KR102149669B1 - 임프린트 리소그래피용 이음매 없는 대면적 마스터 템플릿의 제조 - Google Patents

임프린트 리소그래피용 이음매 없는 대면적 마스터 템플릿의 제조 Download PDF

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KR102149669B1
KR102149669B1 KR1020197033103A KR20197033103A KR102149669B1 KR 102149669 B1 KR102149669 B1 KR 102149669B1 KR 1020197033103 A KR1020197033103 A KR 1020197033103A KR 20197033103 A KR20197033103 A KR 20197033103A KR 102149669 B1 KR102149669 B1 KR 102149669B1
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large area
substrate
template
delete delete
pattern
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KR20190132695A (ko
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더글라스 제이. 레스닉
마이클 엔. 밀러
프랭크 와이. 쉬
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몰레큘러 임프린츠 인코퍼레이티드
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
    • B29D11/00769—Producing diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B29C33/424—Moulding surfaces provided with means for marking or patterning
    • B29C2033/426—Stampers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
    • B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
    • B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
    • B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/888—Shaping or removal of materials, e.g. etching

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020197033103A 2011-12-19 2012-12-19 임프린트 리소그래피용 이음매 없는 대면적 마스터 템플릿의 제조 Active KR102149669B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161577135P 2011-12-19 2011-12-19
US61/577,135 2011-12-19
PCT/US2012/070639 WO2013096459A1 (en) 2011-12-19 2012-12-19 Fabrication of seamless large area master templates for imprint lithography

Related Parent Applications (1)

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KR1020147020172A Division KR102044771B1 (ko) 2011-12-19 2012-12-19 임프린트 리소그래피용 이음매 없는 대면적 마스터 템플릿의 제조

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KR20190132695A KR20190132695A (ko) 2019-11-28
KR102149669B1 true KR102149669B1 (ko) 2020-09-01

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KR1020147020172A Active KR102044771B1 (ko) 2011-12-19 2012-12-19 임프린트 리소그래피용 이음매 없는 대면적 마스터 템플릿의 제조

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US (1) US9452574B2 (enExample)
JP (1) JP6324318B2 (enExample)
KR (2) KR102149669B1 (enExample)
CN (2) CN107015433B (enExample)
SG (2) SG11201403060WA (enExample)
TW (1) TWI570771B (enExample)
WO (1) WO2013096459A1 (enExample)

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KR102214830B1 (ko) 2014-05-02 2021-02-10 삼성전자주식회사 마스터 몰드 제조 방법
KR102219703B1 (ko) 2014-05-07 2021-02-24 삼성전자주식회사 임프린트를 이용한 패터닝 방법, 이를 이용하여 제작된 패턴 구조체 및 임프린팅 시스템
KR102176591B1 (ko) 2014-05-07 2020-11-09 삼성전자주식회사 와이어 그리드 편광자, 이를 포함한 액정 표시 장치 및 와이어 그리드 편광자 제조 방법
KR102336499B1 (ko) * 2014-08-04 2021-12-07 삼성전자주식회사 패턴 구조체 및 그 제조방법과, 금속 와이어 그리드 편광판을 채용한 액정 표시장치
KR102332038B1 (ko) 2015-04-10 2021-11-30 삼성디스플레이 주식회사 임프린트 리소그래피 방법, 이를 이용한 임프린트 리소그래피용 마스터 템플릿의 제조 방법 및 이에 의해 제조된 임프린트 리소그래피용 마스터 템플릿
KR102306655B1 (ko) 2015-04-10 2021-09-29 삼성디스플레이 주식회사 액정 표시 장치 및 그 제조 방법
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KR102446872B1 (ko) 2015-04-24 2022-09-26 삼성디스플레이 주식회사 표시 패널
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CN108885289B (zh) * 2016-03-04 2021-09-03 应用材料公司 线栅偏振器制造方法
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CN105789118B (zh) * 2016-04-14 2019-03-22 京东方科技集团股份有限公司 一种显示基板及其制作方法
KR102526936B1 (ko) 2016-04-26 2023-04-28 삼성디스플레이 주식회사 표시 패널 및 표시 패널용 모기판
KR102535820B1 (ko) 2016-05-19 2023-05-24 삼성디스플레이 주식회사 임프린트 리소그래피 방법, 임프린트용 마스터 템플릿, 이를 이용하여 제조된 와이어 그리드 편광소자 및 이를 포함하는 표시 기판
KR102607657B1 (ko) 2016-06-07 2023-11-28 티씨엘 차이나 스타 옵토일렉트로닉스 테크놀로지 컴퍼니 리미티드 미세패턴 형성 방법
KR20180023102A (ko) 2016-08-23 2018-03-07 삼성디스플레이 주식회사 와이어 그리드 패턴 및 이의 제조방법
KR102697540B1 (ko) * 2016-09-27 2024-08-23 삼성디스플레이 주식회사 임프린트 마스터 템플릿의 제조 방법
KR20180039228A (ko) * 2016-10-07 2018-04-18 삼성디스플레이 주식회사 표시 장치의 제조 방법
KR20180044744A (ko) 2016-10-24 2018-05-03 삼성전자주식회사 패턴 구조체 및 그 제조방법
JP2020520480A (ja) * 2017-05-16 2020-07-09 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 周波数倍増式干渉リソグラフィを使用したワイヤグリッド偏光板の製造方法
TWI646389B (zh) * 2017-09-12 2019-01-01 友達光電股份有限公司 壓印模具以及壓印模具製造方法
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US10705269B2 (en) * 2018-03-30 2020-07-07 Northrop Grumman Systems Corporation Fabrication method of a diffractive optic for hybrid coherent and spectral beam combination
KR102666843B1 (ko) 2018-08-31 2024-05-21 삼성디스플레이 주식회사 나노 임프린트용 스탬프 및 이의 제조 방법
WO2020080372A1 (ja) * 2018-10-16 2020-04-23 Ｓｃｉｖａｘ株式会社 微細パターン成形方法、インプリント用モールド製造方法およびインプリント用モールド並びに光学デバイス
WO2020167617A1 (en) * 2019-02-11 2020-08-20 Applied Materials, Inc. Large area seamless master and imprint stamp manufacturing method
CN110824835B (zh) * 2019-11-26 2023-05-12 京东方科技集团股份有限公司 拼接式纳米压印模板、其拼接缝的修复方法及其制作方法
CN111522206B (zh) * 2020-04-29 2021-09-21 中国科学院光电技术研究所 一种基于反射式光场增强的微纳光印制造方法
US20230280649A1 (en) 2020-07-31 2023-09-07 Morphotonics Holding B.V. Welding method for creating an upscaled master
CN115480442A (zh) * 2021-05-31 2022-12-16 联华电子股份有限公司 图案拆解方法
KR102716442B1 (ko) * 2021-12-09 2024-10-14 한국기계연구원 대면적 심리스 마스터 및 제조방법

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