KR101774225B1 - 트리알릴 이소시아누레이트의 저장방법 - Google Patents

트리알릴 이소시아누레이트의 저장방법 Download PDF

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Publication number
KR101774225B1
KR101774225B1 KR1020117025332A KR20117025332A KR101774225B1 KR 101774225 B1 KR101774225 B1 KR 101774225B1 KR 1020117025332 A KR1020117025332 A KR 1020117025332A KR 20117025332 A KR20117025332 A KR 20117025332A KR 101774225 B1 KR101774225 B1 KR 101774225B1
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South Korea
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taic
triallyl isocyanurate
ppm
formula
organic chlorine
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Korean (ko)
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KR20120026042A (ko
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마부코 야마우라
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니폰 가세이 가부시키가이샤
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Application filed by 니폰 가세이 가부시키가이샤 filed Critical 니폰 가세이 가부시키가이샤
Publication of KR20120026042A publication Critical patent/KR20120026042A/ko
Application granted granted Critical
Publication of KR101774225B1 publication Critical patent/KR101774225B1/ko
Assigned to 미쯔비시 케미컬 주식회사 reassignment 미쯔비시 케미컬 주식회사 권리의 전부이전등록 Assignors: 니폰 가세이 가부시키가이샤
Assigned to 가부시키가이샤 신료 reassignment 가부시키가이샤 신료 권리의 전부이전등록 Assignors: 미쯔비시 케미컬 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/26—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with only hetero atoms directly attached to ring carbon atoms
    • C07D251/30—Only oxygen atoms
    • C07D251/34—Cyanuric or isocyanuric esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F26/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F26/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C08K5/34928—Salts
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
    • C09K5/20—Antifreeze additives therefor, e.g. for radiator liquids

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Combustion & Propulsion (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020117025332A 2009-05-25 2010-05-20 트리알릴 이소시아누레이트의 저장방법 Active KR101774225B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009125335 2009-05-25
JPJP-P-2009-125335 2009-05-25
PCT/JP2010/058567 WO2010137519A1 (ja) 2009-05-25 2010-05-20 トリアリルイソシアヌレートの貯蔵方法

Publications (2)

Publication Number Publication Date
KR20120026042A KR20120026042A (ko) 2012-03-16
KR101774225B1 true KR101774225B1 (ko) 2017-09-04

Family

ID=43222629

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117025332A Active KR101774225B1 (ko) 2009-05-25 2010-05-20 트리알릴 이소시아누레이트의 저장방법

Country Status (7)

Country Link
US (1) US8691984B2 (https=)
EP (1) EP2436701B2 (https=)
JP (2) JP5793831B2 (https=)
KR (1) KR101774225B1 (https=)
CN (1) CN102449001B (https=)
TW (1) TWI478963B (https=)
WO (1) WO2010137519A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2436677B1 (en) * 2009-05-25 2025-02-12 Shinryo Corporation Process for producing triallyl isocyanurate, process for producing cured sealing for electronic materials, semiconductors and solar cell materials, and process for producing cured coating material for coating electric wires
WO2010137519A1 (ja) * 2009-05-25 2010-12-02 日本化成株式会社 トリアリルイソシアヌレートの貯蔵方法
CN102491951B (zh) * 2011-12-02 2014-04-09 自贡天龙化工有限公司 三聚氰酸三烯丙酯的生产工艺
CN102887868B (zh) * 2012-09-18 2014-12-31 江苏科利新材料有限公司 一种三烯丙基异氰尿酸酯的制备方法
KR102126788B1 (ko) * 2012-10-25 2020-06-25 닛산 가가쿠 가부시키가이샤 에폭시 화합물의 제조방법
EP3034568A1 (de) 2014-12-19 2016-06-22 Evonik Degussa GmbH Covernetzersysteme für Verkapselungsfolien umfassend Triallylisocyanurat und Triallylcyanurat
ES2632783T3 (es) 2014-12-19 2017-09-15 Evonik Degussa Gmbh Sistemas de redes de cubierta para láminas de encapsulación que comprenden compuestos de bis-(alquenilamidas)
EP3034530A1 (de) 2014-12-19 2016-06-22 Evonik Degussa GmbH Covernetzersysteme für Verkapselungsfolien umfassend Diene
ES2639818T3 (es) 2014-12-19 2017-10-30 Evonik Degussa Gmbh Sistemas de agentes de reticulación conjunta para películas de encapsulación que comprenden compuestos de di(met)acrilato de etilenglicol
ES2633243T3 (es) 2014-12-19 2017-09-20 Evonik Degussa Gmbh Sistemas de agentes de reticulación conjunta para películas de encapsulación que comprenden compuestos de (met)acrilamida
EP3034526B1 (de) 2014-12-19 2017-06-14 Evonik Degussa GmbH Covernetzersysteme für Verkapselungsfolien
EP3034531A1 (de) 2014-12-19 2016-06-22 Evonik Degussa GmbH Dispersion zum einfachen Einsatz in der Herstellung von Verkapselungsfolien
EP3034525A1 (de) 2014-12-19 2016-06-22 Evonik Degussa GmbH Covernetzersysteme für Verkapselungsfolien umfassend Pentaerythritolverbindungen
ES2635260T3 (es) 2014-12-19 2017-10-03 Evonik Degussa Gmbh Sistemas correticulantes para láminas de encapsulado que comprenden compuestos de urea
EP3645617A4 (en) 2017-06-29 2021-02-17 Dow Global Technologies Llc COMPOSITION OF POLYOLEFIN
EP3649179B1 (de) * 2017-07-03 2021-08-11 Covestro Intellectual Property GmbH & Co. KG Produktionsanlage zur herstellung eines chemischen produkts durch umsetzung h-funktioneller reaktanten mit phosgen und verfahren zum betreiben derselben
CN112352013A (zh) 2018-02-01 2021-02-09 陶氏环球技术有限责任公司 具有半结晶聚烯烃载体树脂的母料
JP7303200B2 (ja) 2018-02-01 2023-07-04 ダウ グローバル テクノロジーズ エルエルシー 半結晶性ポリオレフィンキャリア樹脂を有するマスターバッチ
CN111848532A (zh) * 2020-07-23 2020-10-30 山东海益化工科技有限公司 三烯丙基异三聚氰酸酯生产工艺

