KR101776790B1 - 코팅 방법 및 코팅 장치 - Google Patents

코팅 방법 및 코팅 장치 Download PDF

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Publication number
KR101776790B1
KR101776790B1 KR1020127009073A KR20127009073A KR101776790B1 KR 101776790 B1 KR101776790 B1 KR 101776790B1 KR 1020127009073 A KR1020127009073 A KR 1020127009073A KR 20127009073 A KR20127009073 A KR 20127009073A KR 101776790 B1 KR101776790 B1 KR 101776790B1
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KR
South Korea
Prior art keywords
chamber
flexible substrate
organic layer
facility
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020127009073A
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English (en)
Korean (ko)
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KR20120101344A (ko
Inventor
애드워드 윌렘 알버트 영
에릭 디켐페니르
몰 안토니우스 마리아 버나두스 반
허버트 리프카
드 웨이저 피터 반
버나드 세일러
에밀리에 가랜드
리차드 프란츠
디미테르 루보미로브 코트제브
모하메드 조우바이어 체르카오우이
Original Assignee
네덜란제 오르가니자티에 포오르 토에게파스트-나투우르베텐샤펠리즈크 온데르조에크 테엔오
훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Application filed by 네덜란제 오르가니자티에 포오르 토에게파스트-나투우르베텐샤펠리즈크 온데르조에크 테엔오, 훈츠만 어드밴스트 머티리얼스(스위처랜드) 게엠베하 filed Critical 네덜란제 오르가니자티에 포오르 토에게파스트-나투우르베텐샤펠리즈크 온데르조에크 테엔오
Publication of KR20120101344A publication Critical patent/KR20120101344A/ko
Application granted granted Critical
Publication of KR101776790B1 publication Critical patent/KR101776790B1/ko
Expired - Fee Related legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
    • B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/06—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying two different liquids or other fluent materials, or the same liquid or other fluent material twice, to the same side of the work
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating Apparatus (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Wiring (AREA)
KR1020127009073A 2009-09-07 2010-09-06 코팅 방법 및 코팅 장치 Expired - Fee Related KR101776790B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP09169668A EP2292339A1 (en) 2009-09-07 2009-09-07 Coating method and coating apparatus
EP09169668.2 2009-09-07
PCT/NL2010/050560 WO2011028119A1 (en) 2009-09-07 2010-09-06 Coating method and coating apparatus

Publications (2)

Publication Number Publication Date
KR20120101344A KR20120101344A (ko) 2012-09-13
KR101776790B1 true KR101776790B1 (ko) 2017-09-19

Family

ID=41531217

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020127009073A Expired - Fee Related KR101776790B1 (ko) 2009-09-07 2010-09-06 코팅 방법 및 코팅 장치

Country Status (10)

Country Link
US (1) US9539615B2 (enExample)
EP (2) EP2292339A1 (enExample)
JP (1) JP5623531B2 (enExample)
KR (1) KR101776790B1 (enExample)
CN (1) CN102574156B (enExample)
CA (1) CA2773520A1 (enExample)
IN (1) IN2012DN01946A (enExample)
RU (1) RU2012113315A (enExample)
TW (1) TWI555583B (enExample)
WO (1) WO2011028119A1 (enExample)

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US9777365B2 (en) 2011-11-29 2017-10-03 Itn Energy Systems, Inc. Multi-zone modular coater
EP2626144A1 (en) 2012-02-07 2013-08-14 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Roll to roll manufacturing system having a clean room deposition zone and a separate processing zone
JP6055295B2 (ja) * 2012-11-29 2016-12-27 東レエンジニアリング株式会社 両面薄膜形成装置
CN103878093A (zh) * 2012-12-24 2014-06-25 鸿富锦精密工业（深圳）有限公司 胶带的制造方法及其采用的设备
EP3034182A1 (en) 2014-12-17 2016-06-22 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Coating system and coating method
FR3035122B1 (fr) * 2015-04-20 2017-04-28 Coating Plasma Ind Procede de traitement de surface d'un film en mouvement et installation pour la mise en oeuvre de ce procede
US10099250B2 (en) * 2015-06-17 2018-10-16 The Boeing Company Light-curable material applicator and associated methods
CN107265152B (zh) * 2017-06-09 2019-08-16 浙江汇锋薄膜科技有限公司 一种导电薄膜的制备设备上的放料张紧装置
EP3479908A1 (en) * 2017-11-03 2019-05-08 A & R Carton OY Method of and coating application unit for applying a coating on a web of material
KR101863260B1 (ko) * 2018-01-17 2018-06-04 차천용 친환경 점착제 도포장치
KR101863259B1 (ko) * 2018-01-17 2018-06-04 차천용 점착제 도포장치
US20240189861A1 (en) 2021-05-06 2024-06-13 Basf Coatings Gmbh Multilayer barrier film, its manufacture and use in photovoltaic applications
PL246621B1 (pl) * 2021-07-22 2025-02-17 Siec Badawcza Lukasiewicz Instytut Tech Eksploatacji W Radomiu System przewijania materiału ciągłego (taśma, drut)
WO2024126566A1 (en) 2022-12-14 2024-06-20 Basf Coatings Gmbh Multilayer barrier film coated polymeric substrate, its manufacture and use in electronic devices

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JP2002264274A (ja) 2001-03-13 2002-09-18 Toppan Printing Co Ltd 透明ガスバリア性積層フィルム
JP2009179855A (ja) * 2008-01-31 2009-08-13 Fujifilm Corp 機能性フィルムの製造方法
JP2009270145A (ja) 2008-05-02 2009-11-19 Fujifilm Corp 成膜装置
JP5901176B2 (ja) * 2011-08-17 2016-04-06 株式会社ペガソス・エレクトラ 分離装置及び分離システム

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JP2002264274A (ja) 2001-03-13 2002-09-18 Toppan Printing Co Ltd 透明ガスバリア性積層フィルム
JP2009179855A (ja) * 2008-01-31 2009-08-13 Fujifilm Corp 機能性フィルムの製造方法
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JP5901176B2 (ja) * 2011-08-17 2016-04-06 株式会社ペガソス・エレクトラ 分離装置及び分離システム

Also Published As

Publication number Publication date
KR20120101344A (ko) 2012-09-13
CN102574156A (zh) 2012-07-11
US9539615B2 (en) 2017-01-10
IN2012DN01946A (enExample) 2015-08-21
TWI555583B (zh) 2016-11-01
JP5623531B2 (ja) 2014-11-12
CN102574156B (zh) 2014-10-01
EP2292339A1 (en) 2011-03-09
TW201113098A (en) 2011-04-16
US20120276299A1 (en) 2012-11-01
JP2013503972A (ja) 2013-02-04
WO2011028119A1 (en) 2011-03-10
CA2773520A1 (en) 2011-03-10
EP2475467A1 (en) 2012-07-18
RU2012113315A (ru) 2013-10-20

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