HK1171820A1 - 基板處理裝置 - Google Patents

基板處理裝置

Info

Publication number
HK1171820A1
HK1171820A1 HK12112554.9A HK12112554A HK1171820A1 HK 1171820 A1 HK1171820 A1 HK 1171820A1 HK 12112554 A HK12112554 A HK 12112554A HK 1171820 A1 HK1171820 A1 HK 1171820A1
Authority
HK
Hong Kong
Prior art keywords
processing device
substrate processing
substrate
processing
Prior art date
Application number
HK12112554.9A
Other languages
English (en)
Inventor
鈴木智也
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1171820A1 publication Critical patent/HK1171820A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK12112554.9A 2010-02-12 2012-12-05 基板處理裝置 HK1171820A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30398610P 2010-02-12 2010-02-12
PCT/JP2011/052879 WO2011099563A1 (ja) 2010-02-12 2011-02-10 基板処理装置

Publications (1)

Publication Number Publication Date
HK1171820A1 true HK1171820A1 (zh) 2013-04-05

Family

ID=44367833

Family Applications (1)

Application Number Title Priority Date Filing Date
HK12112554.9A HK1171820A1 (zh) 2010-02-12 2012-12-05 基板處理裝置

Country Status (6)

Country Link
JP (1) JP5761034B2 (zh)
KR (2) KR101816327B1 (zh)
CN (1) CN102741754B (zh)
HK (1) HK1171820A1 (zh)
TW (2) TWI557840B (zh)
WO (1) WO2011099563A1 (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101787330B1 (ko) * 2012-04-13 2017-10-18 가부시키가이샤 니콘 카세트 장치, 기판 반송 장치, 기판 처리 장치 및 기판 처리 방법
TWI611996B (zh) * 2012-05-18 2018-01-21 尼康股份有限公司 基板處理裝置
CN102790002B (zh) * 2012-07-27 2015-02-11 京东方科技集团股份有限公司 柔性基板处理装置
CN105556391B (zh) * 2013-07-08 2018-06-29 株式会社尼康 基板处理装置、器件制造系统、器件制造方法及图案形成装置
JP6459234B2 (ja) * 2014-06-16 2019-01-30 株式会社ニコン 基板処理装置
JP6227757B2 (ja) * 2014-03-25 2017-11-08 株式会社アルバック 成膜装置及び成膜方法
TWI661280B (zh) * 2014-04-01 2019-06-01 日商尼康股份有限公司 Substrate processing method and substrate processing device
KR102387648B1 (ko) * 2014-04-01 2022-04-18 가부시키가이샤 니콘 노광 장치
CN108604063A (zh) * 2015-11-30 2018-09-28 株式会社尼康 曝光装置、曝光系统、基板处理方法、以及元件制造装置
JP6723831B2 (ja) * 2016-06-01 2020-07-15 株式会社オーク製作所 露光装置
JP7023620B2 (ja) * 2017-05-30 2022-02-22 株式会社オーク製作所 露光装置及び基板載置方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5198857A (en) * 1990-03-30 1993-03-30 Ushio Denski Kabushiki Kaisha Film exposure apparatus and method of exposure using the same
US5743931A (en) * 1995-08-14 1998-04-28 Libbey-Owens-Ford Co. Glass sheet conveying and bending apparatus
JP3201233B2 (ja) * 1995-10-20 2001-08-20 ウシオ電機株式会社 裏面にアライメント・マークが設けられたワークの投影露光方法
JP3336955B2 (ja) * 1998-05-26 2002-10-21 ウシオ電機株式会社 裏面アライメント機能を備えた露光装置
JP2001235877A (ja) * 1999-12-14 2001-08-31 Sony Chem Corp 露光方法
JP2006102991A (ja) * 2004-09-30 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2006106505A (ja) * 2004-10-07 2006-04-20 Fuji Photo Film Co Ltd 画像記録装置及び画像記録方法
JP2006235533A (ja) * 2005-02-28 2006-09-07 Nikon Corp 露光装置及びマイクロデバイスの製造方法
JP5157440B2 (ja) * 2005-03-18 2013-03-06 コニカミノルタホールディングス株式会社 有機ｅｌ素子の製造方法
JP2007067355A (ja) * 2005-09-02 2007-03-15 Sharp Corp 基板表面処理装置および基板表面処理方法
JP4224479B2 (ja) * 2005-09-07 2009-02-12 富士フイルム株式会社 パターン露光方法及び装置
JP5104107B2 (ja) * 2007-08-02 2012-12-19 ウシオ電機株式会社 帯状ワークの露光装置及び帯状ワークの露光装置におけるフォーカス調整方法
JP5117243B2 (ja) * 2008-03-27 2013-01-16 株式会社オーク製作所 露光装置
JP2010014939A (ja) * 2008-07-03 2010-01-21 Nikon Corp 回路素子の製造装置及び製造方法

Also Published As

Publication number Publication date
CN102741754B (zh) 2015-12-02
JPWO2011099563A1 (ja) 2013-06-17
WO2011099563A1 (ja) 2011-08-18
TW201207980A (en) 2012-02-16
TWI557840B (zh) 2016-11-11
KR20120138751A (ko) 2012-12-26
CN102741754A (zh) 2012-10-17
TW201535576A (zh) 2015-09-16
KR101948467B1 (ko) 2019-02-14
KR20180004833A (ko) 2018-01-12
KR101816327B1 (ko) 2018-01-08
TWI492326B (zh) 2015-07-11
JP5761034B2 (ja) 2015-08-12

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20200209