KR101729599B1 - 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법 - Google Patents

감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법 Download PDF

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KR101729599B1
KR101729599B1 KR1020157006313A KR20157006313A KR101729599B1 KR 101729599 B1 KR101729599 B1 KR 101729599B1 KR 1020157006313 A KR1020157006313 A KR 1020157006313A KR 20157006313 A KR20157006313 A KR 20157006313A KR 101729599 B1 KR101729599 B1 KR 101729599B1
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South Korea
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group
resin composition
photosensitive resin
alkyl group
compound
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KR1020157006313A
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English (en)
Korean (ko)
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KR20150043421A (ko
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신지 후지모토
다이스케 카시와기
료 사타케
요시히사 마사키
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후지필름 가부시키가이샤
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Publication of KR20150043421A publication Critical patent/KR20150043421A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F12/02—Monomers containing only one unsaturated aliphatic radical
    • C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F12/22—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H01L51/0015—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/211—Changing the shape of the active layer in the devices, e.g. patterning by selective transformation of an existing layer

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Emergency Medicine (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020157006313A 2012-09-28 2013-08-08 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법 KR101729599B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012217500 2012-09-28
JPJP-P-2012-217500 2012-09-28
PCT/JP2013/071473 WO2014050324A1 (ja) 2012-09-28 2013-08-08 感光性樹脂組成物、これを用いたパターンの製造方法

Publications (2)

Publication Number Publication Date
KR20150043421A KR20150043421A (ko) 2015-04-22
KR101729599B1 true KR101729599B1 (ko) 2017-04-24

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KR1020157006313A KR101729599B1 (ko) 2012-09-28 2013-08-08 감광성 수지 조성물, 이것을 사용한 패턴의 제조 방법

Country Status (5)

Country Link
JP (1) JP6096202B2 (ja)
KR (1) KR101729599B1 (ja)
CN (1) CN104662476B (ja)
TW (1) TWI588605B (ja)
WO (1) WO2014050324A1 (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6209617B2 (ja) * 2013-10-28 2017-10-04 富士フイルム株式会社 感光性樹脂組成物、パターンの製造方法、硬化膜、有機ｅｌ表示装置の製造方法、および液晶表示装置の製造方法
JP6216801B2 (ja) * 2013-10-28 2017-10-18 富士フイルム株式会社 感光性樹脂組成物、パターンの製造方法、硬化膜、有機ｅｌ表示装置の製造方法、および液晶表示装置の製造方法
JP6783540B2 (ja) * 2015-03-31 2020-11-11 住友化学株式会社 レジスト組成物及びレジストパターンの製造方法
TWI696891B (zh) * 2015-12-09 2020-06-21 日商住友化學股份有限公司 光阻組成物及光阻圖案之製造方法
JP6894749B2 (ja) * 2016-07-20 2021-06-30 東京応化工業株式会社 マイクロレンズパターン製造用ポジ型感光性樹脂組成物及びその用途
TWI743132B (zh) * 2016-07-20 2021-10-21 日商東京應化工業股份有限公司 微透鏡圖型製造用正型感光性樹脂組成物及其之用途
JP2020076945A (ja) * 2018-09-21 2020-05-21 旭化成株式会社 感光性樹脂組成物
CN114207525A (zh) * 2019-08-02 2022-03-18 富士胶片株式会社 感光性转印部件、树脂图案的制造方法、电路配线的制造方法、触摸面板的制造方法
JP6827572B2 (ja) * 2020-01-20 2021-02-10 昭和電工株式会社 感光性樹脂組成物、有機ｅｌ素子隔壁、及び有機ｅｌ素子
CN113816929A (zh) * 2021-09-29 2021-12-21 西安瑞联新材料股份有限公司 脂肪族环氧化合物及其制备的灌封胶
CN114276239B (zh) * 2021-12-29 2023-10-27 徐州博康信息化学品有限公司 一种含缩酮结构酸敏感光刻胶树脂单体的制备方法
WO2023228661A1 (ja) * 2022-05-24 2023-11-30 日産化学株式会社 薬液耐性保護膜

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010152068A (ja) * 2008-12-25 2010-07-08 Tokyo Ohka Kogyo Co Ltd レジスト組成物、およびレジストパターン形成方法

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JP4979963B2 (ja) * 2006-03-10 2012-07-18 株式会社Ａｄｅｋａ 光学材料用硬化性組成物及び光導波路
KR20090010044A (ko) * 2006-05-16 2009-01-28 닛산 가가쿠 고교 가부시키 가이샤 포지티브형 감광성 수지 조성물 및 이로부터 얻어지는 다공질막
JP4403174B2 (ja) * 2006-12-25 2010-01-20 Ａｚエレクトロニックマテリアルズ株式会社 パターン形成方法およびそれに用いる感光性樹脂組成物
TWI431426B (zh) * 2007-03-27 2014-03-21 Fujifilm Corp 正型感光性樹脂組成物及使用它之硬化薄膜形成法
JP2010139171A (ja) * 2008-12-12 2010-06-24 Hitachi Appliances Inc 冷媒圧縮機及び冷凍サイクル装置
JP5486521B2 (ja) * 2010-03-15 2014-05-07 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
CN102193316B (zh) * 2010-03-15 2015-11-18 富士胶片株式会社 正型感光性树脂组合物、固化膜的形成方法、固化膜、有机el显示装置以及液晶显示装置
JP5495991B2 (ja) * 2010-07-12 2014-05-21 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置
JP5814012B2 (ja) * 2011-01-19 2015-11-17 富士フイルム株式会社 感光性樹脂組成物、及びパターンの製造方法
JP5468650B2 (ja) * 2011-09-29 2014-04-09 富士フイルム株式会社 感光性樹脂組成物、硬化膜並びにその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010152068A (ja) * 2008-12-25 2010-07-08 Tokyo Ohka Kogyo Co Ltd レジスト組成物、およびレジストパターン形成方法

Also Published As

Publication number Publication date
CN104662476A (zh) 2015-05-27
KR20150043421A (ko) 2015-04-22
JPWO2014050324A1 (ja) 2016-08-22
TWI588605B (zh) 2017-06-21
JP6096202B2 (ja) 2017-03-15
TW201413379A (zh) 2014-04-01
WO2014050324A1 (ja) 2014-04-03
CN104662476B (zh) 2019-04-23

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