KR101946643B1 - 착색 감광성 수지 조성물 - Google Patents

착색 감광성 수지 조성물 Download PDF

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Publication number
KR101946643B1
KR101946643B1 KR1020120037728A KR20120037728A KR101946643B1 KR 101946643 B1 KR101946643 B1 KR 101946643B1 KR 1020120037728 A KR1020120037728 A KR 1020120037728A KR 20120037728 A KR20120037728 A KR 20120037728A KR 101946643 B1 KR101946643 B1 KR 101946643B1
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KR
South Korea
Prior art keywords
group
parts
copolymer
carbon atoms
resin composition
Prior art date
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KR1020120037728A
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English (en)
Korean (ko)
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KR20120117658A (ko
Inventor
다카키요 데라카와
야스유키 기류
Original Assignee
스미또모 가가꾸 가부시끼가이샤
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Publication of KR20120117658A publication Critical patent/KR20120117658A/ko
Application granted granted Critical
Publication of KR101946643B1 publication Critical patent/KR101946643B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033—Blends of pigments; Mixtured crystals; Solid solutions
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
KR1020120037728A 2011-04-15 2012-04-12 착색 감광성 수지 조성물 KR101946643B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011090788 2011-04-15
JPJP-P-2011-090788 2011-04-15

Publications (2)

Publication Number Publication Date
KR20120117658A KR20120117658A (ko) 2012-10-24
KR101946643B1 true KR101946643B1 (ko) 2019-02-11

Family

ID=46992142

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120037728A KR101946643B1 (ko) 2011-04-15 2012-04-12 착색 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP6094050B2 (zh)
KR (1) KR101946643B1 (zh)
CN (2) CN108845481A (zh)
TW (1) TWI575312B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102914943B (zh) * 2011-08-04 2018-01-12 住友化学株式会社 着色固化性树脂组合物
JP2013036006A (ja) * 2011-08-11 2013-02-21 Sumitomo Chemical Co Ltd 化合物
WO2013089197A1 (ja) * 2011-12-14 2013-06-20 日本化薬株式会社 キサンテン化合物
JP2013205834A (ja) * 2012-03-29 2013-10-07 Fujifilm Corp 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに画像表示装置
KR20150103210A (ko) * 2013-02-13 2015-09-09 후지필름 가부시키가이샤 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법, 경화막, 액정 표시 장치 및 유기 el 표시 장치
JP2018009043A (ja) * 2014-11-14 2018-01-18 昭和電工株式会社 樹脂組成物、その製造方法、カラーフィルター及び画像表示素子
KR102555416B1 (ko) * 2015-03-30 2023-07-13 스미또모 가가꾸 가부시키가이샤 착색 경화성 수지 조성물
TWI696889B (zh) * 2015-06-30 2020-06-21 南韓商東友精細化工有限公司 著色固化性樹脂組合物、濾色器和液晶顯示裝置
TWI721087B (zh) * 2016-01-27 2021-03-11 日商住友化學股份有限公司 著色硬化性樹脂組成物、彩色濾光片及含有該濾光片之顯示裝置
US10101655B2 (en) 2016-02-26 2018-10-16 Samsung Sdi Co., Ltd. Compound, polymer, photosensitive resin composition, and color filter
JP6971055B2 (ja) * 2016-07-20 2021-11-24 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. 青色硬化性樹脂組成物、カラーフィルタ、及び表示装置
KR102025478B1 (ko) 2017-11-28 2019-09-25 주식회사 엘지화학 착색제 조성물 제조방법, 이를 이용하여 제조된 착색제 조성물, 착색제 분산액, 감광성 수지 조성물, 컬러필터 및 액정 표시 장치
KR102355812B1 (ko) * 2017-12-05 2022-01-26 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러필터 및 화상표시장치
KR20210069007A (ko) * 2019-12-02 2021-06-10 주식회사 엘지화학 착색제 조성물, 감광성 수지 조성물, 감광재, 컬러필터 및 액정 표시 장치

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3841497B2 (ja) * 1996-05-17 2006-11-01 凸版印刷株式会社 感光性着色組成物
JP2002062651A (ja) * 2000-08-18 2002-02-28 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルタ
JP2002072475A (ja) * 2000-08-28 2002-03-12 Mitsubishi Chemicals Corp 光重合性組成物及びそれを用いたカラーフィルター
US7371783B2 (en) * 2001-09-25 2008-05-13 Nippon Shokubai Co., Ltd. Alkali-soluble maleimide copolymer and liquid crystal display comprising the same
JP4645346B2 (ja) * 2005-07-29 2011-03-09 住友化学株式会社 感光性樹脂組成物
JP4788485B2 (ja) * 2006-06-13 2011-10-05 住友化学株式会社 着色感光性樹脂組成物
JP2008009121A (ja) * 2006-06-29 2008-01-17 Sumitomo Chemical Co Ltd ポジ型着色感放射線性樹脂組成物
JP2008242311A (ja) * 2007-03-28 2008-10-09 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
JP5481844B2 (ja) * 2007-12-14 2014-04-23 住友化学株式会社 着色感光性樹脂組成物
JP2009175451A (ja) * 2008-01-24 2009-08-06 Sumitomo Chemical Co Ltd 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子
TWI455984B (zh) * 2008-05-30 2014-10-11 Sumitomo Chemical Co 著色硬化性組成物
JP5504627B2 (ja) * 2008-07-01 2014-05-28 住友化学株式会社 着色感光性樹脂組成物
CN101625525B (zh) * 2008-07-11 2013-06-12 住友化学株式会社 感光性树脂组合物
TWI501027B (zh) * 2008-11-18 2015-09-21 Sumitomo Chemical Co Photosensitive resin composition and display device
TWI475320B (zh) * 2009-02-13 2015-03-01 Sumitomo Chemical Co 著色感光性樹脂組成物及彩色濾光片
TW201036941A (en) * 2009-03-30 2010-10-16 Sumitomo Chemical Co Method for producing sulfonamide compound
JP2011022237A (ja) * 2009-07-14 2011-02-03 Toppan Printing Co Ltd 青色感光性着色組成物及びそれを用いたカラーフィルタ並びにカラー表示装置
JP5957905B2 (ja) * 2011-02-25 2016-07-27 Jsr株式会社 画素パターンの形成方法、カラーフィルタ、表示素子及び着色感放射線性組成物

Also Published As

Publication number Publication date
TWI575312B (zh) 2017-03-21
JP2012230365A (ja) 2012-11-22
KR20120117658A (ko) 2012-10-24
TW201303491A (zh) 2013-01-16
CN108845481A (zh) 2018-11-20
CN102736416A (zh) 2012-10-17
JP6094050B2 (ja) 2017-03-15

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GRNT Written decision to grant