KR101835435B1 - 플라즈마 처리 장치 - Google Patents

플라즈마 처리 장치 Download PDF

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Publication number
KR101835435B1
KR101835435B1 KR1020160092735A KR20160092735A KR101835435B1 KR 101835435 B1 KR101835435 B1 KR 101835435B1 KR 1020160092735 A KR1020160092735 A KR 1020160092735A KR 20160092735 A KR20160092735 A KR 20160092735A KR 101835435 B1 KR101835435 B1 KR 101835435B1
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South Korea
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layer
electrode block
sample
conductive layer
disposed
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KR1020160092735A
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Korean (ko)
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KR20170012106A (ko
Inventor
다쿠미 단도
겐에츠 요코가와
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32963—End-point detection
    • H01L21/67098—
    • H01L21/6833—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H10P72/722—Details of electrostatic chucks

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
KR1020160092735A 2015-07-23 2016-07-21 플라즈마 처리 장치 Active KR101835435B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2015-145405 2015-07-23
JP2015145405A JP2017028111A (ja) 2015-07-23 2015-07-23 プラズマ処理装置

Publications (2)

Publication Number Publication Date
KR20170012106A KR20170012106A (ko) 2017-02-02
KR101835435B1 true KR101835435B1 (ko) 2018-03-08

Family

ID=57836165

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160092735A Active KR101835435B1 (ko) 2015-07-23 2016-07-21 플라즈마 처리 장치

Country Status (4)

Country Link
US (1) US20170025255A1 (https=)
JP (1) JP2017028111A (https=)
KR (1) KR101835435B1 (https=)
TW (1) TWI614791B (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7002357B2 (ja) * 2018-02-06 2022-01-20 株式会社日立ハイテク プラズマ処理装置
JP7059064B2 (ja) * 2018-03-26 2022-04-25 株式会社日立ハイテク プラズマ処理装置
JP6846384B2 (ja) * 2018-06-12 2021-03-24 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理装置の高周波電源を制御する方法
KR102370471B1 (ko) * 2019-02-08 2022-03-03 주식회사 히타치하이테크 플라스마 처리 장치
JP7353106B2 (ja) * 2019-09-09 2023-09-29 日本特殊陶業株式会社 保持装置
JP7281374B2 (ja) * 2019-09-09 2023-05-25 日本特殊陶業株式会社 保持装置および保持装置の製造方法
KR20230164658A (ko) * 2021-04-06 2023-12-04 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 전극 기구
KR102718018B1 (ko) * 2021-12-16 2024-10-18 (주)티티에스 정전척
JP7509997B2 (ja) * 2022-03-14 2024-07-02 株式会社日立ハイテク プラズマ処理装置
TW202412165A (zh) * 2022-05-26 2024-03-16 日商東京威力科創股份有限公司 基板處理裝置
US20250292991A1 (en) * 2024-03-15 2025-09-18 Applied Materials, Inc. Shielding for immersed plasma source

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008527694A (ja) * 2004-12-30 2008-07-24 ラム リサーチ コーポレイション 基板を空間的かつ時間的に温度制御するための装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW285813B (https=) * 1993-10-04 1996-09-11 Tokyo Electron Tohoku Kk
JPH09260474A (ja) 1996-03-22 1997-10-03 Sony Corp 静電チャックおよびウエハステージ
JP3379394B2 (ja) * 1997-07-28 2003-02-24 松下電器産業株式会社 プラズマ処理方法及び装置
JP5423632B2 (ja) * 2010-01-29 2014-02-19 住友大阪セメント株式会社 静電チャック装置
US8937800B2 (en) * 2012-04-24 2015-01-20 Applied Materials, Inc. Electrostatic chuck with advanced RF and temperature uniformity
JP6081292B2 (ja) * 2012-10-19 2017-02-15 東京エレクトロン株式会社 プラズマ処理装置
US9916998B2 (en) * 2012-12-04 2018-03-13 Applied Materials, Inc. Substrate support assembly having a plasma resistant protective layer
US8941969B2 (en) * 2012-12-21 2015-01-27 Applied Materials, Inc. Single-body electrostatic chuck
JP6077301B2 (ja) * 2012-12-28 2017-02-08 日本特殊陶業株式会社 静電チャック
JP6100564B2 (ja) * 2013-01-24 2017-03-22 東京エレクトロン株式会社 基板処理装置及び載置台
CN104377155B (zh) * 2013-08-14 2017-06-06 北京北方微电子基地设备工艺研究中心有限责任公司 静电卡盘以及等离子体加工设备
JP2015082384A (ja) * 2013-10-22 2015-04-27 東京エレクトロン株式会社 プラズマ処理装置、給電ユニット、及び載置台システム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008527694A (ja) * 2004-12-30 2008-07-24 ラム リサーチ コーポレイション 基板を空間的かつ時間的に温度制御するための装置

Also Published As

Publication number Publication date
JP2017028111A (ja) 2017-02-02
TW201715561A (zh) 2017-05-01
KR20170012106A (ko) 2017-02-02
US20170025255A1 (en) 2017-01-26
TWI614791B (zh) 2018-02-11

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