KR101946071B1 - 불소 함유 말레이미드 화합물 및 그의 제조 방법 - Google Patents
불소 함유 말레이미드 화합물 및 그의 제조 방법 Download PDFInfo
- Publication number
- KR101946071B1 KR101946071B1 KR1020130020357A KR20130020357A KR101946071B1 KR 101946071 B1 KR101946071 B1 KR 101946071B1 KR 1020130020357 A KR1020130020357 A KR 1020130020357A KR 20130020357 A KR20130020357 A KR 20130020357A KR 101946071 B1 KR101946071 B1 KR 101946071B1
- Authority
- KR
- South Korea
- Prior art keywords
- compound
- fluorine
- group
- halogen
- general formula
- Prior art date
Links
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 71
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 239000011737 fluorine Substances 0.000 title claims abstract description 69
- -1 maleimide compound Chemical class 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 23
- 125000003709 fluoroalkyl group Chemical group 0.000 claims abstract description 22
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims description 89
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 20
- 229910052736 halogen Inorganic materials 0.000 claims description 19
- 150000002367 halogens Chemical class 0.000 claims description 19
- 125000005843 halogen group Chemical group 0.000 claims description 14
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 13
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 13
- 229910052794 bromium Inorganic materials 0.000 claims description 13
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 12
- 229910052801 chlorine Inorganic materials 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 12
- 239000011630 iodine Substances 0.000 claims description 12
- 229910052740 iodine Inorganic materials 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000003342 alkenyl group Chemical group 0.000 claims description 8
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 8
- 125000000962 organic group Chemical group 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 238000005804 alkylation reaction Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 3
- 229920000570 polyether Polymers 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 125000001153 fluoro group Chemical group F* 0.000 abstract description 6
- 239000007788 liquid Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 15
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 238000005481 NMR spectroscopy Methods 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 11
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 10
- 238000010992 reflux Methods 0.000 description 10
- 239000005871 repellent Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 230000005764 inhibitory process Effects 0.000 description 8
- 239000003921 oil Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000007259 addition reaction Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 150000002222 fluorine compounds Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 5
- DMAYBPBPEUFIHJ-UHFFFAOYSA-N 4-bromobut-1-ene Chemical compound BrCCC=C DMAYBPBPEUFIHJ-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 229910000027 potassium carbonate Inorganic materials 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- 238000007126 N-alkylation reaction Methods 0.000 description 3
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 230000029936 alkylation Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 238000006471 dimerization reaction Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 238000005292 vacuum distillation Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- OKIYQFLILPKULA-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4-nonafluoro-4-methoxybutane Chemical class COC(F)(F)C(F)(F)C(F)(F)C(F)(F)F OKIYQFLILPKULA-UHFFFAOYSA-N 0.000 description 1
- NNQDMQVWOWCVEM-UHFFFAOYSA-N 1-bromoprop-1-ene Chemical compound CC=CBr NNQDMQVWOWCVEM-UHFFFAOYSA-N 0.000 description 1
- MEKOFIRRDATTAG-UHFFFAOYSA-N 2,2,5,8-tetramethyl-3,4-dihydrochromen-6-ol Chemical compound C1CC(C)(C)OC2=C1C(C)=C(O)C=C2C MEKOFIRRDATTAG-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- DSVRVHYFPPQFTI-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane;platinum Chemical compound [Pt].C[Si](C)(C)O[Si](C)(C=C)C=C DSVRVHYFPPQFTI-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000011085 pressure filtration Methods 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2012-039682 | 2012-02-27 | ||
JP2012039682A JP5607091B2 (ja) | 2012-02-27 | 2012-02-27 | 含フッ素マレイミド化合物及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20130098218A KR20130098218A (ko) | 2013-09-04 |
KR101946071B1 true KR101946071B1 (ko) | 2019-02-08 |
Family
ID=49090445
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020130020357A KR101946071B1 (ko) | 2012-02-27 | 2013-02-26 | 불소 함유 말레이미드 화합물 및 그의 제조 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5607091B2 (zh) |
KR (1) | KR101946071B1 (zh) |
CN (1) | CN103288866B (zh) |
TW (1) | TWI557132B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102003189B1 (ko) * | 2015-03-18 | 2019-07-23 | 리껭테크노스 가부시키가이샤 | 하드 코트 적층 필름 및 이의 제조 방법 |
JP2023077454A (ja) * | 2021-11-25 | 2023-06-06 | 信越化学工業株式会社 | イミド結合及び重合性不飽和結合含有環状オルガノシロキサン、及びそれを含む硬化性樹脂組成物 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3281030B2 (ja) | 1992-05-08 | 2002-05-13 | 株式会社メニコン | 眼用レンズ材料 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0796591B2 (ja) * | 1988-07-22 | 1995-10-18 | 信越化学工業株式会社 | フッ化ビニリデン系グラフト共重合体の製造方法 |
JPH0756125A (ja) * | 1993-08-11 | 1995-03-03 | Toray Ind Inc | コンタクトレンズ |
JP2000143983A (ja) * | 1998-11-06 | 2000-05-26 | Tomoegawa Paper Co Ltd | 回路積層材料 |
JP2000212189A (ja) * | 1999-01-18 | 2000-08-02 | Aisin Seiki Co Ltd | O―シリル化アリ―ルマレイミドの製造 |
US20060009578A1 (en) * | 2004-07-07 | 2006-01-12 | Dershem Stephen M | Compositions containing maleimide-substituted silsesquioxanes and methods for use thereof |
CN101223181A (zh) * | 2006-03-02 | 2008-07-16 | 设计分子有限公司 | 含有环硅氧烷的粘合剂组合物 |
US7777064B2 (en) * | 2006-03-02 | 2010-08-17 | Designer Molecules, Inc. | Adhesive compositions containing cyclic siloxanes and methods for use thereof |
US20100113643A1 (en) * | 2007-04-09 | 2010-05-06 | Designer Molecules, Inc. | Curatives for epoxy adhesive compositions |
CN102020846B (zh) * | 2010-09-29 | 2014-03-19 | 北京化工大学 | 糠胺型苯并噁嗪树脂/马来酰亚胺化合物组合物 |
-
2012
- 2012-02-27 JP JP2012039682A patent/JP5607091B2/ja active Active
-
2013
- 2013-02-25 TW TW102106599A patent/TWI557132B/zh active
- 2013-02-26 KR KR1020130020357A patent/KR101946071B1/ko active IP Right Grant
- 2013-02-26 CN CN201310060694.3A patent/CN103288866B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3281030B2 (ja) | 1992-05-08 | 2002-05-13 | 株式会社メニコン | 眼用レンズ材料 |
Also Published As
Publication number | Publication date |
---|---|
KR20130098218A (ko) | 2013-09-04 |
TWI557132B (zh) | 2016-11-11 |
TW201402589A (zh) | 2014-01-16 |
JP5607091B2 (ja) | 2014-10-15 |
JP2013173700A (ja) | 2013-09-05 |
CN103288866B (zh) | 2016-09-14 |
CN103288866A (zh) | 2013-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN106065070B (zh) | 含有氟聚醚的聚合物改性硅烷、表面处理剂和处理过的物品 | |
JP4742216B2 (ja) | ケイ素化合物 | |
JP5369629B2 (ja) | 架橋性ケイ素化合物、その製造方法、架橋性組成物、シロキサンポリマー、シリコーン膜、該架橋性ケイ素化合物の原料となるケイ素化合物、及びその製造方法 | |
CN106243340B (zh) | 含有氟聚醚的聚合物改性硅烷 | |
JP6119656B2 (ja) | フルオロポリエーテル基含有ポリマー | |
KR20150083024A (ko) | 표면 개질제 및 물품 | |
JPH10501022A (ja) | 官能化ポリオルガノシロキサン及びその一つの製造方法 | |
KR20120073259A (ko) | 플루오로실리콘과 그 유도체들의 합성 | |
WO2018216404A1 (ja) | 含フッ素コーティング剤組成物及び該組成物を含有する表面処理剤並びに物品 | |
JP6848712B2 (ja) | 含フッ素アクリル化合物及びその製造方法 | |
KR101946071B1 (ko) | 불소 함유 말레이미드 화합물 및 그의 제조 방법 | |
JP6347710B2 (ja) | 硬化性組成物及び光学部品 | |
KR20170042476A (ko) | 모노 관능성 분지형 오르가노실록산 화합물 및 그의 제조 방법 | |
RU2296767C1 (ru) | Функциональные металлосилоксаны и способ их получения | |
WO2016170850A1 (ja) | エポキシ基含有環状オルガノシロキサン | |
JP5890288B2 (ja) | 新規有機珪素化合物の製造方法 | |
WO2022186266A1 (ja) | 化合物、化合物の製造方法及び表面処理剤の製造方法 | |
CN107922442B (zh) | 具有(甲基)丙烯酸酯基团的有机硅化合物及用于制备其的方法 | |
JP2019210373A (ja) | 側鎖に変性基を有する両末端(メタ)アクリルアミド基含有オルガノポリシロキサンの製造方法 | |
JP2012082303A (ja) | 硬化性組成物 | |
WO2022239705A1 (ja) | 含フッ素オルガノ水素シラン化合物 | |
JPH05339505A (ja) | 硬化性シリコーン組成物及びその硬化物 | |
JP6801152B2 (ja) | アミノアルキル及び不飽和末端を有する二官能性ポリ(アルキレンオキシド)並びにその誘導体 | |
KR20170140992A (ko) | 플루오로알킬기 또는 퍼플루오로알킬 이더기 치환 비스(실릴)알칸 실리콘 결합제 및 그의 제조방법 | |
WO2024075458A1 (ja) | フルオロポリエーテル基含有ポリマー |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |