KR101799598B1 - 쿨런트 회수 방법 - Google Patents
쿨런트 회수 방법 Download PDFInfo
- Publication number
- KR101799598B1 KR101799598B1 KR1020110058125A KR20110058125A KR101799598B1 KR 101799598 B1 KR101799598 B1 KR 101799598B1 KR 1020110058125 A KR1020110058125 A KR 1020110058125A KR 20110058125 A KR20110058125 A KR 20110058125A KR 101799598 B1 KR101799598 B1 KR 101799598B1
- Authority
- KR
- South Korea
- Prior art keywords
- coolant
- filtration
- thickener
- ingot
- ceramic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000002826 coolant Substances 0.000 title claims abstract description 79
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000001914 filtration Methods 0.000 claims abstract description 38
- 239000000919 ceramic Substances 0.000 claims abstract description 31
- 239000002562 thickening agent Substances 0.000 claims abstract description 20
- 238000011001 backwashing Methods 0.000 claims abstract description 14
- 238000005520 cutting process Methods 0.000 claims abstract description 10
- 238000011084 recovery Methods 0.000 claims description 11
- 238000009295 crossflow filtration Methods 0.000 claims description 8
- 230000007423 decrease Effects 0.000 claims description 5
- 238000009826 distribution Methods 0.000 claims description 4
- 239000002245 particle Substances 0.000 claims description 4
- 239000012528 membrane Substances 0.000 abstract description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 20
- 239000011148 porous material Substances 0.000 abstract description 11
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 239000006061 abrasive grain Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000000126 substance Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000000110 cooling liquid Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000012466 permeate Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000005352 clarification Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010144448A JP5640260B2 (ja) | 2010-06-25 | 2010-06-25 | クーラント回収方法 |
JPJP-P-2010-144448 | 2010-06-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120000502A KR20120000502A (ko) | 2012-01-02 |
KR101799598B1 true KR101799598B1 (ko) | 2017-11-20 |
Family
ID=45355551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110058125A Active KR101799598B1 (ko) | 2010-06-25 | 2011-06-15 | 쿨런트 회수 방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5640260B2 (enrdf_load_stackoverflow) |
KR (1) | KR101799598B1 (enrdf_load_stackoverflow) |
CN (1) | CN102294758B (enrdf_load_stackoverflow) |
TW (1) | TWI501838B (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013248707A (ja) * | 2012-05-31 | 2013-12-12 | Panasonic Corp | クーラント廃液の再生方法、クーラント廃液の処理方法、クーラント廃液の処理システム、及び再生クーラント液の製造方法 |
JP6331474B2 (ja) * | 2014-02-28 | 2018-05-30 | ブラザー工業株式会社 | 工作機械の洗浄液濾過装置 |
CN105174522B (zh) * | 2015-10-09 | 2017-11-17 | 浙江瑞翌新材料科技股份有限公司 | 一种金刚线切割废冷却液的回收方法及系统 |
CN117774150A (zh) * | 2022-09-22 | 2024-03-29 | 内蒙古中环光伏材料有限公司 | 一种去除硅单晶金刚线切片用冷却液中硅粉的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100441648B1 (ko) * | 1996-02-21 | 2004-10-06 | 미마스 한도타이 고교 가부시키가이샤 | 수용성슬러리폐액의재이용시스템 |
WO2010071873A2 (en) * | 2008-12-20 | 2010-06-24 | Cabot Microelectronics Corporation | Wiresaw cutting method |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5664990A (en) * | 1996-07-29 | 1997-09-09 | Integrated Process Equipment Corp. | Slurry recycling in CMP apparatus |
JP3816200B2 (ja) * | 1997-07-18 | 2006-08-30 | 東芝セラミックス株式会社 | 微細粒子を含む液体の処理方法および処理装置 |
JP3389141B2 (ja) * | 1999-04-26 | 2003-03-24 | 株式会社スーパーシリコン研究所 | スライシング用スラリーの評価方法及びスラリー |
JP3314921B2 (ja) * | 1999-06-08 | 2002-08-19 | 三菱住友シリコン株式会社 | 半導体材料の切断・加工方法 |
JP4369054B2 (ja) * | 1999-07-01 | 2009-11-18 | エムイーエムシー・エレクトロニック・マテリアルズ・ソシエタ・ペル・アチオニ | 使用済グリコール系スラリーの分離、再生および再使用法 |
JP4609675B2 (ja) * | 2007-08-16 | 2011-01-12 | オルガノ株式会社 | メタル研磨cmp工程排水処理装置及び方法 |
JP5173945B2 (ja) * | 2008-07-02 | 2013-04-03 | シャープ株式会社 | クーラント再生方法およびスラリー再生方法 |
-
2010
- 2010-06-25 JP JP2010144448A patent/JP5640260B2/ja active Active
-
2011
- 2011-06-14 TW TW100120660A patent/TWI501838B/zh active
- 2011-06-15 KR KR1020110058125A patent/KR101799598B1/ko active Active
- 2011-06-23 CN CN201110172424.2A patent/CN102294758B/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100441648B1 (ko) * | 1996-02-21 | 2004-10-06 | 미마스 한도타이 고교 가부시키가이샤 | 수용성슬러리폐액의재이용시스템 |
WO2010071873A2 (en) * | 2008-12-20 | 2010-06-24 | Cabot Microelectronics Corporation | Wiresaw cutting method |
Also Published As
Publication number | Publication date |
---|---|
CN102294758A (zh) | 2011-12-28 |
JP5640260B2 (ja) | 2014-12-17 |
JP2012006115A (ja) | 2012-01-12 |
TWI501838B (zh) | 2015-10-01 |
KR20120000502A (ko) | 2012-01-02 |
TW201208814A (en) | 2012-03-01 |
CN102294758B (zh) | 2015-08-05 |
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