WO2015146025A1 - 成膜装置及び成膜方法 - Google Patents
成膜装置及び成膜方法 Download PDFInfo
- Publication number
- WO2015146025A1 WO2015146025A1 PCT/JP2015/001306 JP2015001306W WO2015146025A1 WO 2015146025 A1 WO2015146025 A1 WO 2015146025A1 JP 2015001306 W JP2015001306 W JP 2015001306W WO 2015146025 A1 WO2015146025 A1 WO 2015146025A1
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- sheet
- base material
- mask material
- mask
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Definitions
- the present invention relates to a film forming apparatus and a film forming method, and more specifically, while a sheet-like base material is traveling at a predetermined speed, a film forming material is supplied through a mask and continuously in a predetermined pattern on one side of the base material. Then, it is related with what forms a film.
- Patent Document 1 This type of film forming apparatus is known from Patent Document 1, for example.
- This includes a substrate running means for running a sheet (band) -like substrate, a transfer substrate running means for running the sheet-like transfer substrate in an annular shape, and a film-forming material for the sheet-like transfer substrate portion.
- the film forming means for supplying the film and the sheet-like mask material (shadow mask) that is partially in close contact with the transfer substrate and limits the supply range of the film-forming material to the transfer substrate are synchronized with the sheet-like transfer substrate.
- a mask material traveling means a mask material traveling means.
- a film-forming material is supplied to the transfer substrate through a mask, and a film continuously formed in a predetermined pattern on one side of the transfer substrate is transferred to the sheet-like substrate, so that one side of the sheet-like substrate is transferred.
- a predetermined film is continuously formed in a predetermined pattern.
- both the sheet-like base material portion and the sheet-like transfer substrate portion are located in parallel in the vertical direction, and in the transfer region including the portion to be transferred to the sheet-like base material, Since a gap is provided between the portions, an alignment mechanism is provided to align the transfer substrate with respect to the portion of the base material.
- the alignment mechanism aligns the transfer substrate with respect to the base material by adjusting the position and angle in the width direction of the pair of guide rolls arranged so as to sandwich the transfer portion.
- the tension applied to the sheet-like transfer substrate or the sheet-like mask material becomes non-uniform, and distortion occurs in the sheet-like transfer substrate and the sheet-like mask material. There is a possibility that it cannot be aligned.
- the present invention supplies a film-forming material through a mask while continuously running a sheet-like base material at a predetermined speed, and continuously forms a film in a predetermined pattern on one side of the base material.
- a film-forming apparatus and a film-forming method capable of aligning a sheet-like base material portion and a sheet-like transfer substrate portion with high accuracy and reducing apparatus cost and running cost It is the subject to provide.
- a film forming apparatus of the present invention includes a substrate traveling means for traveling a sheet-like substrate at a predetermined speed in a vacuum processing chamber, and a sheet-like substrate traveling in one direction.
- a film forming means for supplying a film forming material to the portion, and a mask material running means for running a sheet-like mask material for restricting a supply range of the film forming material to the sheet-like base material.
- the mask material traveling means makes the portion of the sheet-like mask material located below the part of the sheet-like base material that travels in one direction parallel It has a parallel running area forming part that runs and a driving part that runs the sheet-like mask material in synchronization with the sheet-like base material, and the parallel running area forming part and the driving part are installed on a single frame. It is characterized by that.
- the film-formation material is supplied directly from the film-formation source while the sheet-like mask material portion is running in parallel with the sheet-like base material portion that runs in one direction. Since the film is formed over the mask material, a mechanism for once transferring to another substrate is not required as in the conventional example, and the apparatus cost and running cost can be reduced. Also, the elements that run the sheet-like mask material are installed on a single frame to form a unit, and the frame itself is moved to align the sheet-shaped mask material portion with the sheet-like base material portion.
- the configuration is adopted, when the position of the sheet-like mask material portion relative to the sheet-like base material portion is aligned, the running state of the sheet-like mask material to which a certain tension is applied does not change, the sheet No forced distortion occurs in the mask material and thus the mask pattern. Therefore, it is possible to continuously form a film on the sheet-like substrate with a precise pattern in a state where the sheet-like substrate portion and the sheet-like mask material portion are aligned with high accuracy.
- a film forming apparatus that has a sheet-like mask material that has been cleaned is set.
- the film formation on the sheet-like substrate can be resumed as soon as possible.
- the speed detection means for detecting the speed of traveling the sheet-like base material or the sheet-like mask material, and the direction in which the portion of the sheet-like base material travels in one direction is the X-axis direction. And a relative displacement amount in the X-axis direction of the sheet-shaped mask material with respect to the sheet-shaped substrate in a region where the sheet-shaped base material portion and the sheet-shaped mask material portion are positioned vertically.
- a first detecting means for detecting, either one of the sheet-like base material and the sheet-like mask material is matched with the detected value of the other speed detecting means, and both are synchronized, According to a detection value of the first detection means, either one of the base material traveling means and the drive unit is controlled to correct the position of the sheet-like mask material with respect to the sheet-like base material. preferable.
- the direction in which the sheet-like base material portion travels in one direction is the X-axis direction, the direction orthogonal to the Y-axis direction, and the rotation direction about the Z-axis as the vertical direction is ⁇ z.
