KR101589426B1 - 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 - Google Patents

하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 Download PDF

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Publication number
KR101589426B1
KR101589426B1 KR1020157032618A KR20157032618A KR101589426B1 KR 101589426 B1 KR101589426 B1 KR 101589426B1 KR 1020157032618 A KR1020157032618 A KR 1020157032618A KR 20157032618 A KR20157032618 A KR 20157032618A KR 101589426 B1 KR101589426 B1 KR 101589426B1
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South Korea
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thin film
housing
sample
charged particle
holding portion
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KR1020157032618A
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Korean (ko)
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KR20150133299A (ko
Inventor
유스께 오미나미
도모히사 오따끼
스께히로 이또
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가부시키가이샤 히다치 하이테크놀로지즈
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020157032618A 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법 Expired - Fee Related KR101589426B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-205499 2011-09-21
JP2011205499A JP5707286B2 (ja) 2011-09-21 2011-09-21 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
PCT/JP2012/067035 WO2013042425A1 (ja) 2011-09-21 2012-07-04 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020157010657A Division KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

Publications (2)

Publication Number Publication Date
KR20150133299A KR20150133299A (ko) 2015-11-27
KR101589426B1 true KR101589426B1 (ko) 2016-01-29

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KR1020147004411A Active KR101542022B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 관찰 방법
KR1020157032618A Expired - Fee Related KR101589426B1 (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법
KR1020157010657A Ceased KR20150052355A (ko) 2011-09-21 2012-07-04 하전 입자선 장치, 하전 입자선 장치의 조정 방법, 및 시료의 검사 또는 시료의 관찰 방법

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Country Status (6)

Country Link
US (2) US9165741B2 (enExample)
JP (1) JP5707286B2 (enExample)
KR (3) KR101542022B1 (enExample)
CN (1) CN103782364B (enExample)
DE (1) DE112012003182B4 (enExample)
WO (1) WO2013042425A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
US9373480B2 (en) * 2013-04-12 2016-06-21 Hitachi High-Technologies Corporation Charged particle beam device and filter member
CN105493224B (zh) * 2013-08-23 2017-06-06 株式会社日立高新技术 隔膜安装部件及带电粒子线装置
GB201317026D0 (en) * 2013-09-25 2013-11-06 Oxford Instr Nanotechnology Tools Ltd X-ray analysis in air
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP2016213155A (ja) * 2015-05-13 2016-12-15 大日本印刷株式会社 試料収容セル
KR101682521B1 (ko) * 2015-05-15 2016-12-06 참엔지니어링(주) 시료 관찰 장치, 커버 어셈블리 및 시료 관찰 방법
KR101723922B1 (ko) * 2015-05-15 2017-04-10 참엔지니어링(주) 시료 관찰 장치 및 커버 어셈블리
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
WO2018197959A1 (en) * 2017-04-27 2018-11-01 King Abdullah University Of Science And Technology Transmission electron microscope sample alignment system and method
KR101954328B1 (ko) * 2017-05-16 2019-03-06 (주)코셈 고분해능 주사전자현미경
KR102207711B1 (ko) * 2018-12-28 2021-01-26 참엔지니어링(주) 시료 관찰 장치 및 방법
JP7259891B2 (ja) 2021-06-23 2023-04-18 株式会社Ｎｈｖコーポレーション 電子線照射装置及び電子線照射装置のメンテナンス方法
KR102854784B1 (ko) * 2025-05-15 2025-09-03 (주)코셈 대기압 전자현미경의 bse 이미지를 이용하여 다중창 초박막과 샘플 사이의 안전거리를 감지 및 제어하는 방법

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Also Published As

Publication number Publication date
US20140151553A1 (en) 2014-06-05
WO2013042425A1 (ja) 2013-03-28
DE112012003182B4 (de) 2021-06-10
US20150380208A1 (en) 2015-12-31
US9673020B2 (en) 2017-06-06
US9165741B2 (en) 2015-10-20
KR20140048999A (ko) 2014-04-24
DE112012003182T5 (de) 2014-04-17
KR20150052355A (ko) 2015-05-13
KR101542022B1 (ko) 2015-08-04
KR20150133299A (ko) 2015-11-27
JP5707286B2 (ja) 2015-04-30
CN103782364B (zh) 2016-04-27
CN103782364A (zh) 2014-05-07
JP2013069443A (ja) 2013-04-18

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