CN103097569B - 真空成膜装置 - Google Patents

真空成膜装置 Download PDF

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Publication number
CN103097569B
CN103097569B CN201180042876.7A CN201180042876A CN103097569B CN 103097569 B CN103097569 B CN 103097569B CN 201180042876 A CN201180042876 A CN 201180042876A CN 103097569 B CN103097569 B CN 103097569B
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CN
China
Prior art keywords
base material
vacuum
film formation
formation apparatus
vacuum tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180042876.7A
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English (en)
Chinese (zh)
Other versions
CN103097569A (zh
Inventor
天久勇人
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinmaywa Industries Ltd
Original Assignee
Shinmaywa Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinmaywa Industries Ltd filed Critical Shinmaywa Industries Ltd
Publication of CN103097569A publication Critical patent/CN103097569A/zh
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Publication of CN103097569B publication Critical patent/CN103097569B/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CN201180042876.7A 2011-08-30 2011-08-30 真空成膜装置 Active CN103097569B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2011/004819 WO2013030872A1 (ja) 2011-08-30 2011-08-30 真空成膜装置

Publications (2)

Publication Number Publication Date
CN103097569A CN103097569A (zh) 2013-05-08
CN103097569B true CN103097569B (zh) 2016-06-22

Family

ID=47755435

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180042876.7A Active CN103097569B (zh) 2011-08-30 2011-08-30 真空成膜装置

Country Status (4)

Country Link
JP (1) JP5816189B2 (ja)
KR (1) KR101968256B1 (ja)
CN (1) CN103097569B (ja)
WO (1) WO2013030872A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013125159A1 (ja) * 2012-02-20 2013-08-29 新明和工業株式会社 搬送システム
CN109267033A (zh) * 2018-12-07 2019-01-25 沈阳爱科斯科技有限公司 蒸发镀膜装置及镀膜系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04174327A (ja) * 1989-12-26 1992-06-22 Hitachi Ltd 赤外線温度画像測定装置及びそれを備えた成膜装置
JPH05271935A (ja) * 1992-03-26 1993-10-19 Shin Meiwa Ind Co Ltd 連続成膜用真空蒸着装置
JP2004099947A (ja) * 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
CN101044260A (zh) * 2004-10-22 2007-09-26 株式会社昭和真空 薄膜形成装置及其方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3595272B2 (ja) * 1993-03-15 2004-12-02 株式会社神戸製鋼所 アークイオンプレーティング装置
JP2004099948A (ja) * 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
JP4246570B2 (ja) 2003-08-26 2009-04-02 新明和工業株式会社 真空成膜装置
JP2006225709A (ja) * 2005-02-17 2006-08-31 Shin Meiwa Ind Co Ltd 真空処理システム
JP5167282B2 (ja) 2007-12-28 2013-03-21 株式会社アルバック 成膜装置及び成膜方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04174327A (ja) * 1989-12-26 1992-06-22 Hitachi Ltd 赤外線温度画像測定装置及びそれを備えた成膜装置
JPH05271935A (ja) * 1992-03-26 1993-10-19 Shin Meiwa Ind Co Ltd 連続成膜用真空蒸着装置
JP2004099947A (ja) * 2002-09-06 2004-04-02 Shincron:Kk 薄膜形成装置
CN101044260A (zh) * 2004-10-22 2007-09-26 株式会社昭和真空 薄膜形成装置及其方法

Also Published As

Publication number Publication date
JPWO2013030872A1 (ja) 2015-03-23
JP5816189B2 (ja) 2015-11-18
KR20140053803A (ko) 2014-05-08
KR101968256B1 (ko) 2019-04-12
CN103097569A (zh) 2013-05-08
WO2013030872A1 (ja) 2013-03-07

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