- the pedestal is placed on a Y- ⁇ z stage, and in the region where the sheet-like base material portion and the sheet-like mask material portion are positioned vertically, the sheet-like base material
- the mask traveling means travels in parallel with the sheet-shaped mask material portion with a predetermined interval in the vertical direction with respect to the sheet-shaped substrate portion traveling in one direction.
- the Y- ⁇ z stage is provided with driving means for moving the Y- ⁇ z stage up and down, and in the region where the sheet-like base material portion and the sheet-like mask material portion are positioned vertically, the sheet-like
- the third detection means for detecting the vertical gap between the base material and the sheet-like mask material is provided, and the Y- ⁇ z stage is moved up and down by the drive means in accordance with the detection value of the third detection means. It is preferable that the height position of the sheet-shaped mask material with respect to the substrate is corrected.
- the sheet-like base material portion is pressed toward the sheet-like mask material portion, and the sheet-like base material and the sheet-like mask material are brought into contact with each other. It can also comprise so that the press means to make it further be provided.
- the mask material traveling unit includes a moving unit that can move in the Y-axis direction between the vacuum processing chamber and the outside of the vacuum processing chamber.
- the film forming method of the present invention for forming a film on a sheet-like substrate using the film-forming apparatus includes a sheet-like substrate and a sheet-like mask in the X-axis direction. Alignment marks are arranged at intervals, and both the first and second detection means are imaging means, and the imaging means causes an alignment arc between the sheet-like base material portion and the sheet-like mask material portion. The captured image is analyzed, and the captured image is analyzed.
- the relative displacement amount ( ⁇ X) of the sheet-shaped mask material with respect to the sheet-shaped base material in the X-axis direction and the Y of the sheet-shaped mask material with respect to the sheet-shaped base material At least one of an axial relative displacement ( ⁇ Y) and an angle ( ⁇ z) between the traveling direction of the sheet-like base material and the traveling direction of the sheet-like mask material is detected, and the detected relative displacement amount ( ⁇ X) based on the substrate running means and the drive
- the amount of increase or decrease of the traveling speed of the sheet-like base material or the sheet-like mask is commanded to any one of the sections, and the detected relative displacement ( ⁇ Y) and angle ( Based on at least one of [Delta] [theta] z), the Y- [theta] z stage is instructed to move at least one of movement of the gantry in the Y-axis direction and rotation in the [theta] direction, and a sheet-like mask for the sheet-like substrate.
- the traveling speed and position of the material
- the film-forming material is passed over the mask with respect to the sheet-like base material that runs at a predetermined speed.
- the sheet-like mask material portion is caused to run in parallel with a predetermined interval in the vertical direction with respect to the sheet-like substrate portion that is moved in one direction by the mask traveling means, and film formation is performed in the region.
- the sheet-like mask material portion is slightly inclined with respect to the sheet-like base material portion, and there is a region with a relatively wide gap between them, mask blur occurs in the region, and high accuracy is achieved. I can't do it.
- the third detection means is arranged in the X-axis direction. A plurality of rows are arranged at predetermined intervals, and the sheet with respect to the sheet-like base material is determined from the distance in the Z-axis direction between the sheet-like base material portion and the sheet-like mask material portion detected by the third detecting means.
- the inclination of the mask-shaped mask material is detected, and based on the detected inclination, the tilting amount of the sheet-shaped mask material relative to the sheet-shaped substrate is commanded to the tilting means to correct the tilt, and after the tilt correction, the travel speed And the position are preferably corrected.
- the image picked up by the image pickup means is analyzed to detect at least one of the relative displacement amount ( ⁇ X) in the X-axis direction, the relative displacement amount ( ⁇ Y) and the angle ( ⁇ z) in the Y-axis direction.
- the inclination of the sheet-like mask material with respect to the sheet-like substrate is detected from the interval in the Z-axis direction between the sheet-like substrate portion and the sheet-like mask material portion detected by the third detection means, respectively.
- the tilting means of the sheet-like mask material with respect to the sheet-like base material is instructed to the tilting means to correct the inclination, and the sheet-like base material with respect to the sheet-like base material accompanying the tilt correction is corrected.
- the movement error of the mask material in the X-axis direction and the Y-axis direction is calculated, and the movement error is calculated as a relative displacement amount ( ⁇ X) and / or a relative displacement amount ( ⁇ Y) and an angle ( ⁇ z) in the Y-axis direction.
- any of the substrate running means and the drive unit The amount of change in the traveling speed of the sheet-like base material or the sheet-like mask is commanded to one of them, and at least one of the movement of the gantry in the Y-axis direction and the rotation in the ⁇ direction is synchronized with this command.
- the amount can be commanded to correct the running speed and position of the sheet-like mask material relative to the sheet-like substrate. According to this, it may be possible to correct the position of the sheet-like mask material with respect to the sheet-like base material as quickly as possible.
- FIG. 1 is a schematic perspective view showing a configuration of a film forming apparatus according to an embodiment of the present invention.
- the schematic cross section of the film-forming apparatus shown in FIG. (A) And (b) is a figure explaining the position shift of the sheet-like base material with respect to a sheet-like mask material. The figure explaining the alignment of the sheet-like base material with respect to a sheet-like mask material.
- (A) And (b) is the front view and side view which expand and show the principal part of the film-forming apparatus which concerns on the further another modification of this invention.
- the film forming means is a resistance board, and a case where a predetermined thin film is continuously formed over a mask Sm while the sheet substrate Sw is traveling at a predetermined speed is taken as an example.
- An embodiment of a membrane device will be described.
- the direction in which the part Sw1 of the sheet-like base material Sw is transferred in one direction in the film forming chamber 1a is the X-axis direction (the left-right direction in FIG. 2), and the direction orthogonal to this is the same plane.
- the direction perpendicular to the Y-axis direction, the X-axis direction, and the Y-axis direction is the Z-axis direction (the vertical direction in FIG. 2)
- the rotation direction around the Z-axis is the ⁇ z direction
- the upper direction in the X-axis direction and the Z-axis direction The terms indicating directions such as down, left and right are based on FIG.
- DM is a film forming apparatus according to an embodiment of the present invention.
- the film forming apparatus DM includes a vacuum processing chamber 1 connected to a vacuum pump (not shown) and evacuated to a predetermined pressure.
- the vacuum processing chamber 1 performs a film forming process on the sheet-like substrate Sw.
- the film chamber 1a is composed of an upstream auxiliary chamber 1b and a downstream auxiliary chamber 1c connected to the left and right in the X-axis direction of the film forming chamber 1a.
- a sheet-like base material Sw is held in a wound state, and a feeding roller 21 rotated by a motor DM1 and a sheet-like base material Sw fed from the feeding roller 21 are wound.
- An upstream guide roller 22 and a downstream guide roller 23 that are hung and guide to the upper space of the film forming chamber 1a are provided.
- the upstream auxiliary chamber 1b is provided with a dancer roller 24 which is located between the upstream guide roller 22 and the downstream guide roller 23 and is movable in the Z-axis direction.
- a spring 24b for urging the rotary shaft 24a upward is attached to the rotary shaft 24a of the dancer roller 24, and the tension of the sheet-like substrate Sw inserted through the film forming chamber 1a is maintained at a predetermined value. I am doing so.
- tensile_strength of the sheet-like base material Sw at a predetermined value is not limited to this, It is good also as variable the tension
- the downstream guide roller 23 is provided with a sensor 25 as speed detecting means for detecting the rotational speed, and the feed speed of the sheet-like substrate Sw fed to the film forming chamber 1a based on the rotational speed is set. It can be detected.
- each of the elements 21 to 24 and 31, 32 described above constitutes a base material traveling means for traveling on the sheet-like base material Sw at a predetermined speed.
- the mask material traveling means 4 includes a single base 41 composed of a rectangular substrate portion 41a and four plate-like support portions 41b erected at the four corners of the substrate portion 41a.
- Two rollers 42a to 42d are pivotally supported at predetermined intervals in the vertical direction on the surface of the support 41 in the gantry 41 facing the Y-axis direction.
- the rotating shaft of the roller 42d located on the lower left side is connected to the motor DM2.
- the sheet-like mask material Sm is wound around the rollers 42a to 42d in an endless manner, and the sheet-like mask material Sm travels by the rotational drive of the motor DM2.
- the upper left roller 42a and the upper right roller 42b arranged at a predetermined interval in the X-axis direction are formed on the sheet-like substrate Sw that is transported horizontally in the film forming chamber 1a.
- a roller 42d with a motor DM2 located on the lower left side forms a parallel running region forming portion that horizontally moves the portion Sm1 of the sheet-like mask material Sm with a predetermined interval in the vertical direction with respect to the portion Sw1.
- the drive part which drives the sheet-like mask material Sm synchronizing with the substrate-shaped substrate Sw is comprised.
- the rotational speed of the motor DM2 is calculated from the feed speed of the sheet-like base material Sw corresponding to the detection value of the sensor 25, and the feed speed of the sheet-like base material Sw is set to the sheet-like mask material Sm. It is controlled so as to be equal to the feed rate.
- the sheet-like mask material Sm a material in which holes or slits corresponding to a pattern to be formed on the sheet-like base material Sw are formed as a mask pattern is used.
- the sheet-like mask material for the sheet-like substrate Sw is positioned on the same X-axis at both ends in the width direction (Y-axis direction) of the sheet-like substrate Sw and the sheet-like mask material Sm.
- Alignment marks Am1 and Am2 for detecting relative displacement amounts ⁇ X, ⁇ Y, and ⁇ z of Sm are formed in the Y-axis direction at predetermined intervals (for example, in the range of 5 to 10 mm), respectively (see FIG. 3).
- the alignment mark Am1 of the sheet-like base material Sw is configured by a through hole having a predetermined diameter in a plan view, and the alignment mark Am2 of the sheet-like mask material Sw is smaller in diameter than the alignment mark Am1.
- the alignment marks Am1, Am2 are aligned so that the centers thereof coincide with each other.
- the width direction (Y-axis direction) of the sheet-like base material Sw is arranged at both ends so that the start position and the end position of the film forming can be specified.
- the marks Sp and Ep are formed to indicate the detection start point and the detection end point in distinction from the alignment marks Am1 and Am2.
- the marks Sp and Ep can be formed by a through hole having a larger diameter than the alignment marks Am1 and Am2, a through hole having a triangular shape in plan view, or the like.
- the alignment marks Am1 and Am2 are formed only at one end in the width direction (Y-axis direction) between the sheet-like base material Sw and the sheet-like mask material Sm, and the sheet is formed on the sheet-like base material Sw.
- the mask material Sm can be aligned.
