KR101968256B1 - 진공 성막 장치 - Google Patents

진공 성막 장치 Download PDF

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Publication number
KR101968256B1
KR101968256B1 KR1020137004774A KR20137004774A KR101968256B1 KR 101968256 B1 KR101968256 B1 KR 101968256B1 KR 1020137004774 A KR1020137004774 A KR 1020137004774A KR 20137004774 A KR20137004774 A KR 20137004774A KR 101968256 B1 KR101968256 B1 KR 101968256B1
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KR
South Korea
Prior art keywords
vacuum
film forming
door
substrate
opening
Prior art date
Application number
KR1020137004774A
Other languages
English (en)
Korean (ko)
Other versions
KR20140053803A (ko
Inventor
하야토 아마쿠
Original Assignee
신메이와 인더스트리즈,리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 신메이와 인더스트리즈,리미티드 filed Critical 신메이와 인더스트리즈,리미티드
Publication of KR20140053803A publication Critical patent/KR20140053803A/ko
Application granted granted Critical
Publication of KR101968256B1 publication Critical patent/KR101968256B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020137004774A 2011-08-30 2011-08-30 진공 성막 장치 KR101968256B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2011/004819 WO2013030872A1 (ja) 2011-08-30 2011-08-30 真空成膜装置

Publications (2)

Publication Number Publication Date
KR20140053803A KR20140053803A (ko) 2014-05-08
KR101968256B1 true KR101968256B1 (ko) 2019-04-12

Family

ID=47755435

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137004774A KR101968256B1 (ko) 2011-08-30 2011-08-30 진공 성막 장치

Country Status (4)

Country Link
JP (1) JP5816189B2 (ja)
KR (1) KR101968256B1 (ja)
CN (1) CN103097569B (ja)
WO (1) WO2013030872A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013125159A1 (ja) * 2012-02-20 2013-08-29 新明和工業株式会社 搬送システム
CN109267033A (zh) * 2018-12-07 2019-01-25 沈阳爱科斯科技有限公司 蒸发镀膜装置及镀膜系统

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004099947A (ja) 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
JP2004099948A (ja) 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
JP2006225709A (ja) 2005-02-17 2006-08-31 Shin Meiwa Ind Co Ltd 真空処理システム

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2804849B2 (ja) * 1989-12-26 1998-09-30 株式会社日立製作所 赤外線温度画像測定装置及びそれを備えた成膜装置
JPH05271935A (ja) * 1992-03-26 1993-10-19 Shin Meiwa Ind Co Ltd 連続成膜用真空蒸着装置
JP3595272B2 (ja) * 1993-03-15 2004-12-02 株式会社神戸製鋼所 アークイオンプレーティング装置
JP4246570B2 (ja) 2003-08-26 2009-04-02 新明和工業株式会社 真空成膜装置
JP4665155B2 (ja) * 2004-10-22 2011-04-06 株式会社昭和真空 薄膜形成装置及びその方法
WO2009084408A1 (ja) 2007-12-28 2009-07-09 Ulvac, Inc. 成膜装置及び成膜方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004099947A (ja) 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
JP2004099948A (ja) 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
JP2006225709A (ja) 2005-02-17 2006-08-31 Shin Meiwa Ind Co Ltd 真空処理システム

Also Published As

Publication number Publication date
JPWO2013030872A1 (ja) 2015-03-23
KR20140053803A (ko) 2014-05-08
CN103097569B (zh) 2016-06-22
CN103097569A (zh) 2013-05-08
WO2013030872A1 (ja) 2013-03-07
JP5816189B2 (ja) 2015-11-18

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