KR101873565B1 - 유기아미노실란 및 이를 제조하는 방법 - Google Patents

유기아미노실란 및 이를 제조하는 방법 Download PDF

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KR101873565B1
KR101873565B1 KR1020150027946A KR20150027946A KR101873565B1 KR 101873565 B1 KR101873565 B1 KR 101873565B1 KR 1020150027946 A KR1020150027946 A KR 1020150027946A KR 20150027946 A KR20150027946 A KR 20150027946A KR 101873565 B1 KR101873565 B1 KR 101873565B1
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KR20150102725A (ko
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만차오 시아오
매튜 알. 맥도날드
리차드 호
신지안 레이
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버슘머트리얼즈 유에스, 엘엘씨
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/025—Silicon compounds without C-silicon linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0801—General processes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020150027946A 2014-02-28 2015-02-27 유기아미노실란 및 이를 제조하는 방법 Active KR101873565B1 (ko)

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US201461946164P 2014-02-28 2014-02-28
US61/946,164 2014-02-28
US14/625,158 US9233990B2 (en) 2014-02-28 2015-02-18 Organoaminosilanes and methods for making same
US14/625,158 2015-02-18

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KR101873565B1 true KR101873565B1 (ko) 2018-07-03

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US (3) US9233990B2 (https=)
EP (2) EP2913334B1 (https=)
JP (2) JP6046758B2 (https=)
KR (2) KR101873565B1 (https=)
CN (1) CN104876957B (https=)
TW (1) TWI540138B (https=)

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KR20180079259A (ko) * 2014-02-28 2018-07-10 버슘머트리얼즈 유에스, 엘엘씨 유기아미노실란 및 이를 제조하는 방법

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US10453675B2 (en) * 2013-09-20 2019-10-22 Versum Materials Us, Llc Organoaminosilane precursors and methods for depositing films comprising same
KR102326396B1 (ko) 2013-09-27 2021-11-12 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 아민 치환된 트리실릴아민 및 트리디실릴아민 화합물
US9969756B2 (en) 2014-09-23 2018-05-15 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude Carbosilane substituted amine precursors for deposition of Si-containing films and methods thereof
US10354860B2 (en) * 2015-01-29 2019-07-16 Versum Materials Us, Llc Method and precursors for manufacturing 3D devices
US9777025B2 (en) 2015-03-30 2017-10-03 L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude Si-containing film forming precursors and methods of using the same
TWI716333B (zh) * 2015-03-30 2021-01-11 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 碳矽烷與氨、胺類及脒類之觸媒去氫耦合
EP4092154A1 (en) * 2015-06-16 2022-11-23 Versum Materials US, LLC Processes for depositing silicon-containing films using same
WO2017106632A1 (en) * 2015-12-18 2017-06-22 Dow Corning Corporation Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane
US9701695B1 (en) * 2015-12-30 2017-07-11 American Air Liquide, Inc. Synthesis methods for amino(halo)silanes
US10053775B2 (en) 2015-12-30 2018-08-21 L'air Liquide, Societé Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications
TWI724141B (zh) 2016-03-23 2021-04-11 法商液態空氣喬治斯克勞帝方法硏究開發股份有限公司 形成含矽膜之組成物及其製法與用途
US10464953B2 (en) * 2016-10-14 2019-11-05 Versum Materials Us, Llc Carbon bridged aminosilane compounds for high growth rate silicon-containing films
US11735413B2 (en) * 2016-11-01 2023-08-22 Versum Materials Us, Llc Precursors and flowable CVD methods for making low-k films to fill surface features
CN110099911B (zh) * 2016-12-27 2021-11-23 南大光电半导体材料有限公司 胺与硅烷之间的脱氢偶联反应的催化
TWI784022B (zh) * 2017-07-31 2022-11-21 中國大陸商南大光電半導體材料有限公司 1,1,1-參(二甲胺基)二矽烷及其製備方法
IL273146B2 (en) * 2017-09-14 2025-04-01 Versum Mat Us Llc Compositions and methods for depositing layers containing silicone
US20190211039A1 (en) * 2017-12-08 2019-07-11 Rohm And Haas Electronic Materials Llc Hydrocarbyloxydisilanes
CN108084219B (zh) * 2017-12-26 2020-09-15 浙江博瑞电子科技有限公司 一种二（二乙基氨基）硅烷合成方法
CN112041323B (zh) * 2018-05-23 2024-01-05 美国陶氏有机硅公司 制备有机氨基硅烷的方法
EP3902939A4 (en) * 2019-02-05 2022-09-28 Versum Materials US, LLC CARBON DOPED SILICON OXIDE DEPOSIT
US20210017198A1 (en) 2019-04-05 2021-01-21 Versum Materials Us, Llc Organoamino-Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films
US11649560B2 (en) 2019-06-20 2023-05-16 Applied Materials, Inc. Method for forming silicon-phosphorous materials
US11466037B2 (en) * 2019-10-31 2022-10-11 Nata Semiconductor Materials Co., Ltd. Catalysis of dehydrocoupling reactions between amines and silanes
WO2021201910A1 (en) * 2020-04-02 2021-10-07 Versum Materials Us, Llc Organoamino-functionalized cyclic oligosiloxanes for deposition of silicon-containing films
TWI797640B (zh) 2020-06-18 2023-04-01 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 基於矽之自組裝單層組成物及使用該組成物之表面製備
CN112210769B (zh) * 2020-09-29 2023-04-25 合肥安德科铭半导体科技有限公司 一种低温高生长速率氧化硅薄膜的原子层沉积方法
CN115260223B (zh) * 2022-09-26 2022-12-23 江苏南大光电材料股份有限公司 无氯催化剂于制备二异丙胺硅烷中的用途
KR102858392B1 (ko) 2023-07-18 2025-09-11 주식회사 한솔케미칼 2종의 실리콘 전구체 화합물을 이용하여 박막을 형성하는 방법
KR20250085041A (ko) 2023-12-04 2025-06-12 (주)원익머트리얼즈 디알킬아미노디실란의 제조방법

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Cited By (2)

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Publication number Priority date Publication date Assignee Title
KR20180079259A (ko) * 2014-02-28 2018-07-10 버슘머트리얼즈 유에스, 엘엘씨 유기아미노실란 및 이를 제조하는 방법
KR102201058B1 (ko) * 2014-02-28 2021-01-08 버슘머트리얼즈 유에스, 엘엘씨 유기아미노실란 및 이를 제조하는 방법

Also Published As

Publication number Publication date
EP2913334A1 (en) 2015-09-02
JP2017066147A (ja) 2017-04-06
EP2913334B1 (en) 2018-12-19
KR20180079259A (ko) 2018-07-10
JP2015164917A (ja) 2015-09-17
KR102201058B1 (ko) 2021-01-08
US10294250B2 (en) 2019-05-21
TWI540138B (zh) 2016-07-01
KR20150102725A (ko) 2015-09-07
EP3395822A1 (en) 2018-10-31
US20170204120A1 (en) 2017-07-20
CN104876957B (zh) 2019-04-19
US20150246937A1 (en) 2015-09-03
EP3395822B1 (en) 2020-03-25
US9758534B2 (en) 2017-09-12
US9233990B2 (en) 2016-01-12
TW201533051A (zh) 2015-09-01
JP6046758B2 (ja) 2016-12-21
CN104876957A (zh) 2015-09-02
US20160168169A1 (en) 2016-06-16

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