KR101925813B1 - 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서 - Google Patents

착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서 Download PDF

Info

Publication number
KR101925813B1
KR101925813B1 KR1020167032230A KR20167032230A KR101925813B1 KR 101925813 B1 KR101925813 B1 KR 101925813B1 KR 1020167032230 A KR1020167032230 A KR 1020167032230A KR 20167032230 A KR20167032230 A KR 20167032230A KR 101925813 B1 KR101925813 B1 KR 101925813B1
Authority
KR
South Korea
Prior art keywords
colorant
group
polymerizable compound
coloring composition
mass
Prior art date
Application number
KR1020167032230A
Other languages
English (en)
Korean (ko)
Other versions
KR20160146873A (ko
Inventor
히로타카 타키시타
테츠야 카미무라
토시히데 에조에
카즈토 시마다
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20160146873A publication Critical patent/KR20160146873A/ko
Application granted granted Critical
Publication of KR101925813B1 publication Critical patent/KR101925813B1/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Solid State Image Pick-Up Elements (AREA)
KR1020167032230A 2014-05-27 2015-04-17 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서 KR101925813B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-109205 2014-05-27
JP2014109205 2014-05-27
PCT/JP2015/061804 WO2015182277A1 (ja) 2014-05-27 2015-04-17 着色組成物、膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子および赤外線センサ

Publications (2)

Publication Number Publication Date
KR20160146873A KR20160146873A (ko) 2016-12-21
KR101925813B1 true KR101925813B1 (ko) 2018-12-06

Family

ID=54698618

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167032230A KR101925813B1 (ko) 2014-05-27 2015-04-17 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서

Country Status (4)

Country Link
JP (1) JP6325097B2 (zh)
KR (1) KR101925813B1 (zh)
TW (1) TWI660238B (zh)
WO (1) WO2015182277A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6777996B2 (ja) * 2016-02-10 2020-10-28 東洋インキＳｃホールディングス株式会社 固体撮像素子向け赤外線透過フィルタ用感光性着色組成物、固体撮像素子向けカラーフィルタ、及び固体撮像素子
WO2018043218A1 (ja) * 2016-08-30 2018-03-08 富士フイルム株式会社 感光性組成物、硬化膜、光学フィルタ、積層体、パターン形成方法、固体撮像素子、画像表示装置および赤外線センサ
JP7167429B2 (ja) * 2017-01-16 2022-11-09 東洋インキＳｃホールディングス株式会社 感光性着色組成物、カラーフィルタ用感光性着色組成物、およびカラーフィルタ
TW201827507A (zh) * 2017-01-25 2018-08-01 日商富士軟片股份有限公司 硬化性組成物、化合物、硬化膜、硬化膜之製造方法、濾色器之製造方法、固態攝影元件及紅外線感測器
TWI756347B (zh) * 2017-01-30 2022-03-01 日商富士軟片股份有限公司 組成物、膜、紅外線透過濾波器、固體攝像元件、圖像顯示裝置及紅外線感測器
KR102252721B1 (ko) * 2017-06-02 2021-05-17 후지필름 가부시키가이샤 경화성 조성물, 막, 근적외선 차단 필터, 고체 촬상 소자, 화상 표시 장치 및 적외선 센서
EP3805822A4 (en) * 2018-06-01 2022-05-11 Toray Industries, Inc. COLORED RESIN COMPOSITION, METHOD FOR PREPARING IT, PROTECTIVE FILM AGAINST NEAR INFRARED TRANSMISSION LIGHT AND DECORATIVE SUBSTRATE
WO2021029195A1 (ja) * 2019-08-13 2021-02-18 富士フイルム株式会社 組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、カメラモジュール、並びに、化合物
JP7494481B2 (ja) * 2020-02-17 2024-06-04 ａｒｔｉｅｎｃｅ株式会社 赤外線透過型着色組成物、赤外線透過フィルタ、赤外線カメラ、および赤外線センサ
JP7512673B2 (ja) * 2020-05-21 2024-07-09 ａｒｔｉｅｎｃｅ株式会社 赤外線透過型着色組成物、赤外線フィルタ、赤外線カメラ、および赤外線センサ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009069822A (ja) * 2007-08-22 2009-04-02 Mitsubishi Chemicals Corp 樹脂ブラックマトリックス、遮光性感光性樹脂組成物、ｔｆｔ素子基板及び液晶表示装置
JP2013054079A (ja) * 2011-08-31 2013-03-21 Fujifilm Corp 光硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05202109A (ja) * 1991-07-10 1993-08-10 Seiko Epson Corp 透明プラスチック材料
JPH0860044A (ja) * 1994-08-25 1996-03-05 Three Bond Co Ltd 光硬化型パテ材
JPH09302265A (ja) * 1996-05-16 1997-11-25 Toppan Printing Co Ltd 遮光膜形成用着色樹脂組成物、アレイ基板素子及び液晶表示装置
EP1219684B1 (en) * 2000-12-26 2005-10-12 Dainichiseika Color & Chemicals Mfg. Co. Ltd. Near-infrared transmitting black azo pigments
JP4084023B2 (ja) * 2001-03-22 2008-04-30 大日精化工業株式会社 近赤外線透過性黒色アゾ顔料および顔料組成物
JP4348872B2 (ja) * 2001-03-28 2009-10-21 住友金属鉱山株式会社 積層体と可視光吸収膜を有する構造体および可視光吸収インク
WO2004019084A1 (ja) * 2001-03-28 2004-03-04 Sumitomo Metal Mining Co.,Ltd. 可視光吸収膜とこの可視光吸収膜を有する構造体および可視光吸収膜を形成する可視光吸収インク
JP4034588B2 (ja) * 2001-12-25 2008-01-16 旭化成ケミカルズ株式会社 感光性を有する着色性組成物およびその硬化物
JP4122010B2 (ja) * 2004-11-12 2008-07-23 東海光学株式会社 赤外線受発光部
JP2006301147A (ja) * 2005-04-19 2006-11-02 Mitsubishi Engineering Plastics Corp 光ビーコンフィルター用樹脂組成物
JP4816096B2 (ja) * 2006-01-20 2011-11-16 セイコーエプソン株式会社 重合性組成物、光学材料、光学用フィルター、及び、プラスチックレンズ
JP2012032697A (ja) * 2010-08-02 2012-02-16 Dic Corp ブラックマトリックス用着色組成物及びブラックマトリックス用感光性組成物
US9057835B2 (en) * 2011-06-06 2015-06-16 Ppg Industries Ohio, Inc. Coating compositions that transmit infrared radiation and exhibit color stability and related coating systems
TW201423272A (zh) * 2012-11-27 2014-06-16 Jsr Corp 感光性組成物、著色劑分散液、濾光片及光感應器
KR102030996B1 (ko) * 2013-04-30 2019-10-11 요코하마 고무 가부시키가이샤 자외선 경화형 수지 조성물 및 이것을 이용하는 적층체
JP6059646B2 (ja) * 2013-12-06 2017-01-11 大日精化工業株式会社 近赤外線透過性黒色アゾ顔料、近赤外線透過性黒色アゾ顔料の製造方法、これらの黒色アゾ顔料を用いた着色組成物、物品の着色方法およびカラーフィルター基板

