KR101635165B1 - 표시 장치 및 그 제조 방법 - Google Patents

표시 장치 및 그 제조 방법 Download PDF

Info

Publication number
KR101635165B1
KR101635165B1 KR1020080127126A KR20080127126A KR101635165B1 KR 101635165 B1 KR101635165 B1 KR 101635165B1 KR 1020080127126 A KR1020080127126 A KR 1020080127126A KR 20080127126 A KR20080127126 A KR 20080127126A KR 101635165 B1 KR101635165 B1 KR 101635165B1
Authority
KR
South Korea
Prior art keywords
layer
insulating film
electrode
contact portion
delete delete
Prior art date
Application number
KR1020080127126A
Other languages
English (en)
Korean (ko)
Other versions
KR20090066223A (ko
Inventor
나오키 하야시
야스노부 히로마스
히로후미 후지오카
Original Assignee
소니 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 소니 주식회사 filed Critical 소니 주식회사
Publication of KR20090066223A publication Critical patent/KR20090066223A/ko
Application granted granted Critical
Publication of KR101635165B1 publication Critical patent/KR101635165B1/ko

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8052Cathodes
    • H10K59/80522Cathodes combined with auxiliary electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259Multistep manufacturing methods
    • H01L27/1288Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
KR1020080127126A 2007-12-18 2008-12-15 표시 장치 및 그 제조 방법 KR101635165B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007326595 2007-12-18
JPJP-P-2007-326595 2007-12-18
JPJP-P-2008-123004 2008-05-09
JP2008123004A JP4600786B2 (ja) 2007-12-18 2008-05-09 表示装置およびその製造方法

Publications (2)

Publication Number Publication Date
KR20090066223A KR20090066223A (ko) 2009-06-23
KR101635165B1 true KR101635165B1 (ko) 2016-06-30

Family

ID=40805831

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080127126A KR101635165B1 (ko) 2007-12-18 2008-12-15 표시 장치 및 그 제조 방법

Country Status (3)

