JP4968947B2 - 光学フィルムの製造方法 - Google Patents
光学フィルムの製造方法 Download PDFInfo
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B13/00—Machines and apparatus for drying fabrics, fibres, yarns, or other materials in long lengths, with progressive movement
- F26B13/10—Arrangements for feeding, heating or supporting materials; Controlling movement, tension or position of materials
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/10—Temperature; Pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B21/00—Arrangements or duct systems, e.g. in combination with pallet boxes, for supplying and controlling air or gases for drying solid materials or objects
- F26B21/06—Controlling, e.g. regulating, parameters of gas supply
- F26B21/12—Velocity of flow; Quantity of flow, e.g. by varying fan speed, by modifying cross flow area
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Textile Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polarising Elements (AREA)
- Drying Of Solid Materials (AREA)
- Coating Apparatus (AREA)
Description
また、本発明は前記目的を達成するために、連続搬送される帯状のベースフィルム上に、硬化性塗布液を塗布し、乾燥ゾーンで塗布層を加熱風で乾燥させた後、硬化ゾーンで該塗布層を硬化させる光学フィルムの製造方法において、前記乾燥ゾーンと前記硬化ゾーンとの間に仕切を介して中間ゾーンを設けるとともに、該中間ゾーンの温度を前記乾燥ゾーンの温度と前記硬化ゾーンの温度の何れよりも低くなるように制御し、前記中間ゾーンの内圧が前記乾燥ゾーンの内圧より低く、且つ、前記中間ゾーンの内圧が前記硬化ゾーンの内圧より低く制御し、前記中間ゾーンにおける気化した低分子量化合物の雰囲気濃度を1ppb以下に制御することを特徴とする光学フィルムの製造方法を提供する。
内圧差ΔP21(即ち、P2−P1)が、0〔Pa〕>ΔP21>−10〔Pa〕の関係を満たすように制御するとともに、内圧差ΔP32が5〔Pa〕以下であるように制御することで、中間ゾーンで気化しきれなかった低分子量化合物が硬化ゾーンで気化したとしても、気化した低分子量化合物を含む風が中間ゾーンに流れて除かれる。また、中間ゾーンで除き切れなかった気化した低分子量化合物を含む風が乾燥ゾーンに流れ込んでも、乾燥ゾーンは雰囲気温度が一番高いので結露することがない。これにより、低分子量化合物が気化した低分子量化合物の結露物でベースフィルム裏面及び塗布膜面が汚染されることを確実に防止できる。
Claims (3)
- 連続搬送される帯状のベースフィルム上に、硬化性塗布液を塗布し、乾燥ゾーンで塗布層を加熱風で乾燥させた後、硬化ゾーンで該塗布層を硬化させる光学フィルムの製造方法において、
前記乾燥ゾーンと前記硬化ゾーンとの間に仕切を介して中間ゾーンを設けるとともに、
該中間ゾーンの温度を前記乾燥ゾーンの温度と前記硬化ゾーンの温度の何れよりも低くなるように制御し、
前記中間ゾーンの内圧が前記乾燥ゾーンの内圧より低く、且つ、前記中間ゾーンの内圧が前記硬化ゾーンの内圧より低く制御し、
前記中間ゾーンに新鮮風を供給することを特徴とする光学フィルムの製造方法。 - 連続搬送される帯状のベースフィルム上に、硬化性塗布液を塗布し、乾燥ゾーンで塗布層を加熱風で乾燥させた後、硬化ゾーンで該塗布層を硬化させる光学フィルムの製造方法において、
前記乾燥ゾーンと前記硬化ゾーンとの間に仕切を介して中間ゾーンを設けるとともに、
該中間ゾーンの温度を前記乾燥ゾーンの温度と前記硬化ゾーンの温度の何れよりも低くなるように制御し、
前記中間ゾーンの内圧が前記乾燥ゾーンの内圧より低く、且つ、前記中間ゾーンの内圧が前記硬化ゾーンの内圧より低く制御し、
前記中間ゾーンにおける気化した低分子量化合物の雰囲気濃度を1ppb以下に制御することを特徴とする光学フィルムの製造方法。 - 前記乾燥ゾーンの内圧をP1、前記中間ゾーンの内圧をP2、前記硬化ゾーンの内圧をP3で表したとき、P2とP1の内圧差ΔP21が、0〔Pa〕>ΔP21>−10〔Pa〕の関係を満たすように制御するとともに、P3とP2の内圧差ΔP32が5〔Pa〕以下であるように制御することを特徴とする請求項1又は2に記載の光学フィルムの製造方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008049872A JP4968947B2 (ja) | 2008-02-29 | 2008-02-29 | 光学フィルムの製造方法 |
KR1020090015166A KR101562575B1 (ko) | 2008-02-29 | 2009-02-24 | 광학 필름의 제조 방법 및 광학 필름 |