- the film forming chamber 1a is provided with a Y- ⁇ z stage 5 that supports the gantry 41, and the Y- ⁇ z stage 5 is provided with a linear actuator 6 that can move up and down.
- the Y- ⁇ z stage 5 has a known structure capable of moving the gantry 41 in the Y-axis direction and rotating the gantry 41 in the ⁇ z direction, and the linear actuator 6 has the gantry 41 as the Y- ⁇ z. Since a known structure that can move up and down with respect to each stage can be used, detailed description is omitted here.
- a rail member 71 extending in the Y-axis direction is provided on the lower surface of the film forming chamber 1a, and a carriage 72 that can travel along the rail member 71 is provided.
- a - ⁇ z stage 5 and a gantry 41 are installed.
- an opening / closing door (not shown) is provided on the wall surface defining the film forming chamber 1a so that the mask material running means 4 can be moved back and forth to the film forming chamber 1a.
- the rail member 71 and the carriage 72 constitute a moving means that allows the mask material traveling means 4 to move in the Y-axis direction between the film forming chamber 1a and the outside of the film forming chamber 1a.
- two viewing windows 12 are provided on the upper wall surface 11 defining the film forming chamber 1a at a predetermined interval in the Y-axis direction.
- imaging means 81 and 82 such as a CCD camera are arranged above the viewing window 12.
- the imaging units 81 and 82 are sheet-like with respect to the portion Sw1 of the sheet-like substrate Sw that is horizontally transferred in the film forming chamber 1a at both ends in the width direction (Y-axis direction) of the sheet-like substrate Sw.
- the relative position of the portion Sm1 of the mask material Sm and the alignment marks Am1, Am2 are imaged.
- the imaging units 81 and 82 are configured such that the relative displacement amount ⁇ Y in the Y-axis direction of the sheet-like mask material Sm with respect to the sheet-like substrate Sw or the traveling direction of the sheet-like substrate Sw and the sheet shape.
- the second detection means for detecting the angle ⁇ z formed with the traveling direction of the mask material Sm of the first and second imaging means 81, 82 includes the part Sw 1 of the sheet-like base material Sw and the sheet-like mask material Sm.
- the first detecting means for detecting the relative displacement amount ⁇ X in the X-axis direction of the sheet-like mask material Sm with respect to the sheet-like base material Sw is also used.
- the images captured by the image capturing units 81 and 82 are analyzed by a known image analyzing unit, and the Y- ⁇ z stage 5 is appropriately moved or rotated in accordance with the analyzed value (detected value), so that the sheet-like substrate Sw The position of the sheet-like mask material Sm with respect to is corrected.
- FIG. 3A when the sheet-like mask material Sm is displaced in one direction in the Y-axis direction with respect to the sheet-like base material Sw ⁇ b> 1, imaging is performed by the imaging units 81 and 82. The obtained image is analyzed by a known image analysis means to calculate the displacement amount ⁇ Y, and the Y- ⁇ z stage 5 is moved in one direction in the Y-axis direction and corrected accordingly.
- FIG. 3B when the sheet-like mask material Sm meanders with respect to the sheet-like base material Sw, the images captured by the imaging units 81 and 82 are known image analysis.
- the angle between the traveling direction of the sheet-like base material Sw and the traveling direction of the sheet-like mask material Sm (inclination of the sheet-like mask material Sm with respect to the sheet-like base material Sw in the XY plane) ) ⁇ z is calculated, and the Y- ⁇ z stage 5 is appropriately moved in the ⁇ z-axis direction accordingly to thereby rotate the Y- ⁇ z stage 5 about the Z-axis to correct it.
- the images picked up by the image pickup means 81 and 82 are similarly analyzed, and the number of rotations of the motor DM1 or the motor DM2 is increased or decreased in accordance with the analyzed value (detection value), thereby both alignment marks Am1,
- the position of the sheet-like mask material Sm with respect to the sheet-like base material Sw is corrected so that Am2 overlaps vertically in the Z-axis direction, and the sheet-like base material Sw and the sheet-like mask material Sm travel in synchronization.
- a viewing window (not shown) is also provided on the side wall surface in the Y-axis direction that defines the film forming chamber 1a, and an imaging means 83 such as a CCD camera is disposed on the side of the viewing window.
- the imaging unit 83 is configured such that the sheet-like base material Sw and the sheet-like mask are located in a region where the portion Sw1 of the sheet-like base material Sw and the portion Sm1 of the sheet-like mask material Sm are positioned vertically.
- a third detection means for detecting a vertical gap with the material Sm is configured.
- the image picked up by the image pickup means 83 is analyzed by a known image analysis means, and the linear actuator 6 is appropriately moved up and down in accordance with the analyzed value (detection value) to make a sheet-like shape with respect to the sheet-like base material Sw.
- the height position of the mask material Sm is corrected. Control for matching the feeding speed of the sheet-like base material Sw and the feeding speed of the sheet-like mask material Sm, and the sheet-like shape with respect to the portion Sw1 of the sheet-like base material Sw transferred horizontally in the film forming chamber 1a.
- a film forming means 9 is disposed in a portion located below the portion Sm1 of the sheet-like mask material Sm in the space inside the support portion 41b of the gantry 41.
- the film forming means 9 stores a film forming material (not shown) selected according to the composition of the thin film to be formed on the sheet-like base material Sw, and a resistance board 91 for evaporating the film forming material by resistance heating.
