KR101921368B1 - 네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자 - Google Patents

네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자 Download PDF

Info

Publication number
KR101921368B1
KR101921368B1 KR1020147008080A KR20147008080A KR101921368B1 KR 101921368 B1 KR101921368 B1 KR 101921368B1 KR 1020147008080 A KR1020147008080 A KR 1020147008080A KR 20147008080 A KR20147008080 A KR 20147008080A KR 101921368 B1 KR101921368 B1 KR 101921368B1
Authority
KR
South Korea
Prior art keywords
group
resin composition
photosensitive resin
negative
carbon atoms
Prior art date
Application number
KR1020147008080A
Other languages
English (en)
Korean (ko)
Other versions
KR20140097117A (ko
Inventor
마사키 오비
고타로 야마다
Original Assignee
에이지씨 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이지씨 가부시키가이샤 filed Critical 에이지씨 가부시키가이샤
Publication of KR20140097117A publication Critical patent/KR20140097117A/ko
Application granted granted Critical
Publication of KR101921368B1 publication Critical patent/KR101921368B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
KR1020147008080A 2011-11-11 2012-11-09 네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자 KR101921368B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011247437 2011-11-11
JPJP-P-2011-247437 2011-11-11
PCT/JP2012/079177 WO2013069789A1 (ja) 2011-11-11 2012-11-09 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックス及び光学素子

Publications (2)

Publication Number Publication Date
KR20140097117A KR20140097117A (ko) 2014-08-06
KR101921368B1 true KR101921368B1 (ko) 2018-11-22

Family

ID=48290154

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147008080A KR101921368B1 (ko) 2011-11-11 2012-11-09 네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자

Country Status (5)

Country Link
JP (1) JP6115471B2 (zh)
KR (1) KR101921368B1 (zh)
CN (1) CN103946747B (zh)
TW (1) TW201329635A (zh)
WO (1) WO2013069789A1 (zh)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014197153A (ja) * 2013-03-29 2014-10-16 三洋化成工業株式会社 感光性樹脂組成物
TWI518459B (zh) * 2013-07-23 2016-01-21 奇美實業股份有限公司 感光性樹脂組成物、彩色濾光片及其液晶顯示元件
WO2015046178A1 (ja) * 2013-09-25 2015-04-02 三菱化学株式会社 感光性着色組成物、ブラックマトリクス、着色スペーサー、画像表示装置及び顔料分散液
KR102316002B1 (ko) * 2014-02-18 2021-10-21 에이지씨 가부시키가이샤 네거티브형 감광성 수지 조성물, 수지 경화막, 격벽 및 광학 소자
WO2015163379A1 (ja) * 2014-04-25 2015-10-29 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁および光学素子
JP2016186609A (ja) * 2015-03-27 2016-10-27 三洋化成工業株式会社 感光性樹脂組成物
KR102025359B1 (ko) * 2016-03-08 2019-09-25 삼성에스디아이 주식회사 감광성 수지 조성물, 이를 이용한 블랙 컬럼 스페이서 및 컬러필터
KR102318807B1 (ko) 2016-03-18 2021-10-28 도레이 카부시키가이샤 네가티브형 감광성 수지 조성물, 경화막, 경화막을 구비하는 표시 장치, 및 그의 제조 방법
JP6886782B2 (ja) 2016-06-30 2021-06-16 東京応化工業株式会社 感光性樹脂組成物、硬化膜、有機ｅｌ素子における発光層の区画用のバンク、有機ｅｌ素子用の基板、有機ｅｌ素子、硬化膜の製造方法、バンクの製造方法、及び有機ｅｌ素子の製造方法
CN109661855B (zh) * 2016-09-05 2022-07-08 三菱化学株式会社 有机场致发光元件间隔壁形成用感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明
JP6823997B2 (ja) 2016-10-25 2021-02-03 東京応化工業株式会社 着色剤分散液、感光性樹脂組成物、硬化物、有機ｅｌ素子、パターンの形成方法、及び感光性樹脂組成物の製造方法
US11011707B2 (en) * 2016-12-01 2021-05-18 Toray Industries, Inc. Organic EL display device
CN110088681B (zh) * 2016-12-22 2022-11-15 Ａｇｃ株式会社 负型感光性树脂组合物
TWI677761B (zh) * 2016-12-23 2019-11-21 奇美實業股份有限公司 黑色矩陣用負型感光性樹脂組成物、黑色矩陣、彩色濾光片以及液晶顯示元件
JP6741616B2 (ja) * 2017-03-28 2020-08-19 富士フイルム株式会社 収容体、収容体の製造方法、及び、硬化膜の製造方法
JP7013669B2 (ja) * 2017-04-07 2022-02-01 住友ゴム工業株式会社 タイヤ
KR102228070B1 (ko) * 2017-11-01 2021-03-12 주식회사 엘지화학 화학 증폭형 포토레지스트 조성물 및 이를 이용한 포토레지스트 필름
WO2019117018A1 (ja) * 2017-12-11 2019-06-20 Ａｇｃ株式会社 ネガ型感光性樹脂組成物
WO2019146685A1 (ja) 2018-01-26 2019-08-01 三菱ケミカル株式会社 着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
CN111902775B (zh) * 2018-04-19 2024-01-02 富士胶片株式会社 图案及光学滤波器及固体摄像元件以及图像显示装置的制造方法、光固化性组合物及膜
KR20210032320A (ko) 2018-07-20 2021-03-24 미쯔비시 케미컬 주식회사 감광성 착색 수지 조성물, 경화물, 화상 표시 장치 및 조명
KR20200078335A (ko) * 2018-12-21 2020-07-01 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이로부터 제조된 블랙 매트릭스
JP6885518B1 (ja) 2019-07-22 2021-06-16 三菱ケミカル株式会社 感光性着色樹脂組成物、硬化物、隔壁及び画像表示装置
JPWO2021090836A1 (zh) * 2019-11-06 2021-05-14
CN114846405A (zh) 2019-12-20 2022-08-02 三菱化学株式会社 感光性树脂组合物、间隔壁、有机场致发光元件、以及图像显示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010085904A (ja) * 2008-10-02 2010-04-15 Nippon Steel Chem Co Ltd アルカリ現像感光性樹脂組成物及びこれを用いて形成した表示素子隔壁並びに表示素子
WO2011081149A1 (ja) 2009-12-28 2011-07-07 旭硝子株式会社 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP2003330166A (ja) * 2002-05-13 2003-11-19 Nippon Steel Chem Co Ltd 密着性に優れた感光性樹脂組成物およびその硬化物
CN101681097A (zh) * 2007-05-29 2010-03-24 旭硝子株式会社 感光性组合物、间隔壁、黑色矩阵
JP2009075446A (ja) * 2007-09-21 2009-04-09 Mitsubishi Chemicals Corp 樹脂ブラックマトリックス、遮光性感光性樹脂組成物及び液晶表示装置
JP5565761B2 (ja) * 2008-01-30 2014-08-06 東海カーボン株式会社 カーボンブラック分散体組成物及びフォトレジスト組成物
KR101115787B1 (ko) * 2008-05-15 2012-03-09 코오롱인더스트리 주식회사 광분해성 전사재료, 이로부터 형성되는 절연막 및 유기발광소자
JP5093352B2 (ja) * 2008-08-01 2012-12-12 旭硝子株式会社 ネガ型感光性組成物、それを用いた光学素子用隔壁および該隔壁を有する光学素子
JP2011170197A (ja) * 2010-02-19 2011-09-01 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及び永久マスクレジスト
JP5431225B2 (ja) * 2010-03-29 2014-03-05 新日鉄住金化学株式会社 アルカリ現像性感光性樹脂組成物、及びこれを用いて形成した表示素子向け隔壁、並びに表示素子