Country Link
JP (1) JP4600786B2 (zh)
KR (1) KR101635165B1 (zh)
CN (1) CN101465368B (zh)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI555436B (zh) * 2011-04-08 2016-10-21 半導體能源研究所股份有限公司 發光裝置及其製造方法
US8912547B2 (en) * 2012-01-20 2014-12-16 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device, display device, and semiconductor device
TWI479948B (zh) * 2012-02-29 2015-04-01 Innocom Tech Shenzhen Co Ltd 顯示面板及顯示裝置
US9178174B2 (en) * 2012-03-27 2015-11-03 Sony Corporation Display device and method of manufacturing the same, method of repairing display device, and electronic apparatus
JP5954162B2 (ja) * 2012-03-28 2016-07-20 ソニー株式会社 表示装置の製造方法
KR101930847B1 (ko) * 2012-05-16 2018-12-20 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조방법
KR20130128940A (ko) * 2012-05-18 2013-11-27 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조방법
KR102132884B1 (ko) * 2013-05-21 2020-07-13 삼성디스플레이 주식회사 유기발광 디스플레이 장치 및 그 제조방법
KR102155370B1 (ko) * 2013-12-02 2020-09-22 삼성디스플레이 주식회사 유기 발광 표시장치 및 그의 제조방법
KR102164949B1 (ko) 2014-03-25 2020-10-14 삼성디스플레이 주식회사 표시 장치, 이의 제조 방법 및 리페어 방법
KR102315824B1 (ko) * 2014-06-27 2021-10-20 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그의 제조 방법
JP2016062885A (ja) * 2014-09-22 2016-04-25 ソニー株式会社 表示装置およびその製造方法、ならびに電子機器
KR102320591B1 (ko) * 2014-10-30 2021-11-03 엘지디스플레이 주식회사 유기전계발광표시장치와 이의 제조방법
KR102374833B1 (ko) * 2014-11-25 2022-03-15 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR102426691B1 (ko) * 2015-02-05 2022-07-28 삼성디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
JP6457879B2 (ja) * 2015-04-22 2019-01-23 株式会社ジャパンディスプレイ 表示装置及びその製造方法
KR102465826B1 (ko) * 2015-10-29 2022-11-09 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR102578834B1 (ko) * 2015-11-30 2023-09-15 엘지디스플레이 주식회사 유기 발광 표시 장치
JP6676998B2 (ja) * 2016-02-10 2020-04-08 セイコーエプソン株式会社 電気光学装置、および電子機器
KR101878187B1 (ko) * 2016-07-29 2018-07-13 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR20180046229A (ko) * 2016-10-27 2018-05-08 엘지디스플레이 주식회사 유기 발광 표시 장치 및 그 제조 방법
KR102410500B1 (ko) * 2017-11-30 2022-06-16 엘지디스플레이 주식회사 전계 발광 표시장치
JP7179517B2 (ja) * 2018-03-01 2022-11-29 Tianma Japan株式会社 表示装置
CN113284921B (zh) * 2020-02-19 2023-05-09 合肥鑫晟光电科技有限公司 阵列基板及显示装置
CN114141826B (zh) * 2021-11-16 2023-08-01 深圳市华星光电半导体显示技术有限公司 显示面板及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005011810A (ja) * 2003-06-16 2005-01-13 Eastman Kodak Co 上面発光型oledデバイスの製造方法
JP2006113571A (ja) * 2004-09-15 2006-04-27 Semiconductor Energy Lab Co Ltd 半導体装置
JP2007141844A (ja) * 2005-11-15 2007-06-07 Samsung Electronics Co Ltd 表示装置とその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4165145B2 (ja) * 2002-08-07 2008-10-15 株式会社日立製作所 有機発光表示装置
CN102544027B (zh) * 2004-09-15 2016-02-17 株式会社半导体能源研究所 半导体器件
JP2007287354A (ja) * 2006-04-12 2007-11-01 Hitachi Displays Ltd 有機el表示装置
KR101386055B1 (ko) * 2006-06-19 2014-04-16 소니 주식회사 발광 표시 장치 및 그 제조 방법
KR100875103B1 (ko) * 2007-11-16 2008-12-19 삼성모바일디스플레이주식회사 유기 발광 디스플레이 장치

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005011810A (ja) * 2003-06-16 2005-01-13 Eastman Kodak Co 上面発光型oledデバイスの製造方法
JP2006113571A (ja) * 2004-09-15 2006-04-27 Semiconductor Energy Lab Co Ltd 半導体装置
JP2007141844A (ja) * 2005-11-15 2007-06-07 Samsung Electronics Co Ltd 表示装置とその製造方法

Also Published As

Publication number Publication date
KR20090066223A (ko) 2009-06-23
JP4600786B2 (ja) 2010-12-15
JP2009170395A (ja) 2009-07-30
CN101465368A (zh) 2009-06-24
CN101465368B (zh) 2011-07-27

Similar Documents

Publication Publication Date Title
KR101635165B1 (ko) 표시 장치 및 그 제조 방법
US8692455B2 (en) Display device and method for production thereof
US11778879B2 (en) Display device including concave/convex structure in the inorganic insulation layer
KR101386055B1 (ko) 발광 표시 장치 및 그 제조 방법
US11476322B2 (en) Display device, method of manufacturing the display device, and electronic apparatus
KR101004874B1 (ko) 표시패널 및 그 제조방법
US9711576B2 (en) Display, method of manufacturing display and electronic device
KR101561130B1 (ko) 표시 장치 유닛 및 그 제조 방법
KR20150067974A (ko) 유기전계 발광소자 및 이의 제조 방법
JP5954162B2 (ja) 表示装置の製造方法
KR20150002119A (ko) 유기전계 발광소자 및 이의 제조 방법
US20210328107A1 (en) Light emitting display device and manufacturing method thereof
KR101984267B1 (ko) 유기전계 발광소자 및 그 제조 방법
KR100635070B1 (ko) 유기 전계 발광 소자 및 그 제조 방법

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant