05 2019-05-16 美商3M新設資產公司 散射測量系統及其使用方法
JP7054634B2 (ja) * 2018-02-21 2022-04-14 セーレン株式会社 測定装置
CN109916945A (zh) * 2019-04-10 2019-06-21 浙江众泰汽车制造有限公司 一种雾度评价装置及雾度评价方法
US12241845B2 (en) * 2021-06-24 2025-03-04 Beijing Tongmei Xtal Technology Co., Ltd. Method and setup for detecting surface haze of materials
JP7700751B2 (ja) * 2021-09-10 2025-07-01 株式会社Sumco 半導体ウェーハの評価方法および半導体ウェーハの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198869A (en) * 1990-10-15 1993-03-30 Vlsi Standards, Inc. Reference wafer for haze calibration
JP2719257B2 (ja) 1991-12-18 1998-02-25 住友電気工業株式会社 分光分析装置
US5599464A (en) 1995-10-06 1997-02-04 Vlsi Standards, Inc. Formation of atomic scale vertical features for topographic instrument calibration
US5691812A (en) 1996-03-22 1997-11-25 Ade Optical Systems Corporation Calibration standard for calibrating a defect inspection system and a method of forming same
DE69930700T2 (de) * 1998-09-04 2006-11-09 Canon K.K. Halbleitersubstrat und Verfahren zu seiner Herstellung
JP3341212B2 (ja) 2000-06-15 2002-11-05 スガ試験機株式会社 ヘーズ値測定装置及び測定方法
JP2002310902A (ja) * 2001-04-16 2002-10-23 Central Glass Co Ltd 波長選択性のある散乱光測定方法
FR2888833B1 (fr) 2005-07-22 2007-08-24 Commissariat Energie Atomique Procede de realisation d'etalons de bruit de fond diffus comportant des nano-structures sur une couche mince isolante
KR100675216B1 (ko) * 2005-08-23 2007-01-29 삼성전기주식회사 헤이즈 측정 방법 및 그 장치
KR100871876B1 (ko) * 2006-09-26 2008-12-03 나노전광 주식회사 광검출기를 이용한 포토마스크 표면의 헤이즈 검출장치 및그 검출방법
US8194233B2 (en) * 2008-04-11 2012-06-05 Microsoft Corporation Method and system to reduce stray light reflection error in time-of-flight sensor arrays
JP5357509B2 (ja) 2008-10-31 2013-12-04 株式会社日立ハイテクノロジーズ 検査装置、検査方法および検査装置の校正システム
JP5223998B2 (ja) * 2010-11-29 2013-06-26 大日本印刷株式会社 評価用基板

Also Published As

Publication number Publication date
DE112016001802B4 (de) 2024-07-18
US20180128606A1 (en) 2018-05-10
WO2016181592A1 (ja) 2016-11-17
JP2016213411A (ja) 2016-12-15
CN107615468A (zh) 2018-01-19
US10234281B2 (en) 2019-03-19
JP6299668B2 (ja) 2018-03-28
KR20180006912A (ko) 2018-01-19
DE112016001802T5 (de) 2018-01-25
KR102262072B1 (ko) 2021-06-09

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