KR101980919B1 - 착색제, 컬러 필터용 착색 조성물, 컬러 필터 및 표시 소자 - Google Patents

착색제, 컬러 필터용 착색 조성물, 컬러 필터 및 표시 소자 Download PDF

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Publication number
KR101980919B1
KR101980919B1 KR1020130015689A KR20130015689A KR101980919B1 KR 101980919 B1 KR101980919 B1 KR 101980919B1 KR 1020130015689 A KR1020130015689 A KR 1020130015689A KR 20130015689 A KR20130015689 A KR 20130015689A KR 101980919 B1 KR101980919 B1 KR 101980919B1
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South Korea
Prior art keywords
group
chromophore
colorant
color filter
acid
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KR1020130015689A
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English (en)
Korean (ko)
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KR20130094746A (ko
Inventor
에이지 요네다
사또시 에바따
히데유끼 요시자와
유까리 야마구찌
아쯔시 이또
야스노리 가와베
Original Assignee
제이에스알 가부시끼가이샤
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Publication of KR20130094746A publication Critical patent/KR20130094746A/ko
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Publication of KR101980919B1 publication Critical patent/KR101980919B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04B—TRANSMISSION
    • H04B7/00—Radio transmission systems, i.e. using radiation field
    • H04B7/14—Relay systems
    • H04B7/15—Active relay systems
    • H04B7/204—Multiple access
    • H04B7/208—Frequency-division multiple access [FDMA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04L—TRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L27/00—Modulated-carrier systems
    • H04L27/26—Systems using multi-frequency codes
    • H04L27/2601—Multicarrier modulation systems
    • H04L27/2614—Peak power aspects
    • H04L27/2623—Reduction thereof by clipping
    • H04L27/2624—Reduction thereof by clipping by soft clipping

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
KR1020130015689A 2012-02-16 2013-02-14 착색제, 컬러 필터용 착색 조성물, 컬러 필터 및 표시 소자 KR101980919B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2012-031960 2012-02-16
JP2012031960 2012-02-16

Publications (2)

Publication Number Publication Date
KR20130094746A KR20130094746A (ko) 2013-08-26
KR101980919B1 true KR101980919B1 (ko) 2019-05-21

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Family Applications (1)

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KR1020130015689A KR101980919B1 (ko) 2012-02-16 2013-02-14 착색제, 컬러 필터용 착색 조성물, 컬러 필터 및 표시 소자

Country Status (4)

Country Link
JP (3) JP6368068B2 (ja)
KR (1) KR101980919B1 (ja)
CN (1) CN103257525B (ja)
TW (1) TWI612104B (ja)

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JP6498936B2 (ja) * 2012-12-19 2019-04-10 株式会社Adeka 着色感光性組成物
JP6256126B2 (ja) * 2014-03-13 2018-01-10 大日本印刷株式会社 色材分散組成物、カラーフィルタ、液晶表示装置、及び有機発光表示装置
JP6418590B2 (ja) * 2014-05-30 2018-11-07 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 化合物及び着色硬化性樹脂組成物
JP2017025305A (ja) * 2015-07-21 2017-02-02 Jsr株式会社 着色剤及びその製造方法、着色組成物、着色硬化膜並びに表示素子
JP6844146B2 (ja) * 2016-08-09 2021-03-17 Jsr株式会社 着色剤、着色組成物、着色硬化膜、表示素子、固体撮像素子、化合物及び重合体
KR101998777B1 (ko) * 2017-01-13 2019-07-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치
KR102027036B1 (ko) * 2017-11-28 2019-09-30 주식회사 엘지화학 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
KR102025478B1 (ko) * 2017-11-28 2019-09-25 주식회사 엘지화학 착색제 조성물 제조방법, 이를 이용하여 제조된 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
JP6951994B2 (ja) * 2018-03-22 2021-10-20 株式会社日本触媒 新規重合体
JP2022132057A (ja) 2021-02-26 2022-09-07 保土谷化学工業株式会社 キサンテン色素、該色素を含有する着色組成物、カラーフィルター用着色剤およびカラーフィルター
JP2024132917A (ja) 2023-03-15 2024-10-01 保土谷化学工業株式会社 アンモニウムカチオンとキサンテン色素からなる酸性色素、該酸性色素を含有する着色組成物、カラーフィルター用着色剤およびカラーフィルター

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Publication number Priority date Publication date Assignee Title
JP2003082426A (ja) 2001-09-12 2003-03-19 Fuji Photo Film Co Ltd 平版印刷版用支持体および平版印刷版原版
US20060030738A1 (en) * 2004-08-06 2006-02-09 Luc Vanmaele Device provided with a dedicated dye compound
JP2012013758A (ja) * 2010-06-29 2012-01-19 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用青色着色組成物、およびカラー固体撮像素子に用いるカラーフィルタ

Also Published As

Publication number Publication date
TW201341478A (zh) 2013-10-16
KR20130094746A (ko) 2013-08-26
JP6365640B2 (ja) 2018-08-01
JP2017083852A (ja) 2017-05-18
JP2018150539A (ja) 2018-09-27
CN103257525B (zh) 2018-05-18
TWI612104B (zh) 2018-01-21
CN103257525A (zh) 2013-08-21
JP6368068B2 (ja) 2018-08-01
JP6572990B2 (ja) 2019-09-11
JP2013190776A (ja) 2013-09-26

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