KR101816327B1 - 기판 처리 장치 - Google Patents

기판 처리 장치 Download PDF

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Publication number
KR101816327B1
KR101816327B1 KR1020127021746A KR20127021746A KR101816327B1 KR 101816327 B1 KR101816327 B1 KR 101816327B1 KR 1020127021746 A KR1020127021746 A KR 1020127021746A KR 20127021746 A KR20127021746 A KR 20127021746A KR 101816327 B1 KR101816327 B1 KR 101816327B1
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KR
South Korea
Prior art keywords
sheet substrate
substrate
roller
processed
projection
Prior art date
Application number
KR1020127021746A
Other languages
English (en)
Korean (ko)
Other versions
KR20120138751A (ko
Inventor
도모나리 스즈키
Original Assignee
가부시키가이샤 니콘
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Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20120138751A publication Critical patent/KR20120138751A/ko
Application granted granted Critical
Publication of KR101816327B1 publication Critical patent/KR101816327B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020127021746A 2010-02-12 2011-02-10 기판 처리 장치 KR101816327B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30398610P 2010-02-12 2010-02-12
US61/303,986 2010-02-12
PCT/JP2011/052879 WO2011099563A1 (ja) 2010-02-12 2011-02-10 基板処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177037335A Division KR101948467B1 (ko) 2010-02-12 2011-02-10 기판 처리 장치 및 기판 처리 방법

Publications (2)

Publication Number Publication Date
KR20120138751A KR20120138751A (ko) 2012-12-26
KR101816327B1 true KR101816327B1 (ko) 2018-01-08

Family

ID=44367833

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020127021746A KR101816327B1 (ko) 2010-02-12 2011-02-10 기판 처리 장치
KR1020177037335A KR101948467B1 (ko) 2010-02-12 2011-02-10 기판 처리 장치 및 기판 처리 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020177037335A KR101948467B1 (ko) 2010-02-12 2011-02-10 기판 처리 장치 및 기판 처리 방법

Country Status (6)

Country Link
JP (1) JP5761034B2 (zh)
KR (2) KR101816327B1 (zh)
CN (1) CN102741754B (zh)
HK (1) HK1171820A1 (zh)
TW (2) TWI557840B (zh)
WO (1) WO2011099563A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101868310B1 (ko) * 2012-04-13 2018-07-17 가부시키가이샤 니콘 카세트 장치, 기판 반송 장치, 기판 처리 장치 및 기판 처리 방법
TWI611996B (zh) * 2012-05-18 2018-01-21 尼康股份有限公司 基板處理裝置
CN102790002B (zh) * 2012-07-27 2015-02-11 京东方科技集团股份有限公司 柔性基板处理装置
JP6459234B2 (ja) * 2014-06-16 2019-01-30 株式会社ニコン 基板処理装置
KR102007627B1 (ko) * 2013-07-08 2019-08-05 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템, 디바이스 제조 방법, 및 패턴 형성 장치
WO2015146025A1 (ja) * 2014-03-25 2015-10-01 株式会社アルバック 成膜装置及び成膜方法
TWI639064B (zh) * 2014-04-01 2018-10-21 日商尼康股份有限公司 基板處理裝置及元件製造方法
CN106164779B (zh) * 2014-04-01 2019-01-22 株式会社尼康 基板处理装置
CN108604063A (zh) * 2015-11-30 2018-09-28 株式会社尼康 曝光装置、曝光系统、基板处理方法、以及元件制造装置
JP6723831B2 (ja) * 2016-06-01 2020-07-15 株式会社オーク製作所 露光装置
JP7023620B2 (ja) * 2017-05-30 2022-02-22 株式会社オーク製作所 露光装置及び基板載置方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235877A (ja) * 1999-12-14 2001-08-31 Sony Chem Corp 露光方法
JP2007067355A (ja) * 2005-09-02 2007-03-15 Sharp Corp 基板表面処理装置および基板表面処理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198857A (en) * 1990-03-30 1993-03-30 Ushio Denski Kabushiki Kaisha Film exposure apparatus and method of exposure using the same
US5743931A (en) * 1995-08-14 1998-04-28 Libbey-Owens-Ford Co. Glass sheet conveying and bending apparatus
JP3201233B2 (ja) * 1995-10-20 2001-08-20 ウシオ電機株式会社 裏面にアライメント・マークが設けられたワークの投影露光方法
JP3336955B2 (ja) * 1998-05-26 2002-10-21 ウシオ電機株式会社 裏面アライメント機能を備えた露光装置
JP2006102991A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2006106505A (ja) * 2004-10-07 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
WO2006100868A1 (ja) * 2005-03-18 2006-09-28 Konica Minolta Holdings, Inc. 有機化合物層の形成方法、有機ｅｌ素子の製造方法、有機ｅｌ素子
JP4224479B2 (ja) * 2005-09-07 2009-02-12 富士フイルム株式会社 パターン露光方法及び装置
JP5104107B2 (ja) * 2007-08-02 2012-12-19 ウシオ電機株式会社 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
JP5117243B2 (ja) * 2008-03-27 2013-01-16 株式会社オーク製作所 露光装置
JP2010014939A (ja) * 2008-07-03 2010-01-21 Nikon Corp 回路素子の製造装置及び製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235877A (ja) * 1999-12-14 2001-08-31 Sony Chem Corp 露光方法
JP2007067355A (ja) * 2005-09-02 2007-03-15 Sharp Corp 基板表面処理装置および基板表面処理方法

Also Published As

Publication number Publication date
JPWO2011099563A1 (ja) 2013-06-17
KR101948467B1 (ko) 2019-02-14
TWI492326B (zh) 2015-07-11
TW201207980A (en) 2012-02-16
JP5761034B2 (ja) 2015-08-12
WO2011099563A1 (ja) 2011-08-18
KR20120138751A (ko) 2012-12-26
KR20180004833A (ko) 2018-01-12
TW201535576A (zh) 2015-09-16
CN102741754B (zh) 2015-12-02
TWI557840B (zh) 2016-11-11
CN102741754A (zh) 2012-10-17
HK1171820A1 (zh) 2013-04-05

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