KR102080211B1 - 노광장치 - Google Patents

노광장치 Download PDF

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Publication number
KR102080211B1
KR102080211B1 KR1020147036737A KR20147036737A KR102080211B1 KR 102080211 B1 KR102080211 B1 KR 102080211B1 KR 1020147036737 A KR1020147036737 A KR 1020147036737A KR 20147036737 A KR20147036737 A KR 20147036737A KR 102080211 B1 KR102080211 B1 KR 102080211B1
Authority
KR
South Korea
Prior art keywords
light
light source
light irradiation
irradiation unit
polarizer
Prior art date
Application number
KR1020147036737A
Other languages
English (en)
Korean (ko)
Other versions
KR20150035789A (ko
Inventor
가즈시게 하시모토
도시나리 아라이
요시히로 도미츠카
Original Assignee
브이 테크놀로지 씨오. 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 브이 테크놀로지 씨오. 엘티디 filed Critical 브이 테크놀로지 씨오. 엘티디
Publication of KR20150035789A publication Critical patent/KR20150035789A/ko
Application granted granted Critical
Publication of KR102080211B1 publication Critical patent/KR102080211B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polarising Elements (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
KR1020147036737A 2012-07-03 2013-03-29 노광장치 KR102080211B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-149960 2012-07-03
JP2012149960A JP6119035B2 (ja) 2012-07-03 2012-07-03 露光装置
PCT/JP2013/059575 WO2014006942A1 (ja) 2012-07-03 2013-03-29 露光装置

Publications (2)

Publication Number Publication Date
KR20150035789A KR20150035789A (ko) 2015-04-07
KR102080211B1 true KR102080211B1 (ko) 2020-02-24

Family

ID=49881707

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147036737A KR102080211B1 (ko) 2012-07-03 2013-03-29 노광장치

Country Status (5)

Country Link
JP (1) JP6119035B2 (ja)
KR (1) KR102080211B1 (ja)
CN (1) CN104395831B (ja)
TW (1) TWI588619B (ja)
WO (1) WO2014006942A1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5884776B2 (ja) * 2013-06-22 2016-03-15 ウシオ電機株式会社 光配向用偏光光照射装置
JP2016122120A (ja) * 2014-12-25 2016-07-07 株式会社ブイ・テクノロジー 露光装置
JP6500543B2 (ja) * 2015-03-24 2019-04-17 大日本印刷株式会社 偏光子、光配向装置、および光配向方法
JP6124201B2 (ja) * 2015-07-23 2017-05-10 ウシオ電機株式会社 光配向用偏光光照射方法
JP6601128B2 (ja) * 2015-10-08 2019-11-06 ウシオ電機株式会社 光照射装置及び光照射方法
JP6597149B2 (ja) * 2015-10-08 2019-10-30 ウシオ電機株式会社 光照射装置
JP2018004946A (ja) * 2016-07-01 2018-01-11 株式会社ブイ・テクノロジー 偏光光照射装置
JP6870391B2 (ja) * 2017-03-06 2021-05-12 ウシオ電機株式会社 光照射装置
TW201921131A (zh) * 2017-08-09 2019-06-01 日商Ｖ科技股份有限公司 光配向用曝光裝置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005049461A (ja) * 2003-07-30 2005-02-24 Ricoh Co Ltd 光ビーム記録装置
JP2006323060A (ja) * 2005-05-18 2006-11-30 Ushio Inc 偏光光照射装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04182128A (ja) * 1990-11-16 1992-06-29 Canon Inc 画像形成装置
JPH065496A (ja) * 1992-06-17 1994-01-14 Sumitomo Heavy Ind Ltd 露光均一性向上膜
US5840451A (en) * 1996-12-04 1998-11-24 Advanced Micro Devices, Inc. Individually controllable radiation sources for providing an image pattern in a photolithographic system
JP4036507B2 (ja) * 1997-02-12 2008-01-23 大日本印刷株式会社 プラズマディスプレイパネルの蛍光面形成方法
JP4728536B2 (ja) * 2001-07-05 2011-07-20 株式会社オーク製作所 多重露光描画方法及び多重露光描画装置
CN1842748A (zh) * 2003-08-27 2006-10-04 皇家飞利浦电子股份有限公司 使用光阀阵列和光会聚阵列形成光学图像
JP2011134491A (ja) * 2009-12-22 2011-07-07 Sharp Corp 照射装置及び照射装置の電力回収システム
JP2012130831A (ja) * 2010-12-20 2012-07-12 Harison Toshiba Lighting Corp 紫外線照射モジュールおよび紫外線照射装置
JP2013094737A (ja) * 2011-11-01 2013-05-20 Harison Toshiba Lighting Corp 紫外線照射装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005049461A (ja) * 2003-07-30 2005-02-24 Ricoh Co Ltd 光ビーム記録装置
JP2006323060A (ja) * 2005-05-18 2006-11-30 Ushio Inc 偏光光照射装置

Also Published As

Publication number Publication date
TW201403256A (zh) 2014-01-16
CN104395831A (zh) 2015-03-04
CN104395831B (zh) 2018-07-06
JP2014013277A (ja) 2014-01-23
TWI588619B (zh) 2017-06-21
KR20150035789A (ko) 2015-04-07
JP6119035B2 (ja) 2017-04-26
WO2014006942A1 (ja) 2014-01-09

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