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010085904A (ja) * 2008-10-02 2010-04-15 Nippon Steel Chem Co Ltd アルカリ現像感光性樹脂組成物及びこれを用いて形成した表示素子隔壁並びに表示素子
WO2011081149A1 (ja) 2009-12-28 2011-07-07 旭硝子株式会社 感光性組成物、隔壁、カラーフィルタおよび有機ｅｌ素子

Also Published As

Publication number Publication date
CN103946747B (zh) 2018-06-05
TW201329635A (zh) 2013-07-16
JP6115471B2 (ja) 2017-04-19
CN103946747A (zh) 2014-07-23
KR20140097117A (ko) 2014-08-06
WO2013069789A1 (ja) 2013-05-16
JPWO2013069789A1 (ja) 2015-04-02

Similar Documents

Publication Publication Date Title
KR101921368B1 (ko) 네거티브형 감광성 수지 조성물, 격벽, 블랙 매트릭스 및 광학 소자
KR101420470B1 (ko) 감광성 조성물, 격벽, 블랙 매트릭스
KR101842317B1 (ko) 네거티브형 감광성 수지 조성물, 경화막, 격벽 및 블랙 매트릭스와 그 제조 방법, 컬러 필터 그리고 유기 el 소자
CN104823108B (zh) 负型感光性树脂组合物、树脂固化膜、分隔壁和光学元件
KR101412857B1 (ko) 감광성 조성물, 격벽, 블랙 매트릭스, 컬러 필터의 제조 방법
JP6398774B2 (ja) ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP6593331B2 (ja) 撥インク剤、ネガ型感光性樹脂組成物、隔壁および光学素子
KR101627381B1 (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자
KR20080078645A (ko) 함불소 중합체, 네거티브형 감광성 조성물 및 격벽
KR101923249B1 (ko) 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자
JP2013050549A (ja) ネガ型感光性樹脂組成物、隔壁、光学素子
JP6341093B2 (ja) ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁および光学素子
JP2008298859A (ja) 感光性組成物、それを用いた隔壁、隔壁の製造方法、カラーフィルタの製造方法、有機ｅｌ表示素子の製造方法および有機ｔｆｔアレイの製造方法
KR101902608B1 (ko) 발잉크제의 제조 방법, 네거티브형 감광성 수지 조성물, 격벽 및 광학 소자
JP6065915B2 (ja) ネガ型感光性樹脂組成物、硬化膜、隔壁、及び光学素子
KR101810702B1 (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자
WO2012176816A1 (ja) ネガ型感光性樹脂組成物、隔壁、ブラックマトリックス、カラーフィルタおよび液晶表示素子
WO2014046210A1 (ja) 部分加水分解縮合物およびこれを用いた撥インク剤
KR101763441B1 (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자
KR101727772B1 (ko) 감광성 조성물, 격벽, 컬러 필터 및 유기 ｅｌ 소자

Legal Events

Date Code Title Description
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right