CN2009100083639A CN101520576B (zh) | 2008-02-29 | 2009-02-26 | 光学薄膜的制造方法及光学薄膜 |
TW098106114A TWI453110B (zh) | 2008-02-29 | 2009-02-26 | 光學薄膜之製法及光學薄膜 |
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JP2008049872A JP4968947B2 (ja) | 2008-02-29 | 2008-02-29 | 光学フィルムの製造方法 |
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JP2009205092A JP2009205092A (ja) | 2009-09-10 |
JP4968947B2 true JP4968947B2 (ja) | 2012-07-04 |
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JP2008049872A Active JP4968947B2 (ja) | 2008-02-29 | 2008-02-29 | 光学フィルムの製造方法 |
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JP (1) | JP4968947B2 (ja) |
KR (1) | KR101562575B1 (ja) |
CN (1) | CN101520576B (ja) |
TW (1) | TWI453110B (ja) |
Families Citing this family (5)
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---|---|---|---|---|
EP2292339A1 (en) | 2009-09-07 | 2011-03-09 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Coating method and coating apparatus |
JP5457811B2 (ja) * | 2009-12-07 | 2014-04-02 | 富士フイルム株式会社 | 光学フィルムの製造方法 |
CN103143481A (zh) * | 2013-03-21 | 2013-06-12 | 无锡中易薄膜科技有限公司 | 新型安全环保涂布设备 |
CN103645587A (zh) * | 2013-12-13 | 2014-03-19 | 合肥京东方光电科技有限公司 | 取向膜涂覆装置和方法 |
JP7453842B2 (ja) | 2020-04-23 | 2024-03-21 | 株式会社トッパンTomoegawaオプティカルフィルム | 塗布膜の乾燥装置及び乾燥方法 |
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JP2000199683A (ja) * | 1998-12-28 | 2000-07-18 | Optrex Corp | 基板乾燥装置 |
JP2003145563A (ja) * | 2001-11-16 | 2003-05-20 | Fuji Photo Film Co Ltd | セルロースアシレートフィルム及びそれを用いた偏光板 |
US6582775B1 (en) * | 2002-07-12 | 2003-06-24 | Eastman Kodak Company | Process for making an optical compensator film comprising photo-aligned orientation layer |
WO2006013911A1 (en) * | 2004-08-04 | 2006-02-09 | Fujifilm Corporation | Method for manufacturing an optical film, apparatus for manufacturing the same, optical film, polarizing plate and image display device |
JP2006184646A (ja) * | 2004-12-28 | 2006-07-13 | Fuji Photo Film Co Ltd | 光学補償シート、その製造方法、およびそれを用いた液晶表示装置 |
JP2006281189A (ja) * | 2005-04-04 | 2006-10-19 | Mikuni Denshi Kk | インクジェット塗布溶液と乾燥方法 |
US20100152340A1 (en) * | 2005-09-28 | 2010-06-17 | Kazuhide Kanemura | Method and apparatus for producing polymer film, polymer film, polarizing plate and liquid crystal display |
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KR101562575B1 (ko) | 2015-10-22 |
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KR20090093828A (ko) | 2009-09-02 |
TW200938354A (en) | 2009-09-16 |
TWI453110B (zh) | 2014-09-21 |
CN101520576A (zh) | 2009-09-02 |
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