CN104662476B - 感光性树脂组合物、图案的制造方法、硬化膜、有机el显示装置及液晶显示装置的制造方法 - Google Patents
感光性树脂组合物、图案的制造方法、硬化膜、有机el显示装置及液晶显示装置的制造方法 Download PDFInfo
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- CN104662476B CN104662476B CN201380050374.8A CN201380050374A CN104662476B CN 104662476 B CN104662476 B CN 104662476B CN 201380050374 A CN201380050374 A CN 201380050374A CN 104662476 B CN104662476 B CN 104662476B
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- 125000005425 toluyl group Chemical group 0.000 description 1
- 229960002622 triacetin Drugs 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 229960004319 trichloroacetic acid Drugs 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000003700 vitamin C derivatives Chemical class 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- MDBKCNBPGJPWMA-UHFFFAOYSA-N xanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1.C1=CC=C2C(=O)C3=CC=CC=C3OC2=C1 MDBKCNBPGJPWMA-UHFFFAOYSA-N 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/211—Changing the shape of the active layer in the devices, e.g. patterning by selective transformation of an existing layer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Emergency Medicine (AREA)
- Materials For Photolithography (AREA)
- Electroluminescent Light Sources (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-217500 | 2012-09-28 | ||
| JP2012217500 | 2012-09-28 | ||
| PCT/JP2013/071473 WO2014050324A1 (ja) | 2012-09-28 | 2013-08-08 | 感光性樹脂組成物、これを用いたパターンの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104662476A CN104662476A (zh) | 2015-05-27 |
| CN104662476B true CN104662476B (zh) | 2019-04-23 |
Family
ID=50387738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201380050374.8A Active CN104662476B (zh) | 2012-09-28 | 2013-08-08 | 感光性树脂组合物、图案的制造方法、硬化膜、有机el显示装置及液晶显示装置的制造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6096202B2 (ja) |
| KR (1) | KR101729599B1 (ja) |
| CN (1) | CN104662476B (ja) |
| TW (1) | TWI588605B (ja) |
| WO (1) | WO2014050324A1 (ja) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015064556A1 (ja) * | 2013-10-28 | 2015-05-07 | 富士フイルム株式会社 | 感光性樹脂組成物、パターンの製造方法、硬化膜、有機ｅｌ表示装置の製造方法、および液晶表示装置の製造方法 |
| WO2015064555A1 (ja) * | 2013-10-28 | 2015-05-07 | 富士フイルム株式会社 | 感光性樹脂組成物、パターンの製造方法、硬化膜、有機ｅｌ表示装置の製造方法、および液晶表示装置の製造方法 |
| JP6783540B2 (ja) * | 2015-03-31 | 2020-11-11 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| TWI696891B (zh) * | 2015-12-09 | 2020-06-21 | 日商住友化學股份有限公司 | 光阻組成物及光阻圖案之製造方法 |
| TWI743132B (zh) * | 2016-07-20 | 2021-10-21 | 日商東京應化工業股份有限公司 | 微透鏡圖型製造用正型感光性樹脂組成物及其之用途 |
| JP6894749B2 (ja) * | 2016-07-20 | 2021-06-30 | 東京応化工業株式会社 | マイクロレンズパターン製造用ポジ型感光性樹脂組成物及びその用途 |
| JP2020076945A (ja) * | 2018-09-21 | 2020-05-21 | 旭化成株式会社 | 感光性樹脂組成物 |
| CN114207525A (zh) * | 2019-08-02 | 2022-03-18 | 富士胶片株式会社 | 感光性转印部件、树脂图案的制造方法、电路配线的制造方法、触摸面板的制造方法 |
| JP6827572B2 (ja) * | 2020-01-20 | 2021-02-10 | 昭和電工株式会社 | 感光性樹脂組成物、有機ｅｌ素子隔壁、及び有機ｅｌ素子 |
