KR101831099B1 - 무전해 니켈 또는 니켈 합금 도금용 니켈 콜로이드 촉매액 및 무전해 니켈 또는 니켈 합금 도금방법 - Google Patents

무전해 니켈 또는 니켈 합금 도금용 니켈 콜로이드 촉매액 및 무전해 니켈 또는 니켈 합금 도금방법 Download PDF

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KR101831099B1
KR101831099B1 KR1020167035470A KR20167035470A KR101831099B1 KR 101831099 B1 KR101831099 B1 KR 101831099B1 KR 1020167035470 A KR1020167035470 A KR 1020167035470A KR 20167035470 A KR20167035470 A KR 20167035470A KR 101831099 B1 KR101831099 B1 KR 101831099B1
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South Korea
Prior art keywords
nickel
acid
solution
electroless
catalyst solution
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KR1020167035470A
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English (en)
Korean (ko)
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KR20170008287A (ko
Inventor
에이 우치다
가오루 다나카
아이 가와바타
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이시하라 케미칼 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1635Composition of the substrate
    • C23C18/1639Substrates other than metallic, e.g. inorganic or organic or non-conductive
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/48Coating with alloys
    • C23C18/50Coating with alloys with alloys based on iron, cobalt or nickel

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Catalysts (AREA)
KR1020167035470A 2014-09-11 2015-07-17 무전해 니켈 또는 니켈 합금 도금용 니켈 콜로이드 촉매액 및 무전해 니켈 또는 니켈 합금 도금방법 KR101831099B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-184889 2014-09-11
JP2014184889A JP6201153B2 (ja) 2014-09-11 2014-09-11 無電解ニッケル又はニッケル合金メッキ用のニッケルコロイド触媒液並びに無電解ニッケル又はニッケル合金メッキ方法
PCT/JP2015/070619 WO2016039016A1 (ja) 2014-09-11 2015-07-17 無電解ニッケル又はニッケル合金メッキ用のニッケルコロイド触媒液並びに無電解ニッケル又はニッケル合金メッキ方法

Publications (2)

Publication Number Publication Date
KR20170008287A KR20170008287A (ko) 2017-01-23
KR101831099B1 true KR101831099B1 (ko) 2018-04-04

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KR1020167035470A KR101831099B1 (ko) 2014-09-11 2015-07-17 무전해 니켈 또는 니켈 합금 도금용 니켈 콜로이드 촉매액 및 무전해 니켈 또는 니켈 합금 도금방법

Country Status (5)

Country Link
JP (1) JP6201153B2 (ja)
KR (1) KR101831099B1 (ja)
CN (1) CN106460179B (ja)
TW (1) TWI621736B (ja)
WO (1) WO2016039016A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230077067A (ko) 2021-11-25 2023-06-01 삼우금속공업 주식회사 티타늄 소재의 무전해 니켈 도금방법

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6268379B2 (ja) * 2016-07-08 2018-01-31 石原ケミカル株式会社 無電解ニッケル又はニッケル合金メッキ用のニッケルコロイド触媒液並びに無電解ニッケル又はニッケル合金メッキ方法
CN108866517B (zh) * 2018-07-03 2020-04-17 广东工业大学 一种无光化学镀镍制备方法
CN109576686A (zh) * 2019-01-11 2019-04-05 江门市德商科佐科技实业有限公司 一种增强化学镀镍溶液稳定性的添加剂
CN110548527B (zh) * 2019-07-26 2022-08-09 青岛科技大学 一种化学镀制备负载型Ni-Fe-P-MnFeO3电催化剂的方法
CN110306174A (zh) * 2019-07-29 2019-10-08 深圳市飞荣达科技股份有限公司 胶体镍组合物及其应用
JP6843455B1 (ja) * 2020-04-27 2021-03-17 石原ケミカル株式会社 無電解ニッケル又はニッケル合金メッキ用のニッケルコロイド触媒液並びに無電解ニッケル又はニッケル合金メッキ方法
JP6858425B1 (ja) * 2020-06-24 2021-04-14 石原ケミカル株式会社 無電解ニッケル又はニッケル合金メッキ用のニッケルコロイド触媒液並びに無電解ニッケル又はニッケル合金メッキ方法
JP6950051B1 (ja) * 2020-07-22 2021-10-13 上村工業株式会社 無電解Ni−Pめっき用触媒液、および該触媒液を用いた無電解Ni−Pめっき皮膜の形成方法
CN112680761B (zh) * 2020-12-16 2023-12-26 江西瑞顺超细铜线科技协同创新有限公司 一种镀镍铈合金软铜线生产工艺
RU2762733C1 (ru) * 2021-02-18 2021-12-22 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д.И. Менделеева" (РХТУ им. Д.И. Менделеева) Раствор для химического никелирования металлических изделий
CN113122846B (zh) * 2021-04-03 2023-04-28 昆山陆新新材料科技有限公司 一种铝合金金属镀件
CN114411127B (zh) * 2022-01-26 2023-08-08 深圳市溢诚电子科技有限公司 基于钌-钯体系的化学镀镍前处理活化液及其制备方法
JP7220494B1 (ja) 2022-08-26 2023-02-10 石原ケミカル株式会社 金含有メッキ液中の金濃度測定装置並びに測定方法
CN115522186B (zh) * 2022-10-09 2023-04-11 深圳创智芯联科技股份有限公司 一种玻璃基板的化学镀镍液及其化学镀镍工艺
CN116770282B (zh) * 2023-07-04 2024-03-19 江苏贺鸿电子有限公司 一种线路板用化学镀镍工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2881871B2 (ja) * 1989-12-08 1999-04-12 ソニー株式会社 光ディスクの原盤作成方法
JP2004190066A (ja) * 2002-12-09 2004-07-08 Yutaka Fujiwara 無電解めっき用触媒組成物
JP6013753B2 (ja) * 2012-03-30 2016-10-25 タキロン株式会社 軒樋曲り継手

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0613753B2 (ja) * 1988-09-29 1994-02-23 三晃特殊金属工業株式会社 無電解メッキに使用する微細な金属体を含む溶液の製造方法
JP3960674B2 (ja) * 1998-01-22 2007-08-15 ディップソール株式会社 金属コロイド安定化剤、該安定化剤を含有する金属コロイド液状組成物、その調製方法及びその使用
JP3826544B2 (ja) 1998-02-27 2006-09-27 奥野製薬工業株式会社 無電解めっき用触媒組成物
GB0025989D0 (en) * 2000-10-24 2000-12-13 Shipley Co Llc Plating catalysts
JP4679716B2 (ja) 2000-12-08 2011-04-27 日揮触媒化成株式会社 金属コロイド溶液の製造方法
JP4081576B2 (ja) 2003-06-18 2008-04-30 上村工業株式会社 無電解めっき皮膜の形成方法、それに用いる置換触媒溶液、並びにプリント配線基板及び放熱めっき部材
JP2013028866A (ja) * 2006-03-09 2013-02-07 Okuno Chemical Industries Co Ltd 無電解ニッケルめっき液
JP5344416B2 (ja) * 2006-03-09 2013-11-20 奥野製薬工業株式会社 自己触媒型無電解ニッケルめっき液用耐折り曲げ性向上剤及び自己触媒型無電解ニッケルめっき液
CN101684554B (zh) * 2008-09-23 2012-03-07 比亚迪股份有限公司 一种聚酰亚胺薄膜的化学镀铜液及其表面化学镀铜方法
JP5570285B2 (ja) * 2010-04-19 2014-08-13 株式会社日本表面処理研究所 無電解めっき法で用いる触媒水溶液、その触媒水溶液の調製方法及びその触媒水溶液を用いた無電解めっき法並びにその無電解めっき法を用いて形成した金属皮膜を備える金属層付被めっき物
US8591636B2 (en) * 2010-12-14 2013-11-26 Rohm And Haas Electronics Materials Llc Plating catalyst and method
US8591637B2 (en) 2010-12-14 2013-11-26 Rohm And Haas Electronic Materials Llc Plating catalyst and method
CN102877046A (zh) * 2011-07-13 2013-01-16 比亚迪股份有限公司 一种化学镀铜液及化学镀铜方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2881871B2 (ja) * 1989-12-08 1999-04-12 ソニー株式会社 光ディスクの原盤作成方法
JP2004190066A (ja) * 2002-12-09 2004-07-08 Yutaka Fujiwara 無電解めっき用触媒組成物
JP6013753B2 (ja) * 2012-03-30 2016-10-25 タキロン株式会社 軒樋曲り継手

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230077067A (ko) 2021-11-25 2023-06-01 삼우금속공업 주식회사 티타늄 소재의 무전해 니켈 도금방법

Also Published As

Publication number Publication date
TW201610228A (zh) 2016-03-16
CN106460179B (zh) 2019-05-10
CN106460179A (zh) 2017-02-22
JP6201153B2 (ja) 2017-09-27
WO2016039016A1 (ja) 2016-03-17
JP2016056421A (ja) 2016-04-21
TWI621736B (zh) 2018-04-21
KR20170008287A (ko) 2017-01-23

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