KR101833234B1 - 박막 증착용 마스크 프레임 어셈블리 - Google Patents

박막 증착용 마스크 프레임 어셈블리 Download PDF

Info

Publication number
KR101833234B1
KR101833234B1 KR1020110060229A KR20110060229A KR101833234B1 KR 101833234 B1 KR101833234 B1 KR 101833234B1 KR 1020110060229 A KR1020110060229 A KR 1020110060229A KR 20110060229 A KR20110060229 A KR 20110060229A KR 101833234 B1 KR101833234 B1 KR 101833234B1
Authority
KR
South Korea
Prior art keywords
support
mask
frame
fastening
fixing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020110060229A
Other languages
English (en)
Korean (ko)
Other versions
KR20120140473A (ko
Inventor
강택교
Original Assignee
삼성디스플레이 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성디스플레이 주식회사 filed Critical 삼성디스플레이 주식회사
Priority to KR1020110060229A priority Critical patent/KR101833234B1/ko
Priority to US13/430,874 priority patent/US8631761B2/en
Priority to JP2012121818A priority patent/JP6073573B2/ja
Publication of KR20120140473A publication Critical patent/KR20120140473A/ko
Application granted granted Critical
Publication of KR101833234B1 publication Critical patent/KR101833234B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020110060229A 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리 Expired - Fee Related KR101833234B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020110060229A KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리
US13/430,874 US8631761B2 (en) 2011-06-21 2012-03-27 Mask frame assembly for thin-film deposition
JP2012121818A JP6073573B2 (ja) 2011-06-21 2012-05-29 薄膜蒸着用マスクフレームアセンブリー

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110060229A KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리

Publications (2)

Publication Number Publication Date
KR20120140473A KR20120140473A (ko) 2012-12-31
KR101833234B1 true KR101833234B1 (ko) 2018-03-02

Family

ID=47360600

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110060229A Expired - Fee Related KR101833234B1 (ko) 2011-06-21 2011-06-21 박막 증착용 마스크 프레임 어셈블리

Country Status (3)

Country Link
US (1) US8631761B2 (enExample)
JP (1) JP6073573B2 (enExample)
KR (1) KR101833234B1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190140768A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20190140775A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20230139566A (ko) 2022-03-28 2023-10-05 스템코 주식회사 증착 마스크, 그 제조 방법 및 그 제조용 금속판
KR20230140975A (ko) 2022-03-30 2023-10-10 스템코 주식회사 증착 마스크 및 그 제조 방법

