KR101763859B1 - 노광 장치와 그 조립 방법, 및 디바이스 제조 방법 - Google Patents

노광 장치와 그 조립 방법, 및 디바이스 제조 방법 Download PDF

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Publication number
KR101763859B1
KR101763859B1 KR1020117010936A KR20117010936A KR101763859B1 KR 101763859 B1 KR101763859 B1 KR 101763859B1 KR 1020117010936 A KR1020117010936 A KR 1020117010936A KR 20117010936 A KR20117010936 A KR 20117010936A KR 101763859 B1 KR101763859 B1 KR 101763859B1
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KR
South Korea
Prior art keywords
frame
unit
units
exposure apparatus
chamber
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KR1020117010936A
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English (en)
Korean (ko)
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KR20110069175A (ko
Inventor
다카유키 기쿠치
유야 가와이
도모히로 구와하라
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가부시키가이샤 니콘
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Publication of KR20110069175A publication Critical patent/KR20110069175A/ko
Application granted granted Critical
Publication of KR101763859B1 publication Critical patent/KR101763859B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
KR1020117010936A 2008-10-15 2009-10-15 노광 장치와 그 조립 방법, 및 디바이스 제조 방법 KR101763859B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2008-266117 2008-10-15
JP2008266117 2008-10-15
PCT/JP2009/005385 WO2010044268A1 (ja) 2008-10-15 2009-10-15 露光装置及びその組立て方法、並びにデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177021003A Division KR101904685B1 (ko) 2008-10-15 2009-10-15 노광 장치와 그 조립 방법, 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20110069175A KR20110069175A (ko) 2011-06-22
KR101763859B1 true KR101763859B1 (ko) 2017-08-01

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ID=42106438

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020117010936A KR101763859B1 (ko) 2008-10-15 2009-10-15 노광 장치와 그 조립 방법, 및 디바이스 제조 방법
KR1020177021003A KR101904685B1 (ko) 2008-10-15 2009-10-15 노광 장치와 그 조립 방법, 및 디바이스 제조 방법

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020177021003A KR101904685B1 (ko) 2008-10-15 2009-10-15 노광 장치와 그 조립 방법, 및 디바이스 제조 방법

Country Status (5)

Country Link
JP (3) JPWO2010044268A1 (zh)
KR (2) KR101763859B1 (zh)
CN (1) CN102187280B (zh)
TW (1) TWI480706B (zh)
WO (1) WO2010044268A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102636961B (zh) * 2011-02-12 2014-08-20 上海微电子装备有限公司 旋转光刻机
JP5863149B2 (ja) * 2012-04-04 2016-02-16 株式会社ニコン 露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
KR102211609B1 (ko) * 2014-09-04 2021-02-03 가부시키가이샤 니콘 처리 시스템 및 디바이스 제조 방법
DE102019102215B3 (de) * 2019-01-29 2020-06-25 Nanoscribe Gmbh System zum Aufbau einer Laserlithografievorrichtung und Modulträger hierfür
CN114625156A (zh) * 2020-12-10 2022-06-14 中国科学院微电子研究所 使用无人机的掩模版搬运方法及掩模版搬运系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002353096A (ja) 2001-05-22 2002-12-06 Nikon Corp 基板搬送方法、露光装置及び露光方法
JP2006147778A (ja) 2004-11-18 2006-06-08 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002203771A (ja) * 2000-12-28 2002-07-19 Nikon Corp 露光装置、輸送方法
JP4269610B2 (ja) * 2002-09-17 2009-05-27 株式会社ニコン 露光装置及び露光装置の製造方法
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
KR101245070B1 (ko) * 2004-06-21 2013-03-18 가부시키가이샤 니콘 노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
JP4440031B2 (ja) * 2004-07-29 2010-03-24 キヤノン株式会社 露光装置及びデバイス製造方法
JP2006055930A (ja) * 2004-08-18 2006-03-02 Fuji Photo Film Co Ltd 吸着装置とその取付構造及び吸着装置を備えた搬送装置並びに画像形成装置
JP2006337700A (ja) * 2005-06-01 2006-12-14 Fujifilm Holdings Corp 露光装置、露光装置システム、及び露光方法
CN2832754Y (zh) * 2005-10-13 2006-11-01 广辉电子股份有限公司 光罩搬运装置
JP5169221B2 (ja) * 2005-12-28 2013-03-27 株式会社ニコン 露光装置及びその製造方法
WO2008120785A1 (ja) * 2007-04-03 2008-10-09 Nsk Ltd. 露光装置及び露光方法
JP2009094184A (ja) * 2007-10-05 2009-04-30 Toray Ind Inc 基板処理装置および処理方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002353096A (ja) 2001-05-22 2002-12-06 Nikon Corp 基板搬送方法、露光装置及び露光方法
JP2006147778A (ja) 2004-11-18 2006-06-08 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
JP5963122B2 (ja) 2016-08-03
TWI480706B (zh) 2015-04-11
JP2015187752A (ja) 2015-10-29
WO2010044268A1 (ja) 2010-04-22
KR20110069175A (ko) 2011-06-22
CN102187280B (zh) 2014-11-12
CN102187280A (zh) 2011-09-14
KR101904685B1 (ko) 2018-10-04
KR20170089986A (ko) 2017-08-04
JP2014160263A (ja) 2014-09-04
JPWO2010044268A1 (ja) 2012-03-15
TW201015247A (en) 2010-04-16

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