KR102062296B1 - 극자외 광원을 위한 열 모니터 - Google Patents

극자외 광원을 위한 열 모니터 Download PDF

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Publication number
KR102062296B1
KR102062296B1 KR1020157017347A KR20157017347A KR102062296B1 KR 102062296 B1 KR102062296 B1 KR 102062296B1 KR 1020157017347 A KR1020157017347 A KR 1020157017347A KR 20157017347 A KR20157017347 A KR 20157017347A KR 102062296 B1 KR102062296 B1 KR 102062296B1
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South Korea
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temperature
light beam
light
amplified
amplified light
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English (en)
Korean (ko)
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KR20150108820A (ko
Inventor
블라디미르 플루로브
이고르 브이. 포멘코브
샤일렌드라 엔. 스리바스타바
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에이에스엠엘 네델란즈 비.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/005—

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
KR1020157017347A 2013-01-22 2013-12-17 극자외 광원을 위한 열 모니터 Expired - Fee Related KR102062296B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/747,263 2013-01-22
US13/747,263 US9148941B2 (en) 2013-01-22 2013-01-22 Thermal monitor for an extreme ultraviolet light source
PCT/US2013/075871 WO2014116371A1 (en) 2013-01-22 2013-12-17 Thermal monitor for an extreme ultraviolet light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020197038651A Division KR102100789B1 (ko) 2013-01-22 2013-12-17 극자외 광원을 위한 열 모니터

Publications (2)

Publication Number Publication Date
KR20150108820A KR20150108820A (ko) 2015-09-30
KR102062296B1 true KR102062296B1 (ko) 2020-01-03

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Application Number Title Priority Date Filing Date
KR1020157017347A Expired - Fee Related KR102062296B1 (ko) 2013-01-22 2013-12-17 극자외 광원을 위한 열 모니터
KR1020197038651A Active KR102100789B1 (ko) 2013-01-22 2013-12-17 극자외 광원을 위한 열 모니터

Family Applications After (1)

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KR1020197038651A Active KR102100789B1 (ko) 2013-01-22 2013-12-17 극자외 광원을 위한 열 모니터

Country Status (5)

Country Link
US (1) US9148941B2 (https=)
JP (1) JP6250067B2 (https=)
KR (2) KR102062296B1 (https=)
TW (1) TWI611427B (https=)
WO (1) WO2014116371A1 (https=)

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US9927292B2 (en) 2015-04-23 2018-03-27 Asml Netherlands B.V. Beam position sensor
US10021773B2 (en) * 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
US10109451B2 (en) * 2017-02-13 2018-10-23 Applied Materials, Inc. Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus
US10128017B1 (en) * 2017-05-12 2018-11-13 Asml Netherlands B.V. Apparatus for and method of controlling debris in an EUV light source
NL2021083A (en) 2017-06-23 2019-01-02 Asml Netherlands Bv Radiation Source Module and Lithographic Apparatus
US10824083B2 (en) 2017-09-28 2020-11-03 Taiwan Semiconductor Manufacturing Co., Ltd. Light source, EUV lithography system, and method for generating EUV radiation
WO2019162038A1 (en) * 2018-02-20 2019-08-29 Asml Netherlands B.V. Sensor system
WO2019186754A1 (ja) * 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US20200057376A1 (en) * 2018-08-14 2020-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and lithography method
WO2020126387A2 (en) 2018-12-18 2020-06-25 Asml Netherlands B.V. Sacrifical device for protecting an optical element in a path of a high-power laser beam
BE1031741B1 (nl) * 2023-06-27 2025-02-04 Newson Nv Lichtrichtapparaat met verbeterd temperatuurbeheer

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JP2010161092A (ja) 2009-01-06 2010-07-22 Komatsu Ltd 極端紫外光源装置

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US20070278194A1 (en) 2004-08-05 2007-12-06 Kuka Schweissanlagen Gmbh Laser Device And Operating Method
JP2010161092A (ja) 2009-01-06 2010-07-22 Komatsu Ltd 極端紫外光源装置
JP2010161318A (ja) 2009-01-09 2010-07-22 Komatsu Ltd 極端紫外光源装置

Also Published As

Publication number Publication date
US9148941B2 (en) 2015-09-29
TWI611427B (zh) 2018-01-11
JP2016509343A (ja) 2016-03-24
WO2014116371A1 (en) 2014-07-31
KR102100789B1 (ko) 2020-04-16
US20140203195A1 (en) 2014-07-24
TW201435912A (zh) 2014-09-16
KR20200003271A (ko) 2020-01-08
JP6250067B2 (ja) 2017-12-20
KR20150108820A (ko) 2015-09-30

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