CN105820286A - 聚合物的制造方法及制造装置和有机膜的制造方法及制造装置 - Google Patents

聚合物的制造方法及制造装置和有机膜的制造方法及制造装置 Download PDF

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Publication number
CN105820286A
CN105820286A CN201510964311.4A CN201510964311A CN105820286A CN 105820286 A CN105820286 A CN 105820286A CN 201510964311 A CN201510964311 A CN 201510964311A CN 105820286 A CN105820286 A CN 105820286A
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China
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material solution
mist
manufacture
manufacture method
heating
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English (en)
Chinese (zh)
Inventor
佐佐木贵博
织田真也
人罗俊实
衣斐豊佑
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Flosfia
Flosfia Inc
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Flosfia Inc
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/06—Hydrocarbons
    • C08F112/08—Styrene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • B05B17/0607—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers
    • B05B17/0615—Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations generated by electrical means, e.g. piezoelectric transducers spray being produced at the free surface of the liquid or other fluent material in a container and subjected to the vibrations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/01—Processes of polymerisation characterised by special features of the polymerisation apparatus used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/20—Aqueous medium with the aid of macromolecular dispersing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/34—Polymerisation in gaseous state
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02—Homopolymers or copolymers of hydrocarbons
    • C08J2325/04—Homopolymers or copolymers of styrene
    • C08J2325/08—Copolymers of styrene
    • C08J2325/14—Copolymers of styrene with unsaturated esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12—Homopolymers or copolymers of methyl methacrylate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
CN201510964311.4A 2015-01-23 2015-12-18 聚合物的制造方法及制造装置和有机膜的制造方法及制造装置 Pending CN105820286A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2015011859 2015-01-23
JP2015-011858 2015-01-23
JP2015-011859 2015-01-23
JP2015011858 2015-01-23

Publications (1)

Publication Number Publication Date
CN105820286A true CN105820286A (zh) 2016-08-03

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CN201510964311.4A Pending CN105820286A (zh) 2015-01-23 2015-12-18 聚合物的制造方法及制造装置和有机膜的制造方法及制造装置

Country Status (6)

Country Link
US (1) US10106633B2 (enExample)
EP (1) EP3047915B1 (enExample)
JP (1) JP6778868B2 (enExample)
KR (1) KR101904058B1 (enExample)
CN (1) CN105820286A (enExample)
TW (1) TWI642686B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108203880A (zh) * 2017-12-28 2018-06-26 耐途隆株式会社 纤维的功能性物质吸附装置
CN111254489A (zh) * 2018-12-03 2020-06-09 丰田自动车株式会社 成膜装置
CN116056804A (zh) * 2020-08-05 2023-05-02 信越化学工业株式会社 制膜用雾化装置、制膜装置以及制膜方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6870798B2 (ja) * 2016-11-28 2021-05-12 株式会社Flosfia 成膜装置および成膜方法
CN109628910B (zh) 2017-10-07 2023-06-30 株式会社Flosfia 形成膜的方法
JP7165313B2 (ja) * 2017-12-01 2022-11-04 株式会社Flosfia 着色方法
JP6950137B2 (ja) * 2017-12-01 2021-10-13 株式会社Flosfia 成膜方法
JP7165314B2 (ja) * 2017-12-01 2022-11-04 株式会社Flosfia 着色膜形成用組成物
WO2025154495A1 (ja) * 2024-01-16 2025-07-24 株式会社村田製作所 ファイバーシート

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CN1344185A (zh) * 1999-02-26 2002-04-10 3M创新有限公司 用聚合层来涂布微结构化表面并保持表面特征物轮廓的方法、
CN101351868A (zh) * 2005-12-29 2009-01-21 3M创新有限公司 使用涂覆工艺雾化材料的方法

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JPS6178463A (ja) 1984-09-25 1986-04-22 Ulvac Corp 合成樹脂被膜の形成方法
ATE233939T1 (de) * 1993-10-04 2003-03-15 3M Innovative Properties Co Vernetztes acrylatbeschichtungsmaterial zur herstellung von kondensatordielektrika und sauerstoffbarrieren
US5972428A (en) 1996-03-05 1999-10-26 Symetrix Corporation Methods and apparatus for material deposition using primer
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6086952A (en) 1998-06-15 2000-07-11 Applied Materials, Inc. Chemical vapor deposition of a copolymer of p-xylylene and a multivinyl silicon/oxygen comonomer
AUPQ859000A0 (en) 2000-07-06 2000-07-27 Commonwealth Scientific And Industrial Research Organisation Apparatus for surface engineering
US20030108664A1 (en) 2001-10-05 2003-06-12 Kodas Toivo T. Methods and compositions for the formation of recessed electrical features on a substrate
JP3782050B2 (ja) * 2002-09-04 2006-06-07 大王製紙株式会社 吸水性複合体の製造方法
CN1311124C (zh) * 2002-09-04 2007-04-18 大王制纸株式会社 吸水性复合体的制造方法
US7563734B2 (en) * 2005-04-11 2009-07-21 Massachusetts Institute Of Technology Chemical vapor deposition of antimicrobial polymer coatings
US7431969B2 (en) * 2005-08-05 2008-10-07 Massachusetts Institute Of Technology Chemical vapor deposition of hydrogel films
JP4937713B2 (ja) * 2006-11-28 2012-05-23 株式会社リコー 電子写真感光体の製造方法
CN102212194B (zh) 2011-04-02 2013-02-06 武汉纺织大学 一种粒子相聚合反应制备有机聚合物的方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1344185A (zh) * 1999-02-26 2002-04-10 3M创新有限公司 用聚合层来涂布微结构化表面并保持表面特征物轮廓的方法、
CN101351868A (zh) * 2005-12-29 2009-01-21 3M创新有限公司 使用涂覆工艺雾化材料的方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108203880A (zh) * 2017-12-28 2018-06-26 耐途隆株式会社 纤维的功能性物质吸附装置
CN111254489A (zh) * 2018-12-03 2020-06-09 丰田自动车株式会社 成膜装置
CN116056804A (zh) * 2020-08-05 2023-05-02 信越化学工业株式会社 制膜用雾化装置、制膜装置以及制膜方法
US12434257B2 (en) 2020-08-05 2025-10-07 Shin-Etsu Chemical Co., Ltd. Film-forming atomizer, film-forming apparatus, and film-forming method

Also Published As

Publication number Publication date
JP6778868B2 (ja) 2020-11-04
EP3047915A1 (en) 2016-07-27
KR20160091239A (ko) 2016-08-02
JP2016138260A (ja) 2016-08-04
US20160215391A1 (en) 2016-07-28
KR101904058B1 (ko) 2018-10-04
US10106633B2 (en) 2018-10-23
TW201627328A (zh) 2016-08-01
EP3047915B1 (en) 2018-11-14
TWI642686B (zh) 2018-12-01

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Address after: No. 1 Fan 29, Yuling Dayuan, Xijing District, Kyoto City, Kyoto Prefecture, Japan

Applicant after: FLOSFIA KK

Address before: North Pavilion of Beijing Dagui Pioneering Building No. 36, Yuling Dayuan, Xijing District, Kyoto City, Kyoto City, Japan

Applicant before: FLOSFIA INC.

RJ01 Rejection of invention patent application after publication
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Application publication date: 20160803