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006036876A (ja) * 2004-07-26 2006-02-09 Du Pont Mitsui Polychem Co Ltd 太陽電池封止材及びそれを用いた太陽電池モジュール
JP2006299147A (ja) 2005-04-22 2006-11-02 Asahi Kasei Chemicals Corp 架橋剤
JP2007115840A (ja) * 2005-10-19 2007-05-10 Kyocera Corp 配線基板および配線基板の製造方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2537816A (en) * 1951-01-09 Method-of preparing tjnsaturated
US3322761A (en) * 1965-07-14 1967-05-30 Allied Chem Purification of triallyl isocyanurate
JPS4722588B1 (https=) * 1970-03-02 1972-06-24
JPS4826022B1 (https=) * 1970-05-03 1973-08-03
JPS4826022A (https=) 1971-08-04 1973-04-05
JPS5835514B2 (ja) * 1977-09-12 1983-08-03 日本化成株式会社 イソシアヌル酸トリアルリルの製造方法
JPH07119366B2 (ja) † 1989-07-03 1995-12-20 東芝シリコーン株式会社 接着性シリコーン組成物
JP3613475B2 (ja) * 1993-10-08 2005-01-26 Ｈｏｙａ株式会社 ガラス製品の製造方法
JPH10223249A (ja) * 1997-02-03 1998-08-21 Toyota Motor Corp 燃料電池装置および燃料電池装置の流路凍結防止方法
JPH11255753A (ja) * 1998-03-10 1999-09-21 Nissei Kagaku Kogyo Kk 高品位トリアリルイソシアヌレートとその製造方法
JP2000234037A (ja) * 1998-12-17 2000-08-29 Yokohama Rubber Co Ltd:The ゴム用配合剤およびゴム組成物
JP4388271B2 (ja) * 2002-11-20 2009-12-24 内山工業株式会社 フッ素ゴム用加硫接着剤組成物
CN101197408B (zh) * 2003-02-25 2010-12-08 株式会社钟化 遮光用树脂及形成方法、发光二极管用管壳及半导体装置
TW200502372A (en) * 2003-02-25 2005-01-16 Kaneka Corp Curing composition and method for preparing same, light-shielding paste, light-shielding resin and method for producing same, package for light-emitting diode, and semiconductor device
TW200603738A (en) * 2004-06-17 2006-02-01 Basf Ag Use of (e)-5-(4-chlorobenzylidene)-2,2-dimethyl-1-(1h-1,2,4-triazol-1-ylmethyl)cyclopentanol for controlling rust disease on soybean plants
JP2007011584A (ja) * 2005-06-29 2007-01-18 Fujifilm Holdings Corp マルチメディアデータ処理装置、マルチメディアデータ処理方法及びマルチメディアデータ処理プログラム
DE102006032167B4 (de) * 2006-07-12 2014-11-27 Evonik Degussa Gmbh Verfahren zur Herstellung von Triallylisocyanurat (TAIC)
JP5130728B2 (ja) * 2007-01-31 2013-01-30 Ｄｉｃ株式会社 エポキシ樹脂の精製方法
EP2436677B1 (en) * 2009-05-25 2025-02-12 Shinryo Corporation Process for producing triallyl isocyanurate, process for producing cured sealing for electronic materials, semiconductors and solar cell materials, and process for producing cured coating material for coating electric wires
JP5509674B2 (ja) * 2009-05-25 2014-06-04 日本化成株式会社 トリアリルイソシアヌレート及びその製造方法
WO2010137519A1 (ja) * 2009-05-25 2010-12-02 日本化成株式会社 トリアリルイソシアヌレートの貯蔵方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006036876A (ja) * 2004-07-26 2006-02-09 Du Pont Mitsui Polychem Co Ltd 太陽電池封止材及びそれを用いた太陽電池モジュール
JP2006299147A (ja) 2005-04-22 2006-11-02 Asahi Kasei Chemicals Corp 架橋剤
JP2007115840A (ja) * 2005-10-19 2007-05-10 Kyocera Corp 配線基板および配線基板の製造方法

Also Published As

Publication number Publication date
JP5971288B2 (ja) 2016-08-17
JP2014221917A (ja) 2014-11-27
EP2436701A1 (en) 2012-04-04
TW201109372A (en) 2011-03-16
JP5793831B2 (ja) 2015-10-14
EP2436701B1 (en) 2013-08-07
KR20120026042A (ko) 2012-03-16
US8691984B2 (en) 2014-04-08
US20120095225A1 (en) 2012-04-19
WO2010137519A1 (ja) 2010-12-02
TWI478963B (zh) 2015-04-01
EP2436701A4 (en) 2012-11-21
CN102449001A (zh) 2012-05-09
EP2436701B2 (en) 2021-12-22
CN102449001B (zh) 2014-04-23
JP2011006390A (ja) 2011-01-13

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