KR101552805B1 - 반송 장치 및 기판 처리 시스템 - Google Patents
반송 장치 및 기판 처리 시스템 Download PDFInfo
- Publication number
- KR101552805B1 KR101552805B1 KR1020147014689A KR20147014689A KR101552805B1 KR 101552805 B1 KR101552805 B1 KR 101552805B1 KR 1020147014689 A KR1020147014689 A KR 1020147014689A KR 20147014689 A KR20147014689 A KR 20147014689A KR 101552805 B1 KR101552805 B1 KR 101552805B1
- Authority
- KR
- South Korea
- Prior art keywords
- housing
- blowing
- end effector
- moving
- driving mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3402—Mechanical parts of transfer devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
- Engineering & Computer Science (AREA)
- Robotics (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011264099A JP5603314B2 (ja) | 2011-12-01 | 2011-12-01 | 搬送装置及び基板処理システム |
| JPJP-P-2011-264099 | 2011-12-01 | ||
| PCT/JP2012/080766 WO2013081013A1 (ja) | 2011-12-01 | 2012-11-28 | 搬送装置及び基板処理システム |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140100484A KR20140100484A (ko) | 2014-08-14 |
| KR101552805B1 true KR101552805B1 (ko) | 2015-09-11 |
Family
ID=48535464
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147014689A Expired - Fee Related KR101552805B1 (ko) | 2011-12-01 | 2012-11-28 | 반송 장치 및 기판 처리 시스템 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9165810B2 (https=) |
| JP (1) | JP5603314B2 (https=) |
| KR (1) | KR101552805B1 (https=) |
| TW (1) | TWI518829B (https=) |
| WO (1) | WO2013081013A1 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6468848B2 (ja) * | 2015-01-13 | 2019-02-13 | 株式会社ディスコ | 搬送装置 |
| JP6430870B2 (ja) * | 2015-03-20 | 2018-11-28 | 東京エレクトロン株式会社 | クランプ装置及びこれを用いた基板搬入出装置、並びに基板処理装置 |
| JP6553388B2 (ja) | 2015-03-31 | 2019-07-31 | 株式会社Screenホールディングス | 基板搬送装置、基板処理装置および基板搬送方法 |
| JP6564642B2 (ja) * | 2015-07-23 | 2019-08-21 | 東京エレクトロン株式会社 | 基板搬送室、基板処理システム、及び基板搬送室内のガス置換方法 |
| CN105292980B (zh) * | 2015-10-30 | 2018-01-02 | 中汽昌兴(洛阳)机电设备工程有限公司 | 一种输送系统及其吊具、输送装置 |
| US11373891B2 (en) * | 2018-10-26 | 2022-06-28 | Applied Materials, Inc. | Front-ducted equipment front end modules, side storage pods, and methods of operating the same |
| JP7316104B2 (ja) * | 2019-06-14 | 2023-07-27 | 株式会社日立ハイテク | ウエハ搬送装置 |
| JP7401219B2 (ja) | 2019-07-31 | 2023-12-19 | ニデックインスツルメンツ株式会社 | 産業用ロボット |
| KR20230017185A (ko) * | 2020-05-29 | 2023-02-03 | 엘피이 에스피에이 | 오버헤드 스크린을 구비한 기판 핸들링을 위한 도구 및 관련 핸들링 방법 및 에피택셜 반응기 |
| US11666951B2 (en) * | 2020-07-10 | 2023-06-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer handler cleaning tool |
| JP7555210B2 (ja) * | 2020-07-29 | 2024-09-24 | 株式会社Screenホールディングス | 基板処理装置 |
| WO2025205177A1 (ja) * | 2024-03-29 | 2025-10-02 | 東京エレクトロン株式会社 | 搬送装置及び排気方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2503732Y2 (ja) * | 1994-04-22 | 1996-07-03 | 大日本スクリーン製造株式会社 | 半導体製造装置 |
| JPH1131730A (ja) * | 1997-07-14 | 1999-02-02 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
| US6983195B2 (en) * | 2000-12-08 | 2006-01-03 | Tokyo Electron Limited | Semiconductor processing system and method of transferring workpiece |
| JP2003007799A (ja) * | 2001-06-21 | 2003-01-10 | Tokyo Electron Ltd | 処理システム |
| KR100483428B1 (ko) * | 2003-01-24 | 2005-04-14 | 삼성전자주식회사 | 기판 가공 장치 |
| KR100583730B1 (ko) * | 2004-06-29 | 2006-05-26 | 삼성전자주식회사 | 기판 이송 시스템 및 상기 시스템의 프레임 내 압력을조절하는 방법 |
| US20070233313A1 (en) * | 2006-03-28 | 2007-10-04 | Tokyo Electron Limited | Transfer pick, transfer device, substrate processing apparatus and transfer pick cleaning method |
| JP4896899B2 (ja) * | 2007-01-31 | 2012-03-14 | 東京エレクトロン株式会社 | 基板処理装置およびパーティクル付着防止方法 |
| JP4959457B2 (ja) * | 2007-07-26 | 2012-06-20 | 東京エレクトロン株式会社 | 基板搬送モジュール及び基板処理システム |
| JP4359640B2 (ja) * | 2007-09-25 | 2009-11-04 | 東京エレクトロン株式会社 | 基板搬送装置及びダウンフロー制御方法 |
| US8757026B2 (en) * | 2008-04-15 | 2014-06-24 | Dynamic Micro Systems, Semiconductor Equipment Gmbh | Clean transfer robot |
| JP5131094B2 (ja) * | 2008-08-29 | 2013-01-30 | 東京エレクトロン株式会社 | 熱処理装置及び熱処理方法並びに記憶媒体 |
-
2011
- 2011-12-01 JP JP2011264099A patent/JP5603314B2/ja not_active Expired - Fee Related
-
2012
- 2012-11-28 WO PCT/JP2012/080766 patent/WO2013081013A1/ja not_active Ceased
- 2012-11-28 US US14/361,869 patent/US9165810B2/en not_active Expired - Fee Related
- 2012-11-28 KR KR1020147014689A patent/KR101552805B1/ko not_active Expired - Fee Related
- 2012-11-30 TW TW101144902A patent/TWI518829B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US20150125238A1 (en) | 2015-05-07 |
| JP5603314B2 (ja) | 2014-10-08 |
| JP2013118229A (ja) | 2013-06-13 |
| KR20140100484A (ko) | 2014-08-14 |
| TW201339073A (zh) | 2013-10-01 |
| WO2013081013A1 (ja) | 2013-06-06 |
| US9165810B2 (en) | 2015-10-20 |
| TWI518829B (zh) | 2016-01-21 |
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