| CN113816929A (zh) * | 2021-09-29 | 2021-12-21 | 西安瑞联新材料股份有限公司 | 脂肪族环氧化合物及其制备的灌封胶 |
| CN114276239B (zh) * | 2021-12-29 | 2023-10-27 | 徐州博康信息化学品有限公司 | 一种含缩酮结构酸敏感光刻胶树脂单体的制备方法 |
| WO2023228661A1 (ja) * | 2022-05-24 | 2023-11-30 | 日産化学株式会社 | 薬液耐性保護膜 |
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|---|---|---|---|---|
| JP2008304902A (ja) * | 2007-03-27 | 2008-12-18 | Fujifilm Corp | ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 |
| CN101410432A (zh) * | 2006-03-10 | 2009-04-15 | 株式会社Adeka | 光学材料用固化性组合物和光波导 |
| CN101443704A (zh) * | 2006-05-16 | 2009-05-27 | 日产化学工业株式会社 | 正型感光性树脂组合物以及由其得到的多孔膜 |
| CN101749891A (zh) * | 2008-12-12 | 2010-06-23 | 日立空调·家用电器株式会社 | 制冷剂压缩机及冷冻循环装置 |
| CN102193316A (zh) * | 2010-03-15 | 2011-09-21 | 富士胶片株式会社 | 正型感光性树脂组合物、固化膜的形成方法、固化膜、有机el显示装置以及液晶显示装置 |
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|---|---|---|---|---|
| JP4403174B2 (ja) * | 2006-12-25 | 2010-01-20 | Ａｚエレクトロニックマテリアルズ株式会社 | パターン形成方法およびそれに用いる感光性樹脂組成物 |
| JP5422198B2 (ja) * | 2008-12-25 | 2014-02-19 | 東京応化工業株式会社 | レジスト組成物、およびレジストパターン形成方法 |
| JP5486521B2 (ja) * | 2010-03-15 | 2014-05-07 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置 |
| JP5495991B2 (ja) * | 2010-07-12 | 2014-05-21 | 富士フイルム株式会社 | 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置 |
| JP5814012B2 (ja) * | 2011-01-19 | 2015-11-17 | 富士フイルム株式会社 | 感光性樹脂組成物、及びパターンの製造方法 |
| JP5468650B2 (ja) * | 2011-09-29 | 2014-04-09 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜並びにその製造方法 |
-
2013
- 2013-08-08 WO PCT/JP2013/071473 patent/WO2014050324A1/ja active Application Filing
- 2013-08-08 CN CN201380050374.8A patent/CN104662476B/zh active Active
- 2013-08-08 JP JP2014538263A patent/JP6096202B2/ja active Active
- 2013-08-08 KR KR1020157006313A patent/KR101729599B1/ko active IP Right Grant
- 2013-09-26 TW TW102134831A patent/TWI588605B/zh active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101410432A (zh) * | 2006-03-10 | 2009-04-15 | 株式会社Adeka | 光学材料用固化性组合物和光波导 |
| CN101443704A (zh) * | 2006-05-16 | 2009-05-27 | 日产化学工业株式会社 | 正型感光性树脂组合物以及由其得到的多孔膜 |
| JP2008304902A (ja) * | 2007-03-27 | 2008-12-18 | Fujifilm Corp | ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 |
| CN101663618A (zh) * | 2007-03-27 | 2010-03-03 | 富士胶片株式会社 | 正型感光性树脂组合物、以及使用该组合物形成固化膜的方法 |
| CN101749891A (zh) * | 2008-12-12 | 2010-06-23 | 日立空调·家用电器株式会社 | 制冷剂压缩机及冷冻循环装置 |
| CN102193316A (zh) * | 2010-03-15 | 2011-09-21 | 富士胶片株式会社 | 正型感光性树脂组合物、固化膜的形成方法、固化膜、有机el显示装置以及液晶显示装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2014050324A1 (ja) | 2016-08-22 |
| TW201413379A (zh) | 2014-04-01 |
| CN104662476A (zh) | 2015-05-27 |
| KR20150043421A (ko) | 2015-04-22 |
| JP6096202B2 (ja) | 2017-03-15 |
| KR101729599B1 (ko) | 2017-04-24 |
| WO2014050324A1 (ja) | 2014-04-03 |
| TWI588605B (zh) | 2017-06-21 |
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