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5258278B2 (ja) * 2007-12-13 2013-08-07 キヤノントッキ株式会社 成膜用マスク及びマスク密着方法
KR101030030B1 (ko) * 2009-12-11 2011-04-20 삼성모바일디스플레이주식회사 마스크 조립체
KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
KR20130028165A (ko) * 2011-06-21 2013-03-19 삼성디스플레이 주식회사 마스크 유닛
KR20130081528A (ko) * 2012-01-09 2013-07-17 삼성디스플레이 주식회사 증착 마스크 및 이를 이용한 증착 설비
KR101995500B1 (ko) * 2012-11-20 2019-10-02 삼성디스플레이 주식회사 단위 마스크 및 마스크 조립체
KR102079170B1 (ko) * 2013-04-09 2020-02-20 삼성디스플레이 주식회사 증착 장치 및 그에 적용되는 마스크 조립체
KR102106331B1 (ko) * 2013-07-08 2020-05-06 삼성디스플레이 주식회사 마스크 조립체 및 이의 제조 방법
JP2015069806A (ja) * 2013-09-27 2015-04-13 株式会社ジャパンディスプレイ 有機エレクトロルミネッセンス表示装置の製造方法
KR20150043908A (ko) * 2013-10-15 2015-04-23 삼성디스플레이 주식회사 트레이 조립체 및 이를 이용한 도너필름의 제조방법
KR102100296B1 (ko) * 2013-10-28 2020-04-13 엘지디스플레이 주식회사 분할 마스크 조립체
CN103757588B (zh) * 2013-12-30 2016-02-03 昆山工研院新型平板显示技术中心有限公司 一种掩膜板及该掩膜板的制备方法和应用
KR102273049B1 (ko) * 2014-07-04 2021-07-06 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 어셈블리
KR102273050B1 (ko) * 2014-09-17 2021-07-06 삼성디스플레이 주식회사 증착용 마스크 어셈블를 포함하는 증착 장치 및 증착 방법
CN104611668B (zh) * 2015-01-29 2017-03-01 京东方科技集团股份有限公司 用于掩膜板的框架和掩膜板
KR102334410B1 (ko) * 2015-04-13 2021-12-03 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리
KR102366570B1 (ko) * 2015-06-19 2022-02-25 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
KR102366569B1 (ko) * 2015-07-01 2022-02-25 삼성디스플레이 주식회사 박막 증착용 마스크 인장 용접 장치
KR102401484B1 (ko) * 2015-08-31 2022-05-25 삼성디스플레이 주식회사 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조 방법
KR102549358B1 (ko) * 2015-11-02 2023-06-29 삼성디스플레이 주식회사 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법
KR102532305B1 (ko) * 2016-06-15 2023-05-15 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
KR102616578B1 (ko) * 2016-06-24 2023-12-22 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리와, 이의 제조 방법
CN106480404B (zh) * 2016-12-28 2019-05-03 京东方科技集团股份有限公司 一种掩膜集成框架及蒸镀装置
US20190044068A1 (en) * 2017-08-01 2019-02-07 Wuhan China Star Optoelectronics Semiconductor Dis play Technology Co., Ltd. Mask plate
KR102514115B1 (ko) * 2018-06-12 2023-03-28 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 마스크 조립체
KR102630638B1 (ko) * 2018-08-29 2024-01-30 삼성디스플레이 주식회사 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조방법
JP7487481B2 (ja) 2019-02-06 2024-05-21 大日本印刷株式会社 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法
US11613802B2 (en) * 2020-04-17 2023-03-28 Rockwell Collins, Inc. Additively manufactured shadow masks for material deposition control
CN111394692B (zh) * 2020-05-09 2022-05-13 京东方科技集团股份有限公司 掩膜版
CN111876725A (zh) * 2020-07-31 2020-11-03 京东方科技集团股份有限公司 组合掩膜板及其支撑掩膜板
KR102868862B1 (ko) * 2020-12-10 2025-10-13 삼성디스플레이 주식회사 증착용 마스크 및 이를 포함하는 증착 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3241519A (en) * 1962-04-05 1966-03-22 Western Electric Co Tensioned and cooled mask
KR100595310B1 (ko) 2002-02-22 2006-07-03 엘지.필립스 엘시디 주식회사 마스크 고정장치 및 그를 이용한 ｕｖ조사장치
US7006202B2 (en) 2002-02-21 2006-02-28 Lg.Philips Lcd Co., Ltd. Mask holder for irradiating UV-rays
JP4439203B2 (ja) * 2003-05-09 2010-03-24 大日本印刷株式会社 多面付けマスク装置及びその組立方法
KR100603400B1 (ko) 2004-11-18 2006-07-20 삼성에스디아이 주식회사 평판표시장치의 박막 증착용 마스크
JP4795842B2 (ja) * 2006-04-26 2011-10-19 日本冶金工業株式会社 蒸着用治具
JP2008156686A (ja) 2006-12-22 2008-07-10 Seiko Epson Corp マスクおよびマスク蒸着装置
KR101117645B1 (ko) * 2009-02-05 2012-03-05 삼성모바일디스플레이주식회사 마스크 조립체 및 이를 이용한 평판표시장치용 증착 장치
KR101049804B1 (ko) 2009-02-19 2011-07-15 삼성모바일디스플레이주식회사 증착 장치용 마스크 밀착 수단 및 이를 이용한 증착 장치
KR20100008826U (ko) 2009-02-27 2010-09-06 주식회사 디엠에스 마스크글라스 지지유닛

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190140768A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20190140775A (ko) 2018-06-12 2019-12-20 어플라이드 머티어리얼스, 인코포레이티드 마스크프레임 및 마스크조립체
KR20230139566A (ko) 2022-03-28 2023-10-05 스템코 주식회사 증착 마스크, 그 제조 방법 및 그 제조용 금속판
KR20230140975A (ko) 2022-03-30 2023-10-10 스템코 주식회사 증착 마스크 및 그 제조 방법

Also Published As

Publication number Publication date
US8631761B2 (en) 2014-01-21
KR20120140473A (ko) 2012-12-31
JP6073573B2 (ja) 2017-02-01
JP2013004520A (ja) 2013-01-07
US20120325143A1 (en) 2012-12-27

Similar Documents

Publication Publication Date Title
KR101833234B1 (ko) 박막 증착용 마스크 프레임 어셈블리
KR101820020B1 (ko) 박막 증착용 마스크 프레임 어셈블리
US9346078B2 (en) Mask frame assembly for thin film deposition
KR101182440B1 (ko) 박막 증착용 마스크 프레임 조립체
US7802537B2 (en) Mask frame assembly for depositing thin layer and organic light emitting display device manufactured using the mask frame assembly
US8701592B2 (en) Mask frame assembly, method of manufacturing the same, and method of manufacturing organic light-emitting display device using the mask frame assembly
US9321074B2 (en) Method of manufacturing a mask frame assembly for thin film deposition
KR102432350B1 (ko) 마스크 프레임 조립체, 이를 포함하는 증착 장치 및 표시 장치의 제조 방법
KR102411540B1 (ko) 마스크 프레임 조립체, 그 제조 방법 및 표시 장치의 제조 방법
KR20150042601A (ko) 박막 증착용 마스크 및 이를 사용한 유기 발광 표시 장치의 제조 방법 및 유기 발광 표시 장치
KR102568780B1 (ko) 박막 증착용 마스크 프레임 어셈블리
KR20170000058A (ko) 박막 증착용 마스크 어셈블리와, 이를 이용하여 제조된 유기 발광 디스플레이 장치
KR20100119675A (ko) 박막 증착용 마스크 프레임 조립체 및 이를 이용한 유기 발광 표시장치의 제조방법
KR100603398B1 (ko) 증착용 마스크 및 전계발광 디스플레이 장치

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

N231 Notification of change of applicant
PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E90F Notification of reason for final refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20250223

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20250223