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009069822A (ja) * 2007-08-22 2009-04-02 Mitsubishi Chemicals Corp 樹脂ブラックマトリックス、遮光性感光性樹脂組成物、ｔｆｔ素子基板及び液晶表示装置
JP2013054079A (ja) * 2011-08-31 2013-03-21 Fujifilm Corp 光硬化性組成物、カラーフィルタ及びその製造方法、並びに固体撮像素子

Also Published As

Publication number Publication date
JP6325097B2 (ja) 2018-05-16
WO2015182277A1 (ja) 2015-12-03
JPWO2015182277A1 (ja) 2017-04-20
TWI660238B (zh) 2019-05-21
TW201544900A (zh) 2015-12-01
KR20160146873A (ko) 2016-12-21

Similar Documents

Publication Publication Date Title
KR101966125B1 (ko) 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서
KR101925813B1 (ko) 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서
KR101779467B1 (ko) 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서
TWI621882B (zh) 彩色濾光片用組成物、膜、紅外線透過濾光片及其製造方法、以及紅外線感測器
JP6498284B2 (ja) 膜、膜の製造方法、固体撮像素子および赤外線センサ
US11073760B2 (en) Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device
KR101898020B1 (ko) 컬러 필터용 적색 착색 조성물, 착색막, 컬러 필터, 고체 촬상 소자
TWI682973B (zh) 硬化性組成物、硬化性組成物的製造方法、膜、紅外截止濾波器、紅外透射濾波器、圖案形成方法及裝置
JP7126537B2 (ja) 着色組成物、着色組成物の製造方法、カラーフィルタ、パターン形成方法、固体撮像素子、および、画像表示装置
TWI693484B (zh) 硬化膜的製造方法及硬化膜
KR20170083092A (ko) 착색 조성물, 착색 조성물의 제조 방법, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자, 및 화상 표시 장치
TW201512773A (zh) 樹脂組成物、硬化膜、紅外線透過濾波器及其製造方法以及紅外線感測器

Legal Events

Date Code Title Description
A201 Request for examination
AMND Amendment
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
X701 Decision to grant (after re-examination)