- a box 92 in which the resistance board 91 is stored, and is supported by a side wall surface in the Y-axis direction that defines the film forming chamber 1a.
- the box 92 may be configured to be movable back and forth in the film forming chamber 1a so that the evaporation material can be easily replenished and maintained. If it is necessary to prepare a plurality of boxes 92 in which film forming materials are set in advance on the resistance board 91 and maintenance of the ones in use is required, another box 92 is set as much as possible. The film formation on the substrate Sw may be resumed.
- the film forming apparatus DM includes a control unit Cu including a personal computer, a sequencer, and the like for controlling the overall operation, and the control unit Cu is synchronized with the sheet-like base material Sw and the sheet-like mask material Sm. Travel, calculation of a correction amount based on input of image data captured by the imaging means 81, 82, 83, correction of the position of the sheet-like mask material Sm with respect to the sheet-like base material Sw by the Y- ⁇ z stage 5, etc. .
- a control unit Cu including a personal computer, a sequencer, and the like for controlling the overall operation
- the control unit Cu is synchronized with the sheet-like base material Sw and the sheet-like mask material Sm. Travel, calculation of a correction amount based on input of image data captured by the imaging means 81, 82, 83, correction of the position of the sheet-like mask material Sm with respect to the sheet-like base material Sw by the Y- ⁇ z stage 5, etc.
- the feeding roller 21 holds the sheet-like base material Sw, and the leading end of the sheet-like base material Sw is passed through the upstream guide roller 22, the downstream guide roller 23, and the dancer roller 24. It passes through the upper space of the film forming chamber 1 a where the mask material running means 4 is set in advance, and is further wound around the winding roller 31 via the guide roller 32. At this time, the sheet-like mask material Sm is moved manually or the like so that the alignment marks Am1, Am2 substantially coincide with the Z-axis direction.
- the motors DM1 and DM2 are driven to rotate and travel on the sheet-like substrate Sw from the feeding roller 21.
- the sheet-like mask material Sm is caused to travel in synchronization therewith.
- the rotational speed of the motor DM2 is calculated from the feed speed of the sheet-like base material Sw according to the detection value of the sensor 25, and the feed speed of the sheet-like base material Sw is the feed speed of the sheet-like mask material Sm.
- the sheet-like base material Sw and the sheet-like mask material Sm are run by the same length (travel amount) per hour by controlling to be equal to the speed.
- Am1u and Am2u are the alignment marks of the sheet-like base material Sw and the sheet-like mask material Sm located on the upper side
- Am1d and Am2d are the alignment marks located on the lower side.
- the control means Cu the next imaged alignment arc Am1u, Am2u, Am1d of the part Sw1 of the sheet-like base material Sw and the part Sm1 of the sheet-like mask material Sm
- the Am2d image is analyzed to detect at least one of the relative displacement amount ⁇ X in the X-axis direction and the relative displacement amount ⁇ Y and the angle ⁇ z in the Y-axis direction. Specifically, as shown in FIG.
- the alignment means Am1u and Am2u are simultaneously imaged by the imaging means 82, image analysis is performed to detect the positional difference in the X-axis direction and the Y-axis direction, and 2 )
- the imaging means 81 simultaneously images the alignment marks Am1d and Am2d, and analyzes the images to detect positional differences in the X-axis direction and the Y-axis direction, respectively.
- the average values of the positional differences detected in the above 1) and 2) in the X-axis direction and the Y-direction are calculated, respectively, and a midpoint Am1c between both alignment arcs Am1u, Am1d of the sheet-like substrate Sw;
- the relative displacement amounts ⁇ X and ⁇ Y at the midpoint Am2c between the alignment arcs Am2u and Am2d of the sheet-like mask material Sm are obtained.
- ⁇ z is calculated by calculating the difference between the above 1) and 2) in the X-axis direction of the positional difference and dividing it by the distance between the imaging means 81 and 82.
- the control means Cu calculates and commands the amount of change in the rotational speed of the motor DM2 (that is, the amount of acceleration or deceleration) based on the detected relative displacement amount ( ⁇ X), and instructs the sheet-like base material Sw.
- the position of the sheet-like mask material Sm in the X-axis direction is corrected.
- the amount of movement in the Y-axis direction of the Y- ⁇ z stage 5 is commanded based on the detected relative displacement amount ( ⁇ Y), for example, the displacement in the ⁇ z direction is performed. If so, based on the angle ( ⁇ z), a rotation amount is commanded around the Z axis of the Y- ⁇ z stage 5 to correct the position of the sheet-like mask material Sm with respect to the sheet-like substrate Sw.
- control means Cu analyzes the image of the gap in the Z-axis direction between the sheet-like base material Sw and the sheet-like mask material Sm imaged by the imaging means 83, and applies the sheet-like base material Sw to the sheet-like base material Sw.
- the relative displacement amount ( ⁇ Z) in the Z-axis direction of the sheet-like mask material Sm is detected. Then, based on the detected relative displacement amount ( ⁇ Z), the amount of movement of the linear actuator 6 in the vertical direction is commanded to set the gap (height position) between the sheet-like base material Sw and the sheet-like mask material Sm. to correct.
- the control means Cu for example, a part Sw1 of the sheet-like substrate Sw and the sheet at a predetermined cycle.
- the alignment arcs Am1 and Am2 are imaged with the portion Sm1 of the mask-shaped mask material Sm, at least one of the relative displacement amount ⁇ X, the relative displacement amount ⁇ Y and the angle ⁇ z, the sheet-like base material Sw and the sheet.
- the rollers 42a to 42d as the parallel running region forming unit and the driving unit that run on the sheet-like mask material Sm are installed on the single gantry 41 as a unit, and the sheet-like base member is formed as a unit.
- the traveling state of the sheet-like mask material Sm to which a certain tension is applied is determined. There is no change, and no forced distortion occurs in the sheet-like mask material Sm, and hence the mask pattern.
- the sheet has a precise pattern.
- a film can be formed on the substrate Sw.
- the gantry 41 is installed on the moving means 71 and 72, when the maintenance is performed after taking out from the vacuum processing chamber 1, the work can be easily performed.
- a plurality of rollers 42a to 42d may be installed on a single frame 41 to form a unit, and a plurality of sheet-shaped mask materials Sm may be set in advance.
- thermal expansion may occur due to radiant heat generated when the film forming material is evaporated by resistance heating on the resistance board 91.
- the sheet-like base material Sw is thermally expanded in the X-axis direction, the sheet-like base material Sw and the sheet-like mask material Sm are caused to travel by the same length (travel amount) per hour as described above. Even if the control is performed, the sheet-like base material Sw is delayed with respect to the sheet-like mask material Sm.
- the Y- ⁇ z stage 5 is configured to be movable in the X-axis direction to correct the relative displacement amount ⁇ X accompanying thermal expansion.
- the relative displacement amount ⁇ X can only be corrected within the range of the movement amount in the X-axis direction, and the sheet-like substrate Sw to be formed is very long, so the delay of the sheet-like substrate Sw is accumulated. As a result, the position of the sheet-shaped mask material Sn with respect to the sheet-shaped substrate Sw may not be corrected.
- the change amount (that is, the speed increase amount or the speed decrease amount) of the motor DM2 is calculated and commanded based on the detected relative displacement amount ( ⁇ X), and the same per unit time.
- the relative displacement amount ⁇ X is added to or subtracted from the travel amount when the sheet-like base material Sw and the sheet-like mask material Sm travel by the travel amount, the sheet-like base material generated by thermal expansion in the X-axis direction. Sw delay can also be corrected, and even when the sheet-like substrate Sw is very long, it can be corrected permanently. Further, even when the sheet-like base material Sw is thermally expanded in the Y-axis direction, the displacement amount ⁇ Y and the angle ⁇ z are calculated as described above, and thus the influence of the thermal expansion of the sheet-like base material Sw. Alignment can be performed to minimize the above.
- the present invention has been described above, but the present invention is not limited to the above.
- the example in which the mask material traveling means 4 to the carriage 72 are arranged in the vacuum processing chamber 1 has been described as an example.
- the volume of the film forming chamber 1a may be reduced.
- the sheet-shaped mask material Sm is wound around each of the rollers 42a to 42d in an endless manner.
- the present invention is not limited to this. It can also be configured to wind.
- the deposition using a resistance board is described as an example of the film forming unit.
- the film forming unit may be a predetermined thin film formed by a sputtering cathode or a CVD method. It is good also as a raw material gas supply means for forming.
- the downstream guide roller 23 is provided with a sensor 25 as a speed detection unit, and the feeding speed of the sheet-like base material Sw is set according to the detection value of the sensor 25 of the sheet-like mask material Sm.
- the feed rate of the sheet-like mask material Sm is detected, and the motor DM1 is detected according to the detected value.
- the feeding speed of the sheet-like base material Sw fed from the feeding roller 21 may be corrected.
- the position of the sheet-like mask material Sm with respect to the sheet-like base material Sw is corrected such that the number of rotations of the motor DM2 is increased or decreased so that the alignment marks Am1, Am2 overlap each other in the Z-axis direction. .
- a can roller Cr is provided on the upper side of the sheet-like base material Sw so as to face the box 92 in which the resistance board 91 is stored.
- a direct-acting actuator (not shown) is attached to the can roller Cr so that the can roller Cr can move up and down in the Z-axis direction.
- two presses are made at predetermined intervals in the X-axis direction on the upper side of the sheet-like base material Sw so as to face the box 92 in which the resistance board 91 is stored.
- Rollers R1 and R2 are provided.
- a linear motion actuator (not shown) is attached to each of the pressing rollers R1 and R2, and the rollers R1 and R2 can move up and down in the Z-axis direction in conjunction with each other.
- the Y- ⁇ z stage 5 when the portion Sw1 of the sheet-like base material Sw and the portion Sm1 of the sheet-like mask material Sm travel in parallel with a predetermined interval in the Z-axis direction, the Y- ⁇ z stage 5 is moved.
- tilting means 60 for tilting the portion Sm1 of the sheet-like mask material Sm traveling in parallel with respect to the portion Sw1 of the sheet-like base material Sw.
- the mask travel means 40 moves up and down in the Z-axis direction on the Y- ⁇ z stage 5 installed on the carriage 72.
- Three linear motion actuators 60 are provided at predetermined intervals, and operation rods 62 are connected to the linear motion actuators 60 via free (spherical) joints 61, respectively.
- a frame 64 that supports each of .about.42d is supported.
- each linear motion actuator 60, the joint 61 and the support rod 62 constitute the tilting means of this embodiment.
- a third detection means is provided on the side wall surface in the Y-axis direction that defines the film forming chamber 1a.
- the imaging means 83a to 83c such as a CCD camera are arranged at predetermined intervals in the X-axis direction.
- the sheet-like base material Sw and the sheet-like mask material Sm can be imaged at a plurality of locations in an area where the sheet-like base material Sw and the sheet-like mask material Sm are vertically positioned. It is like that.
- the control means Cu controls the sheet with respect to the sheet-like base material Sw from the interval in the Z-axis direction between the portion Sw1 of the sheet-like base material Sw detected by the imaging means 83a to 83c and the portion Sm1 of the sheet-like mask material Sm.
- the inclination of the sheet-like mask material Sm is detected, and based on the detected inclination, the amount of tilt of the sheet-like mask material Sm relative to the sheet-like base material Sw is commanded to the linear motion actuator 60 as the tilting means to correct the tilt. To do.
- the alignment marks Am1, Am2 are displaced in at least one direction of the X-axis direction and the Y-axis direction.
- the sheet-like mask material Sm travel speed and position are corrected for the sheet-like base material Sw in accordance with the above-described procedure.
- the images taken by the imaging means 81 and 82 are analyzed and the X axis is corrected as in the above embodiment.
- the inclination of the sheet-like mask material Sm with respect to the sheet-like base material Sw is detected from the interval in the direction, and the tilt amount of the sheet-like mask material Sm with respect to the sheet-like base material Sw is used as a tilting means based on the detected inclination.
- the linear motion actuator 60 is commanded to correct the tilt.
- the control unit Cu calculates a movement error in the X-axis direction and the Y-axis direction of the sheet-shaped mask material Sm relative to the sheet-shaped substrate Sw accompanying the tilt correction, and calculates the relative displacement amount ⁇ X and the Y-axis.
- the movement error is calculated for at least one of the relative displacement ⁇ Y and the angle ⁇ z in the direction.
- the amount of movement of the linear actuator 6 in the vertical direction is commanded, and the gap (high height) between the sheet-like substrate Sw and the sheet-like mask material Sm is determined. Position) is corrected.
- DM ... Film forming apparatus 1 ... Vacuum processing chamber, 21 ... Feeding roller (base material traveling means), 22, 23, 32 ... Guide roller (base material traveling means), 31 ... Winding roller (base material traveling means), DM1... Motor (base material traveling means) 4, 40... Mask traveling means, 41 .. frame, 42a, 42b... Roller (parallel region forming part of mask material traveling means), 42d. (Driving unit), 5 ... Y- ⁇ z stage, 6 ... linear motion actuator (driving means), 60 ... linear motion actuator (tilting means), 61 ... joint, 62 ... support rod, 71 ... cart (moving means), 81- 83 ... Imaging means (first to third detection means), 9 ... Film forming means, Sw ... Sheet-like substrate, Sw1 ... Sheet-like substrate portion, Sm ... Sheet-like mask material, Sm1 ... Part of sheet-like mask material.
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Abstract
Description
Claims (9)
