KR101849799B1 - 액 처리 방법 및 필터 내의 기체의 제거 장치 - Google Patents

액 처리 방법 및 필터 내의 기체의 제거 장치 Download PDF

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Publication number
KR101849799B1
KR101849799B1 KR1020130016257A KR20130016257A KR101849799B1 KR 101849799 B1 KR101849799 B1 KR 101849799B1 KR 1020130016257 A KR1020130016257 A KR 1020130016257A KR 20130016257 A KR20130016257 A KR 20130016257A KR 101849799 B1 KR101849799 B1 KR 101849799B1
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South Korea
Prior art keywords
liquid
filter
gas
chemical liquid
chemical
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English (en)
Korean (ko)
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KR20130094755A (ko
Inventor
다쿠야 모리
성문 박
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도쿄엘렉트론가부시키가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
    • H01L21/02343—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment treatment by exposure to a liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/14—Safety devices specially adapted for filtration; Devices for indicating clogging
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020130016257A 2012-02-16 2013-02-15 액 처리 방법 및 필터 내의 기체의 제거 장치 Active KR101849799B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012031626 2012-02-16
JPJP-P-2012-031626 2012-02-16

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020180041680A Division KR101907351B1 (ko) 2012-02-16 2018-04-10 액 처리 방법 및 필터 내의 기체의 제거 장치

Publications (2)

Publication Number Publication Date
KR20130094755A KR20130094755A (ko) 2013-08-26
KR101849799B1 true KR101849799B1 (ko) 2018-04-17

Family

ID=49218411

Family Applications (2)

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KR1020130016257A Active KR101849799B1 (ko) 2012-02-16 2013-02-15 액 처리 방법 및 필터 내의 기체의 제거 장치
KR1020180041680A Active KR101907351B1 (ko) 2012-02-16 2018-04-10 액 처리 방법 및 필터 내의 기체의 제거 장치

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KR1020180041680A Active KR101907351B1 (ko) 2012-02-16 2018-04-10 액 처리 방법 및 필터 내의 기체의 제거 장치

Country Status (2)

Country Link
JP (2) JP5565482B2 (enrdf_load_stackoverflow)
KR (2) KR101849799B1 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5741549B2 (ja) * 2012-10-09 2015-07-01 東京エレクトロン株式会社 処理液供給方法、処理液供給装置及び記憶媒体
JP5967045B2 (ja) * 2013-10-02 2016-08-10 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP6020416B2 (ja) * 2013-11-01 2016-11-02 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
KR102320180B1 (ko) * 2014-05-30 2021-11-03 세메스 주식회사 필터 유닛 및 그것을 갖는 약액 공급 장치
JP5991403B2 (ja) * 2015-04-21 2016-09-14 東京エレクトロン株式会社 フィルタウエッティング方法、フィルタウエッティング装置及び記憶媒体
KR101819172B1 (ko) * 2016-06-29 2018-03-02 (주)지오엘리먼트 케미컬 회수 시스템
JP6740072B2 (ja) * 2016-09-27 2020-08-12 株式会社Ｓｃｒｅｅｎホールディングス 洗浄液カートリッジおよび該洗浄液カートリッジを用いた洗浄方法
JP6984431B2 (ja) * 2018-01-19 2021-12-22 東京エレクトロン株式会社 流路洗浄方法及び流路洗浄装置
TWI800623B (zh) * 2018-03-23 2023-05-01 日商東京威力科創股份有限公司 液處理裝置及液處理方法
JP6808696B2 (ja) * 2018-09-14 2021-01-06 株式会社Ｓｃｒｅｅｎホールディングス 供給装置、塗布装置、および供給方法
KR102620420B1 (ko) 2019-09-24 2024-01-03 다이킨 고교 가부시키가이샤 용착체
KR102572629B1 (ko) * 2020-09-10 2023-08-31 세메스 주식회사 탈기 장치, 기판 처리 장치 및 처리액 탈기 방법
JP7569692B2 (ja) 2021-01-05 2024-10-18 東京エレクトロン株式会社 液供給装置、液供給方法及びコンピュータ記憶媒体
KR102310908B1 (ko) * 2021-04-30 2021-10-08 (주) 리노닉스 질소 가스의 단독 사용이 가능한 캐리어 가스 공급장치
KR102666440B1 (ko) * 2021-12-02 2024-05-20 세메스 주식회사 감광액 공급 시스템 및 감광액 관리 방법
KR102666438B1 (ko) * 2021-12-27 2024-05-17 세메스 주식회사 기판 처리 장치 및 처리액 탈기 방법
JP7630458B2 (ja) * 2022-03-10 2025-02-17 芝浦メカトロニクス株式会社 処理液供給装置、基板処理装置及び処理液供給方法
CN119998035A (zh) * 2022-10-12 2025-05-13 株式会社堀场Stec 流体供给机构和流体供给方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010165757A (ja) 2009-01-13 2010-07-29 Mtk:Kk ウエット処理装置
JP2011101851A (ja) 2009-11-11 2011-05-26 Koganei Corp 薬液供給装置および薬液供給方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63178843A (ja) * 1987-01-19 1988-07-22 Fuji Photo Film Co Ltd 感光性塗布液の処理方法
JP5231028B2 (ja) * 2008-01-21 2013-07-10 東京エレクトロン株式会社 塗布液供給装置
JP2009248513A (ja) * 2008-04-09 2009-10-29 Ulvac Japan Ltd 印刷装置
JP2011238820A (ja) * 2010-05-12 2011-11-24 Toppan Printing Co Ltd 塗布装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010165757A (ja) 2009-01-13 2010-07-29 Mtk:Kk ウエット処理装置
JP2011101851A (ja) 2009-11-11 2011-05-26 Koganei Corp 薬液供給装置および薬液供給方法

Also Published As

Publication number Publication date
KR20130094755A (ko) 2013-08-26
JP2014222756A (ja) 2014-11-27
JP5854087B2 (ja) 2016-02-09
KR20180041100A (ko) 2018-04-23
KR101907351B1 (ko) 2018-10-11
JP5565482B2 (ja) 2014-08-06
JP2013191843A (ja) 2013-09-26

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