KR101904058B1 - 폴리머의 제조방법과 제조장치, 및 유기막의 제조방법과 제조장치 - Google Patents

폴리머의 제조방법과 제조장치, 및 유기막의 제조방법과 제조장치 Download PDF

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KR101904058B1
KR101904058B1 KR1020150180871A KR20150180871A KR101904058B1 KR 101904058 B1 KR101904058 B1 KR 101904058B1 KR 1020150180871 A KR1020150180871 A KR 1020150180871A KR 20150180871 A KR20150180871 A KR 20150180871A KR 101904058 B1 KR101904058 B1 KR 101904058B1
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mist
droplet
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타카히로 사사키
신야 오다
토시미 히토라
토요스케 이비
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가부시키가이샤 플로스피아
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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    • C08F120/00Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
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    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12Homopolymers or copolymers of methyl methacrylate

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  • Polymers & Plastics (AREA)
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  • Manufacturing & Machinery (AREA)
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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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KR1020150180871A 2015-01-23 2015-12-17 폴리머의 제조방법과 제조장치, 및 유기막의 제조방법과 제조장치 Active KR101904058B1 (ko)

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JP2015011858 2015-01-23
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JPJP-P-2015-011858 2015-01-23

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US (1) US10106633B2 (enExample)
EP (1) EP3047915B1 (enExample)
JP (1) JP6778868B2 (enExample)
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CN (1) CN105820286A (enExample)
TW (1) TWI642686B (enExample)

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JP6870798B2 (ja) * 2016-11-28 2021-05-12 株式会社Flosfia 成膜装置および成膜方法
CN109628910B (zh) 2017-10-07 2023-06-30 株式会社Flosfia 形成膜的方法
JP7165313B2 (ja) * 2017-12-01 2022-11-04 株式会社Flosfia 着色方法
JP7165314B2 (ja) * 2017-12-01 2022-11-04 株式会社Flosfia 着色膜形成用組成物
JP6950137B2 (ja) * 2017-12-01 2021-10-13 株式会社Flosfia 成膜方法
CN108203880A (zh) * 2017-12-28 2018-06-26 耐途隆株式会社 纤维的功能性物质吸附装置
JP2020092125A (ja) * 2018-12-03 2020-06-11 トヨタ自動車株式会社 成膜装置
CN116056804A (zh) * 2020-08-05 2023-05-02 信越化学工业株式会社 制膜用雾化装置、制膜装置以及制膜方法
WO2025154495A1 (ja) * 2024-01-16 2025-07-24 株式会社村田製作所 ファイバーシート

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US6706320B2 (en) 2000-07-06 2004-03-16 Commonwealth Scientific And Industrial Research Organisation Method for surface engineering
US20070032620A1 (en) * 2005-08-05 2007-02-08 Massachusetts Institute Of Technology Chemical vapor deposition of hydrogel films

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US6706320B2 (en) 2000-07-06 2004-03-16 Commonwealth Scientific And Industrial Research Organisation Method for surface engineering
US20030108664A1 (en) 2001-10-05 2003-06-12 Kodas Toivo T. Methods and compositions for the formation of recessed electrical features on a substrate
US20070032620A1 (en) * 2005-08-05 2007-02-08 Massachusetts Institute Of Technology Chemical vapor deposition of hydrogel films

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Publication number Publication date
EP3047915A1 (en) 2016-07-27
KR20160091239A (ko) 2016-08-02
JP6778868B2 (ja) 2020-11-04
EP3047915B1 (en) 2018-11-14
US20160215391A1 (en) 2016-07-28
TW201627328A (zh) 2016-08-01
CN105820286A (zh) 2016-08-03
US10106633B2 (en) 2018-10-23
JP2016138260A (ja) 2016-08-04
TWI642686B (zh) 2018-12-01

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