- 真空処理室内に、シート状の基材を所定速度で走行する基材走行手段と、一方向に走行されるシート状の基材の部分に対して成膜材料を供給する成膜手段と、シート状の基材に対する成膜材料の供給範囲を制限するシート状のマスク材を走行するマスク材走行手段とを備え、
成膜手段からシート状の基材に向かう方向を上として、マスク材走行手段は、一方向に走行されるシート状の基材の部分に対してその下側に位置するシート状のマスク材の部分を平行に走行させる平行走行領域形成部と、シート状の基材に同期させてシート状のマスク材を走行させる駆動部とを有し、平行走行領域形成部と駆動部とが単一の架台に設置されることを特徴とする成膜装置。 - 前記シート状の基材または前記シート状のマスク材を走行する速度を検出する速度検出手段と、前記シート状の基材の部分が一方向に走行される方向をX軸方向とし、前記シート状の基材の部分とシート状のマスク材の部分とが上下に位置する領域にて、前記シート状の基材に対する前記シート状のマスク材のX軸方向の相対変位量を検出する第1の検出手段とを備え、
前記シート状の基材と前記シート状のマスク材のうちいずれか一方を、その他方の前記速度検出手段の検出値に一致させて両者を同期させ、第1の検出手段の検出値に応じて前記基材走行手段及び前記駆動部のいずれか一方を制御してシート状の基材に対するシート状のマスク材の位置を補正するように構成したことを特徴とする請求項1記載の成膜装置。 - 前記シート状の基材の部分が一方向に走行される方向をX軸方向、これに直交する方向をY軸方向、上下方向としてのZ軸回りの回転方向をθz方向とし、
前記架台はY-θzステージ上に設置され、
前記シート状の基材の部分とシート状のマスク材の部分とが上下に位置する領域にて、シート状の基材に対するシート状のマスク材のY軸方向の相対変位量またはシート状の基材の走行方向とシート状のマスク材の走行方向とのなす角度を検出する第2の検出手段を備え、第2の検出手段の検出値に応じて、Y-θzステージにより架台のY軸方向への移動及びθ方向への回転の少なくとも一方を行ってシート状の基材に対するシート状のマスク材の位置を補正するように構成したことを特徴とする請求項1または請求項2記載の成膜装置。 - 請求項3記載の成膜装置であって、マスク走行手段が、一方向に走行されるシート状の基材の部分に対して上下方向に所定間隔を持ってシート状のマスク材の部分を平行に走行するものにおいて、
前記Y-θzステージに、当該Y-θzステージを上下動する駆動手段を備え、前記シート状の基材の部分とシート状のマスク材の部分とが上下に位置する領域にて、シート状の基材とシート状のマスク材との上下方向の間隙を検出する第3の検出手段を備え、第3の検出手段の検出値に応じて駆動手段によりY-θzステージを上下動させてシート状の基材に対するシート状のマスク材の高さ位置を補正するように構成したことを特徴とする成膜装置。 - 前記成膜手段の上方領域にて、このシート状の基材の部分をシート状のマスク材の部分に向けて押圧し、シート状の基材とシート状のマスク材とを互いに接触させる押圧手段を更に備えることを特徴とする請求項1~3の何れか1項に記載の成膜装置。
- 前記マスク材走行手段を前記真空処理室内と真空処理室外との間でY軸方向に移動自在とする移動手段を備えることを特徴とする請求項2~5の何れか1項に記載の成膜装置。
- 請求項3~請求項6の何れか1項に記載の成膜装置を用いてシート状の基材に成膜する成膜方法であって、
シート状の基材とシート状のマスクとをX軸方向に所定間隔でアライメントマークが夫々列設されたもの、第1及び第2の両検出手段を夫々撮像手段として、
撮像手段でシート状の基材の部分とシート状のマスク材の部分とのアライメントアークを撮像し、この撮像した画像を解析して、シート状の基材に対するシート状のマスク材のX軸方向の相対変位量(△X)と、シート状の基材に対するシート状のマスク材のY軸方向の相対変位量(△Y)及びシート状の基材の走行方向とシート状のマスク材の走行方向とのなす角度(△θz)の少なくとも一方を夫々検出し、
検出した相対変位量(△X)に基づいて基材走行手段及び前記駆動部のいずれか一方に対してシート状の基材またはシート状のマスクの走行速度の変化量を指令し、これに同期させて、検出した相対変位量(△Y)及び角度(△θz)の少なくとも一方に基づいてY-θzステージに対して架台のY軸方向への移動及びθ方向への回転の少なくとも一方の移動量を指令してシート状の基材に対するシート状のマスク材の走行速度と位置とを補正することを特徴とする成膜方法。 - 請求項7記載の成膜方法であって、マスク走行手段が互いに平行に走行するシート状のマスク材の部分をシート状の基材に対して傾ける傾動手段を更に有するものにおいて、
第3の検出手段をX軸方向に所定間隔で複数列設されたものとし、
第3の検出手段で夫々検出したシート状の基材の部分とシート状のマスク材の部分とのZ軸方向の間隔からシート状の基材に対するシート状のマスク材の傾きを検出し、検出した傾きに基づいてシート状の基材に対するシート状のマスク材の傾動量を傾動手段に指令して上記傾きを補正し、傾きの補正後に上記走行速度と位置とを補正することを特徴とする成膜方法。 - 請求項7記載の成膜方法であって、マスク走行手段が互いに平行に走行するシート状のマスク材の部分をシート状の基材に対して傾ける傾動手段を更に有するものにおいて、
第3の検出手段をX軸方向に所定間隔で複数列設されたものとし、
上記撮像手段で撮像した画像を解析してX軸方向の相対変位量(△X)と、Y軸方向の相対変位量(△Y)及び角度(△θz)の少なくとも一方を夫々検出した後、第3の検出手段で夫々検出したシート状の基材の部分とシート状のマスク材の部分とのZ軸方向の間隔からシート状の基材に対するシート状のマスク材の傾きを検出し、この検出した傾きに基づいてシート状の基材に対するシート状のマスク材の傾動量を傾動手段に指令して上記傾きを補正すると共に、傾き補正に伴うシート状の基材に対するシート状のマスク材のX軸方向及びY軸方向の移動誤差を算出し、
相対変位量(△X)とY軸方向の相対変位量(△Y)及び角度(△θz)の少なくとも一方とに上記移動誤差を加えて、基材走行手段及び前記駆動部のいずれか一方に対してシート状の基材またはシート状のマスクの走行速度の変化量を指令し、これに同期させて、架台のY軸方向への移動及びθ方向への回転の少なくとも一方の移動量を指令してシート状の基材に対するシート状のマスク材の走行速度と位置とを補正することを特徴とする成膜方法。
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EP15768863.1A EP3124649A4 (en) | 2014-03-25 | 2015-03-10 | Film-formation device and film-formation method |
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JP2018031040A (ja) * | 2016-08-23 | 2018-03-01 | 住友金属鉱山株式会社 | ロールツーロール方式の表面処理装置並びにこれを用いた成膜方法及び成膜装置 |
JP2022057676A (ja) * | 2020-09-30 | 2022-04-11 | キヤノントッキ株式会社 | 成膜装置、調整方法及び電子デバイスの製造方法 |
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JP2018031066A (ja) * | 2016-08-26 | 2018-03-01 | 株式会社アルバック | マスク材走行ユニット |
JP2022057676A (ja) * | 2020-09-30 | 2022-04-11 | キヤノントッキ株式会社 | 成膜装置、調整方法及び電子デバイスの製造方法 |
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