CN101388317B - 扫描电子显微镜 - Google Patents
扫描电子显微镜 Download PDFInfo
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- CN101388317B CN101388317B CN2008100851287A CN200810085128A CN101388317B CN 101388317 B CN101388317 B CN 101388317B CN 2008100851287 A CN2008100851287 A CN 2008100851287A CN 200810085128 A CN200810085128 A CN 200810085128A CN 101388317 B CN101388317 B CN 101388317B
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CN2008100851287A CN101388317B (zh) | 2008-03-21 | 2008-03-21 | 扫描电子显微镜 |
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CN2008100851287A CN101388317B (zh) | 2008-03-21 | 2008-03-21 | 扫描电子显微镜 |
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CN101388317A CN101388317A (zh) | 2009-03-18 |
CN101388317B true CN101388317B (zh) | 2010-08-25 |
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CN2008100851287A Active CN101388317B (zh) | 2008-03-21 | 2008-03-21 | 扫描电子显微镜 |
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Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102109477B (zh) * | 2010-12-31 | 2012-09-05 | 中国航天科技集团公司第五研究院第五一○研究所 | 一种区分材料二次电子和背散射电子的测试装置 |
US8476585B2 (en) * | 2011-03-02 | 2013-07-02 | Gatan, Inc. | Microtome utilizing a movable knife in a retardation field scanning electron microscope and a retardation field scanning electron microscope including the same |
JP5759815B2 (ja) * | 2011-07-19 | 2015-08-05 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡 |
JP5707286B2 (ja) * | 2011-09-21 | 2015-04-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。 |
DE112014002951B4 (de) * | 2013-08-02 | 2020-08-06 | Hitachi High-Technologies Corporation | Rasterelektronenmikroskop |
EP3563399A4 (en) * | 2016-12-29 | 2020-07-29 | The University of British Columbia | OPTICALLY ADDRESSED THERMIONIC ELECTRON BEAM DEVICE |
CN106711003B (zh) * | 2017-02-15 | 2019-03-19 | 聚束科技(北京)有限公司 | 一种电子源产生装置及电子束控制方法 |
CN106920723A (zh) * | 2017-03-06 | 2017-07-04 | 聚束科技(北京)有限公司 | 一种扫描聚焦系统及电子束控制方法 |
CN107204267A (zh) * | 2017-06-09 | 2017-09-26 | 中国科学院西安光学精密机械研究所 | 一种带电粒子圆磁透镜 |
WO2019100600A1 (en) * | 2017-11-21 | 2019-05-31 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Low voltage scanning electron microscope and method for specimen observation |
CN112071732B (zh) * | 2020-07-28 | 2021-11-19 | 西安交通大学 | 一种可编码阵列式静电偏转器、聚焦偏转系统及设计方法 |
CN112086332A (zh) * | 2020-09-27 | 2020-12-15 | 北京中科科仪股份有限公司 | 一种静电偏转装置及其偏转方法 |
CN113035675A (zh) * | 2021-02-26 | 2021-06-25 | 中国科学院生物物理研究所 | 带电粒子束设备 |
JP7453273B2 (ja) | 2022-04-21 | 2024-03-19 | 日本電子株式会社 | 荷電粒子線装置および荷電粒子線装置の制御方法 |
CN116246923B (zh) * | 2022-12-30 | 2023-11-14 | 广东省科学院半导体研究所 | 电子束聚焦偏转系统及电子束光柱体 |
CN116631831B (zh) * | 2023-07-20 | 2023-09-22 | 北京惠然肯来科技中心(有限合伙) | 磁电复合式扫描偏转聚焦系统、方法及扫描电子显微镜 |
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Free format text: CORRECT: ADDRESS; FROM: 100095 YARD 4, WANGZHUANG, DONGBUTOU, WENQUAN TOWN, HAIDIAN DISTRICT, BEIJING TO: 4/F, NO. 18, YANXIN ROAD 1, HSINCHU SCIENCE PARK, 300, TAIWAN PROVINCE |
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Effective date of registration: 20110325 Address after: Taiwan 300 Hsinchu Science Park, new research road, No. 4, building 18 Patentee after: Hermes-Microvision, Inc. Address before: 100095 Beijing City, Haidian District Wen Quan Zhen Dong Bu tou Wang Zhuang No. 4 hospital Patentee before: Hanmin Microtest Technology (Beijing) Co.,Ltd. |
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Effective date of registration: 20190211 Address after: Holland Weide Eindhoven Patentee after: ASML Holding N.V Address before: Holland Weide Eindhoven Patentee before: Hermes-Microvision, Inc. Effective date of registration: 20190211 Address after: Holland Weide Eindhoven Patentee after: Hermes-Microvision, Inc. Address before: 4th Floor, 18 Yanxin Road, Xinzhu Science Park, Taiwan, China Patentee before: Hermes-Microvision, Inc. |