DE112012003182B4 - Ladungsteilchenstrahlvorrichtung - Google Patents

Ladungsteilchenstrahlvorrichtung Download PDF

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Publication number
DE112012003182B4
DE112012003182B4 DE112012003182.2T DE112012003182T DE112012003182B4 DE 112012003182 B4 DE112012003182 B4 DE 112012003182B4 DE 112012003182 T DE112012003182 T DE 112012003182T DE 112012003182 B4 DE112012003182 B4 DE 112012003182B4
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DE
Germany
Prior art keywords
housing
sample
charged particle
thin film
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE112012003182.2T
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German (de)
English (en)
Other versions
DE112012003182T5 (de
Inventor
Yusuke Ominami
Tomohisa Ohtaki
Sukehiro Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of DE112012003182T5 publication Critical patent/DE112012003182T5/de
Application granted granted Critical
Publication of DE112012003182B4 publication Critical patent/DE112012003182B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/166—Sealing means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE112012003182.2T 2011-09-21 2012-07-04 Ladungsteilchenstrahlvorrichtung Expired - Fee Related DE112012003182B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-205499 2011-09-21
JP2011205499A JP5707286B2 (ja) 2011-09-21 2011-09-21 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
PCT/JP2012/067035 WO2013042425A1 (ja) 2011-09-21 2012-07-04 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法

Publications (2)

Publication Number Publication Date
DE112012003182T5 DE112012003182T5 (de) 2014-04-17
DE112012003182B4 true DE112012003182B4 (de) 2021-06-10

Family

ID=47914206

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112012003182.2T Expired - Fee Related DE112012003182B4 (de) 2011-09-21 2012-07-04 Ladungsteilchenstrahlvorrichtung

Country Status (6)

Country Link
US (2) US9165741B2 (enExample)
JP (1) JP5707286B2 (enExample)
KR (3) KR101589426B1 (enExample)
CN (1) CN103782364B (enExample)
DE (1) DE112012003182B4 (enExample)
WO (1) WO2013042425A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12033828B2 (en) 2021-06-23 2024-07-09 Nhv Corporation Electron-beam irradiation apparatus and maintenance method for electron-beam irradiation apparatus

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
DE112014001109B4 (de) * 2013-04-12 2019-11-14 Hitachi High-Technologies Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Filterelement
JP6169703B2 (ja) * 2013-08-23 2017-07-26 株式会社日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
GB201317026D0 (en) * 2013-09-25 2013-11-06 Oxford Instr Nanotechnology Tools Ltd X-ray analysis in air
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP2016213155A (ja) * 2015-05-13 2016-12-15 大日本印刷株式会社 試料収容セル
KR101682521B1 (ko) * 2015-05-15 2016-12-06 참엔지니어링(주) 시료 관찰 장치, 커버 어셈블리 및 시료 관찰 방법
KR101723922B1 (ko) * 2015-05-15 2017-04-10 참엔지니어링(주) 시료 관찰 장치 및 커버 어셈블리
JP6097863B2 (ja) * 2016-05-16 2017-03-15 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
EP3616230B1 (en) * 2017-04-27 2023-08-02 King Abdullah University Of Science And Technology Transmission electron microscope sample alignment system and method
KR101954328B1 (ko) * 2017-05-16 2019-03-06 (주)코셈 고분해능 주사전자현미경
KR102207711B1 (ko) * 2018-12-28 2021-01-26 참엔지니어링(주) 시료 관찰 장치 및 방법
KR102854784B1 (ko) * 2025-05-15 2025-09-03 (주)코셈 대기압 전자현미경의 bse 이미지를 이용하여 다중창 초박막과 샘플 사이의 안전거리를 감지 및 제어하는 방법

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DE102007021897A1 (de) * 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Durchführen von thermischen und nicht-thermischen Elektronenstrahlprozessen
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment

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JPH02138900A (ja) * 1988-11-18 1990-05-28 Nikon Corp 電子線透過窓
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DE69738276T2 (de) * 1996-03-04 2008-04-03 Canon K.K. Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts
AU3234097A (en) 1996-06-12 1998-01-07 American International Technologies, Inc. Actinic radiation source having anode that includes a window area formed by a thin, monolithic silicon membrane
JPH1064467A (ja) 1996-08-23 1998-03-06 Toshiba Corp 電子顕微鏡
JP2004170353A (ja) * 2002-11-22 2004-06-17 Toshiba Corp 電子線照射装置とその照射方法
JP4560321B2 (ja) * 2004-03-31 2010-10-13 株式会社Sen ウエハスキャン装置
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JP5318364B2 (ja) * 2007-01-31 2013-10-16 日本電子株式会社 試料保持体、試料検査装置及び試料検査方法、並びに試料保持体の製造方法
JP5253800B2 (ja) 2007-12-26 2013-07-31 日本電子株式会社 試料保持体及び観察・検査方法並びに観察・検査装置
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DE102007021897A1 (de) * 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Durchführen von thermischen und nicht-thermischen Elektronenstrahlprozessen
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12033828B2 (en) 2021-06-23 2024-07-09 Nhv Corporation Electron-beam irradiation apparatus and maintenance method for electron-beam irradiation apparatus
DE112022003186B4 (de) 2021-06-23 2024-08-29 Nhv Corporation Elektronenstrahl-bestrahlungsvorrichtung und wartungsverfahren für elektronenstrahl-bestrahlungsvorrichtung

Also Published As

Publication number Publication date
US20150380208A1 (en) 2015-12-31
KR101542022B1 (ko) 2015-08-04
KR20150052355A (ko) 2015-05-13
CN103782364A (zh) 2014-05-07
KR20150133299A (ko) 2015-11-27
US20140151553A1 (en) 2014-06-05
WO2013042425A1 (ja) 2013-03-28
JP2013069443A (ja) 2013-04-18
DE112012003182T5 (de) 2014-04-17
CN103782364B (zh) 2016-04-27
KR20140048999A (ko) 2014-04-24
US9673020B2 (en) 2017-06-06
US9165741B2 (en) 2015-10-20
KR101589426B1 (ko) 2016-01-29
JP5707286B2 (ja) 2015-04-30

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Legal Events

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R012 Request for examination validly filed
R016 Response to examination communication
R081 Change of applicant/patentee

Owner name: HITACHI HIGH-TECH CORPORATION, JP

Free format text: FORMER OWNER: HITACHI HIGH-TECHNOLOGIES CORPORATION, TOKYO, JP

R082 Change of representative

Representative=s name: STREHL SCHUEBEL-HOPF & PARTNER MBB PATENTANWAE, DE

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee