KR102108776B1 - 보호막 형성용 필름 - Google Patents
보호막 형성용 필름 Download PDFInfo
- Publication number
- KR102108776B1 KR102108776B1 KR1020157014265A KR20157014265A KR102108776B1 KR 102108776 B1 KR102108776 B1 KR 102108776B1 KR 1020157014265 A KR1020157014265 A KR 1020157014265A KR 20157014265 A KR20157014265 A KR 20157014265A KR 102108776 B1 KR102108776 B1 KR 102108776B1
- Authority
- KR
- South Korea
- Prior art keywords
- protective film
- film
- forming
- meth
- acrylic polymer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
- C08G59/4021—Ureas; Thioureas; Guanidines; Dicyandiamides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/062—Copolymers with monomers not covered by C08L33/06
- C08L33/068—Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/295—Organic, e.g. plastic containing a filler
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
- H01L23/296—Organo-silicon compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/14—Semiconductor wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2012-264578 | 2012-12-03 | ||
JP2012264578 | 2012-12-03 | ||
PCT/JP2013/082289 WO2014087947A1 (ja) | 2012-12-03 | 2013-11-29 | 保護膜形成用フィルム |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150092132A KR20150092132A (ko) | 2015-08-12 |
KR102108776B1 true KR102108776B1 (ko) | 2020-05-11 |
Family
ID=50883365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157014265A KR102108776B1 (ko) | 2012-12-03 | 2013-11-29 | 보호막 형성용 필름 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6302843B2 (zh) |
KR (1) | KR102108776B1 (zh) |
CN (1) | CN104838490B (zh) |
PH (1) | PH12015501225A1 (zh) |
TW (1) | TWI616507B (zh) |
WO (1) | WO2014087947A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6554738B2 (ja) | 2014-03-24 | 2019-08-07 | リンテック株式会社 | 保護膜形成フィルム、保護膜形成用シート、ワークまたは加工物の製造方法、検査方法、良品と判断されたワーク、および良品と判断された加工物 |
CN104592714A (zh) * | 2015-01-13 | 2015-05-06 | 潮州三环(集团)股份有限公司 | 一种模塑料组合物及其制备方法 |
JP6237906B2 (ja) * | 2015-03-31 | 2017-11-29 | 東レ株式会社 | 電子部品用樹脂シート、保護フィルム付電子部品用樹脂シートならびに半導体装置およびその製造方法 |
KR102364359B1 (ko) * | 2015-08-21 | 2022-02-17 | 주식회사 케이씨씨 | 반도체 봉지용 에폭시 수지 조성물 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007250970A (ja) * | 2006-03-17 | 2007-09-27 | Hitachi Chem Co Ltd | 半導体素子裏面保護用フィルム及びそれを用いた半導体装置とその製造法 |
JP2012156474A (ja) * | 2011-01-28 | 2012-08-16 | Lintec Corp | 半導体用接着剤組成物、半導体用接着シートおよび半導体装置の製造方法 |
JP2012158653A (ja) * | 2011-01-31 | 2012-08-23 | Lintec Corp | チップ用保護膜形成用シート、半導体チップの製造方法および半導体装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0812859A (ja) * | 1994-06-28 | 1996-01-16 | Matsushita Electric Works Ltd | 封止用エポキシ樹脂組成物 |
JP3441382B2 (ja) * | 1998-10-14 | 2003-09-02 | 日本電信電話株式会社 | 半導体装置の製造方法 |
JP3601443B2 (ja) | 1999-11-30 | 2004-12-15 | 日立化成工業株式会社 | 接着フィルムとその製造方法、半導体搭載用配線基板及び半導体装置 |
JP3604988B2 (ja) * | 2000-02-14 | 2004-12-22 | シャープ株式会社 | 半導体装置およびその製造方法 |
JP3544362B2 (ja) | 2001-03-21 | 2004-07-21 | リンテック株式会社 | 半導体チップの製造方法 |
JP4364508B2 (ja) * | 2002-12-27 | 2009-11-18 | リンテック株式会社 | チップ裏面用保護膜形成用シートおよび保護膜付きチップの製造方法 |
JP2009130233A (ja) * | 2007-11-27 | 2009-06-11 | Furukawa Electric Co Ltd:The | チップ保護用フィルム |
JP2013256547A (ja) * | 2010-10-05 | 2013-12-26 | Sumitomo Bakelite Co Ltd | 液状封止樹脂組成物および半導体パッケージ |
JPWO2012117822A1 (ja) * | 2011-02-28 | 2014-07-07 | 横浜ゴム株式会社 | 加熱硬化性光半導体封止用シリコーン樹脂組成物およびこれを用いる光半導体パッケージ |
-
2013
- 2013-11-29 CN CN201380063148.3A patent/CN104838490B/zh active Active
- 2013-11-29 JP JP2014551079A patent/JP6302843B2/ja active Active
- 2013-11-29 WO PCT/JP2013/082289 patent/WO2014087947A1/ja active Application Filing
- 2013-11-29 KR KR1020157014265A patent/KR102108776B1/ko active IP Right Grant
- 2013-12-03 TW TW102144161A patent/TWI616507B/zh active
-
2015
- 2015-06-01 PH PH12015501225A patent/PH12015501225A1/en unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007250970A (ja) * | 2006-03-17 | 2007-09-27 | Hitachi Chem Co Ltd | 半導体素子裏面保護用フィルム及びそれを用いた半導体装置とその製造法 |
JP2012156474A (ja) * | 2011-01-28 | 2012-08-16 | Lintec Corp | 半導体用接着剤組成物、半導体用接着シートおよび半導体装置の製造方法 |
JP2012158653A (ja) * | 2011-01-31 | 2012-08-23 | Lintec Corp | チップ用保護膜形成用シート、半導体チップの製造方法および半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
KR20150092132A (ko) | 2015-08-12 |
CN104838490A (zh) | 2015-08-12 |
TWI616507B (zh) | 2018-03-01 |
WO2014087947A1 (ja) | 2014-06-12 |
JP6302843B2 (ja) | 2018-03-28 |
PH12015501225A1 (en) | 2015-08-17 |
JPWO2014087947A1 (ja) | 2017-01-05 |
CN104838490B (zh) | 2018-09-25 |
TW201428078A (zh) | 2014-07-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5774799B2 (ja) | 保護膜形成用複合シート | |
KR102541666B1 (ko) | 보호막 형성용 필름 및 보호막 형성용 복합 시트 | |
KR102177881B1 (ko) | 보호막 형성용 필름, 보호막을 구비한 칩 및 보호막을 구비한 칩의 제조 방법 | |
KR102110105B1 (ko) | 보호막 형성용 필름 | |
KR102215668B1 (ko) | 보호막 형성용 복합 시트, 보호막이 있는 칩 및 보호막이 있는 칩의 제조 방법 | |
JP6097308B2 (ja) | 保護膜形成用組成物、保護膜形成用シート、及び硬化保護膜付きチップ | |
WO2015016053A1 (ja) | 保護膜形成用複合シート、保護膜付きチップ、及び保護膜付きチップの製造方法 | |
KR102108776B1 (ko) | 보호막 형성용 필름 | |
JP2014175548A (ja) | 保護膜形成用複合シートおよび保護膜形成用フィルム付チップの製造方法 | |
TWI659505B (zh) | 保護膜形成用膜及具有保護膜的半導體晶片的製造方法 | |
KR102390521B1 (ko) | 보호막 형성용 필름 | |
JP6427791B2 (ja) | チップ用樹脂膜形成用シート及び半導体装置の製造方法 | |
TWI666237B (zh) | 保護膜形成用薄膜 | |
TWI664229B (zh) | 保護膜形成用薄膜 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |