KR101842486B1 - 탄탈산 리튬 단결정의 육성 장치 및 육성 방법 - Google Patents

탄탈산 리튬 단결정의 육성 장치 및 육성 방법 Download PDF

Info

Publication number
KR101842486B1
KR101842486B1 KR1020167027016A KR20167027016A KR101842486B1 KR 101842486 B1 KR101842486 B1 KR 101842486B1 KR 1020167027016 A KR1020167027016 A KR 1020167027016A KR 20167027016 A KR20167027016 A KR 20167027016A KR 101842486 B1 KR101842486 B1 KR 101842486B1
Authority
KR
South Korea
Prior art keywords
crucible
single crystal
lithium tantalate
raw material
coating layer
Prior art date
Application number
KR1020167027016A
Other languages
English (en)
Korean (ko)
Other versions
KR20160128381A (ko
Inventor
츠구오 후쿠다
Original Assignee
가부시키가이샤 후쿠다켓쇼우기쥬츠겡큐쇼
주식회사 퓨엠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후쿠다켓쇼우기쥬츠겡큐쇼, 주식회사 퓨엠 filed Critical 가부시키가이샤 후쿠다켓쇼우기쥬츠겡큐쇼
Publication of KR20160128381A publication Critical patent/KR20160128381A/ko
Application granted granted Critical
Publication of KR101842486B1 publication Critical patent/KR101842486B1/ko

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10Crucibles or containers for supporting the melt
    • C30B15/12Double crucible methods
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/32Seed holders, e.g. chucks
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/16Oxides
    • C30B29/22Complex oxides
    • C30B29/30Niobates; Vanadates; Tantalates
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020167027016A 2014-07-14 2015-07-14 탄탈산 리튬 단결정의 육성 장치 및 육성 방법 KR101842486B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2014144612 2014-07-14
JPJP-P-2014-144612 2014-07-14
JP2015091285 2015-04-28
JPJP-P-2015-091285 2015-04-28
PCT/JP2015/070166 WO2016010040A1 (ja) 2014-07-14 2015-07-14 タンタル酸リチウム単結晶の育成装置及び育成方法

Publications (2)

Publication Number Publication Date
KR20160128381A KR20160128381A (ko) 2016-11-07
KR101842486B1 true KR101842486B1 (ko) 2018-03-27

Family

ID=55078530

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167027016A KR101842486B1 (ko) 2014-07-14 2015-07-14 탄탈산 리튬 단결정의 육성 장치 및 육성 방법

Country Status (3)

Country Link
JP (1) JP6675065B2 (ja)
KR (1) KR101842486B1 (ja)
WO (1) WO2016010040A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7113478B2 (ja) * 2016-06-15 2022-08-05 株式会社福田結晶技術研究所 るつぼ並びに単結晶の育成装置及び育成方法
CN116905087B (zh) * 2023-09-13 2023-11-28 天通控股股份有限公司 一种钽酸锂晶体的生长方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002137985A (ja) 2000-10-30 2002-05-14 Murata Mfg Co Ltd 酸化物単結晶育成用坩堝とそれを用いた酸化物単結晶育成装置
JP2005029455A (ja) 2002-11-19 2005-02-03 Tokuyama Corp フッ化アルカリ土類金属のアズグロウン単結晶体
JP2012041200A (ja) * 2010-08-12 2012-03-01 Nippon Telegr & Teleph Corp <Ntt> 結晶成長方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5515938A (en) * 1978-07-18 1980-02-04 Toshiba Corp Production of oxide piezoelectric body single crystal
JPS57156400A (en) * 1981-03-23 1982-09-27 Hitachi Metals Ltd Crucible for preparing single crystal
JPS60200980A (ja) * 1984-03-26 1985-10-11 Tanaka Kikinzoku Kogyo Kk クラツド容器
JPH0920584A (ja) * 1995-06-30 1997-01-21 Shin Etsu Chem Co Ltd 酸化物単結晶の製造方法
JP3636873B2 (ja) * 1997-10-13 2005-04-06 イビデン株式会社 単結晶引き上げ装置
JP2003300791A (ja) * 2002-04-04 2003-10-21 Hitachi Metals Ltd 酸化物単結晶の育成方法および育成装置
JP2004256322A (ja) * 2003-02-24 2004-09-16 Komatsu Electronic Metals Co Ltd シリコン単結晶の製造方法、シリコン単結晶およびシリコン単結晶の引上げ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002137985A (ja) 2000-10-30 2002-05-14 Murata Mfg Co Ltd 酸化物単結晶育成用坩堝とそれを用いた酸化物単結晶育成装置
JP2005029455A (ja) 2002-11-19 2005-02-03 Tokuyama Corp フッ化アルカリ土類金属のアズグロウン単結晶体
JP2012041200A (ja) * 2010-08-12 2012-03-01 Nippon Telegr & Teleph Corp <Ntt> 結晶成長方法

Also Published As

Publication number Publication date
WO2016010040A1 (ja) 2016-01-21
KR20160128381A (ko) 2016-11-07
JP6675065B2 (ja) 2020-04-01
JPWO2016010040A1 (ja) 2017-04-27

Similar Documents

Publication Publication Date Title
JP4733485B2 (ja) 炭化珪素単結晶成長用種結晶の製造方法、炭化珪素単結晶成長用種結晶、炭化珪素単結晶の製造方法、および炭化珪素単結晶
WO1999063132A1 (fr) Dispositif et procede servant a fabriquer des monocristaux et monocristal
US9530642B2 (en) Method for producing SiC single crystal
JP7352058B2 (ja) 炭化ケイ素単結晶の製造方法
JP2009007203A (ja) 酸化物単結晶育成装置及びそれを用いた酸化物単結晶の製造方法
KR101842486B1 (ko) 탄탈산 리튬 단결정의 육성 장치 및 육성 방법
JP5418385B2 (ja) 炭化珪素単結晶インゴットの製造方法
KR101842487B1 (ko) 도가니 및 단결정 육성 장치 및 단결정 육성 방법
JP2010059031A (ja) 酸化アルミニウム単結晶、及び、その製造方法
TW202217085A (zh) 矽單結晶的製造方法
JP5761264B2 (ja) SiC基板の製造方法
JP4505202B2 (ja) 炭化珪素単結晶の製造方法および製造装置
JP4670002B2 (ja) 窒化物単結晶の製造方法
KR102479334B1 (ko) 실리콘카바이드 단결정의 제조 장치 및 제조 방법
JP2018135228A (ja) LiTaO3単結晶の育成方法とLiTaO3単結晶の処理方法
JPH0952788A (ja) 単結晶の製造方法及び製造装置
KR102673789B1 (ko) 실리콘카바이드 단결정의 제조 방법
JP4399631B2 (ja) 化合物半導体単結晶の製造方法、及びその製造装置
JP6842763B2 (ja) SiC単結晶の製造方法
JPH08183691A (ja) 細線状シリコン製造用坩堝および細線状シリコン
JP2003063894A (ja) タンタル酸リチウム単結晶及びその製造方法
JP3158661B2 (ja) 高解離圧単結晶の製造方法及び製造装置
JPH08183694A (ja) 細線状シリコン製造用坩堝および細線状シリコン
CN111560648A (zh) ScAlMgO4单晶基板及其制造方法
KR101477163B1 (ko) 단결정 실리콘 잉곳 제조장치

Legal Events

Date Code Title Description
A201 Request for examination
N231 Notification of change of applicant
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant