KR101538830B1 - 배기 트랩 - Google Patents

배기 트랩 Download PDF

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Publication number
KR101538830B1
KR101538830B1 KR1020120097249A KR20120097249A KR101538830B1 KR 101538830 B1 KR101538830 B1 KR 101538830B1 KR 1020120097249 A KR1020120097249 A KR 1020120097249A KR 20120097249 A KR20120097249 A KR 20120097249A KR 101538830 B1 KR101538830 B1 KR 101538830B1
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KR
South Korea
Prior art keywords
gas
exhaust
baffle plate
small
diameter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020120097249A
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English (en)
Korean (ko)
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KR20130029011A (ko
Inventor
사토루 고이케
Original Assignee
도쿄엘렉트론가부시키가이샤
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Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20130029011A publication Critical patent/KR20130029011A/ko
Application granted granted Critical
Publication of KR101538830B1 publication Critical patent/KR101538830B1/ko
Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
    • B01D45/04—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia
    • B01D45/08—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia by impingement against baffle separators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
    • B01D50/20—Combinations of devices covered by groups B01D45/00 and B01D46/00

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR1020120097249A 2011-09-13 2012-09-03 배기 트랩 Expired - Fee Related KR101538830B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011199622A JP5728341B2 (ja) 2011-09-13 2011-09-13 排気トラップ
JPJP-P-2011-199622 2011-09-13

Publications (2)

Publication Number Publication Date
KR20130029011A KR20130029011A (ko) 2013-03-21
KR101538830B1 true KR101538830B1 (ko) 2015-07-22

Family

ID=47828749

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120097249A Expired - Fee Related KR101538830B1 (ko) 2011-09-13 2012-09-03 배기 트랩

Country Status (5)

Country Link
US (1) US20130061969A1 (https=)
JP (1) JP5728341B2 (https=)
KR (1) KR101538830B1 (https=)
CN (1) CN102989238B (https=)
TW (1) TWI551721B (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220114815A (ko) * 2021-02-09 2022-08-17 주식회사 저스템 기류 균일화 장치를 구비한 efem

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CN103752122B (zh) * 2014-02-11 2015-11-11 江苏佳有环保科技有限公司 漆气氧化洗涤塔装置
JP6468884B2 (ja) 2014-04-21 2019-02-13 東京エレクトロン株式会社 排気システム
US10927457B2 (en) * 2015-03-04 2021-02-23 Toshiba Memory Corporation Semiconductor manufacturing apparatus
TWI624554B (zh) * 2015-08-21 2018-05-21 弗里松股份有限公司 蒸發源
MY190445A (en) 2015-08-21 2022-04-21 Flisom Ag Homogeneous linear evaporation source
RU2724260C1 (ru) 2016-10-14 2020-06-22 АйЭйчАй КОРПОРЕЙШН Устройство для отбора повторным нагреванием для газофазного процесса
TWI665019B (zh) * 2017-02-15 2019-07-11 Scientech Corporation 基板處理裝置
KR102330646B1 (ko) * 2017-03-22 2021-11-23 스미스 아날리티컬 엘엘씨 증류 프로브 및 유체를 샘플링하고 조절하기 위한 방법
JP7258274B2 (ja) * 2018-12-25 2023-04-17 株式会社レゾナック フィルタ装置、化学気相成長装置およびＳｉＣエピタキシャルウェハの製造方法
KR102209205B1 (ko) * 2019-08-21 2021-02-01 주식회사 미래보 반도체 공정용 유로방향 전환식 반응부산물 포집장치
US11282491B2 (en) * 2019-12-17 2022-03-22 Emerson Process Management Regulator Technologies, Inc. Plates and plate assemblies for noise attenuators and other devices and methods making the same
US11562726B2 (en) 2019-12-17 2023-01-24 Emerson Process Management Regulator Technologies, Inc. Plates and plate assemblies for noise attenuators and other devices and methods making the same
TWI889744B (zh) * 2020-01-29 2025-07-11 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 污染物捕集系統、及擋板堆疊
JP2021186785A (ja) * 2020-06-03 2021-12-13 東京エレクトロン株式会社 トラップ装置及び基板処理装置
US11992835B2 (en) 2020-08-04 2024-05-28 Universal Analyzers Inc. Distillation probes and methods for sampling and conditioning a fluid
TW202303865A (zh) 2021-05-28 2023-01-16 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 污染物捕集系統、及擋板堆疊
CN113818012B (zh) * 2021-11-25 2022-04-01 新美光(苏州)半导体科技有限公司 一种化学气相沉积装置

Citations (4)

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Publication number Priority date Publication date Assignee Title
JPH0972291A (ja) * 1995-09-04 1997-03-18 Ulvac Japan Ltd ドライ真空ポンプ前段用のトラップ
JPH10140357A (ja) * 1996-11-13 1998-05-26 Tokyo Electron Ltd トラップ装置
JP2000045073A (ja) * 1998-07-29 2000-02-15 Kokusai Electric Co Ltd 排気トラップ及び処理装置
JP2007208042A (ja) * 2006-02-02 2007-08-16 Tokyo Electron Ltd 減圧処理装置

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US1186067A (en) * 1915-09-28 1916-06-06 William A Rawlings Muffler.
US1632325A (en) * 1924-05-26 1927-06-14 Int Precipitation Co Gas scrubber
GB268163A (en) * 1926-05-03 1927-03-31 Vilbiss Co Improvements in apparatus for cleansing air and gases
US1857348A (en) * 1928-05-14 1932-05-10 Bokenkroger William Filter for gaseous substances
US3224171A (en) * 1963-08-16 1965-12-21 Hyman D Bowman Exhaust filter for internal combustion engines
US3572391A (en) * 1969-07-10 1971-03-23 Hirsch Abraham A Flow uniformizing baffling for closed process vessels
US3606738A (en) * 1969-12-02 1971-09-21 Ben Kraus Jr Fluid separator
US4065918A (en) * 1973-02-12 1978-01-03 Ethyl Corporation Exhaust systems
US4506513A (en) * 1983-06-17 1985-03-26 Max John K Cold trap
US4488887A (en) * 1983-10-17 1984-12-18 R. J. Reynolds Tobacco Company Cold trap
DK166260C (da) * 1990-06-08 1993-08-30 Haldor Topsoe As Fremgangsmaade til fjernelse af sure, gasformige bestanddele i roeg- og spildgas ved behandling med ammoniak
JPH05160029A (ja) * 1991-12-02 1993-06-25 Hitachi Ltd 成膜装置およびその排気トラップ
US5422081A (en) * 1992-11-25 1995-06-06 Tokyo Electron Kabushiki Kaisha Trap device for vapor phase reaction apparatus
JPH07193008A (ja) * 1993-12-27 1995-07-28 Toshiba Corp 半導体化学気相成長システム
JPH1054356A (ja) * 1996-08-14 1998-02-24 Ebara Corp 析出物除去用トラップ
US6156107A (en) * 1996-11-13 2000-12-05 Tokyo Electron Limited Trap apparatus
JPH11300153A (ja) * 1998-04-24 1999-11-02 Dainippon Screen Mfg Co Ltd 昇華成分除去ユニットおよびそれを備えた熱処理装置
JP2000256856A (ja) * 1999-03-11 2000-09-19 Tokyo Electron Ltd 処理装置及び処理装置用真空排気システム及び減圧ｃｖｄ装置及び減圧ｃｖｄ装置用真空排気システム及びトラップ装置
US6206971B1 (en) * 1999-03-29 2001-03-27 Applied Materials, Inc. Integrated temperature controlled exhaust and cold trap assembly
US6173735B1 (en) * 1999-04-29 2001-01-16 Perry Equipment Corporation Method and apparatus for regulating gas flow
JP4642379B2 (ja) * 2004-05-12 2011-03-02 東京エレクトロン株式会社 排気捕集装置
JP5036354B2 (ja) * 2006-04-04 2012-09-26 東京エレクトロン株式会社 成膜装置の排気系構造、成膜装置、および排ガスの処理方法
JP5128168B2 (ja) * 2006-04-24 2013-01-23 三菱電線工業株式会社 排気装置
US7866345B2 (en) * 2007-09-28 2011-01-11 Circor Instrumentation Technologies, Inc. Non-clogging flow restriction for pressure based flow control devices
JP5696348B2 (ja) * 2008-08-09 2015-04-08 東京エレクトロン株式会社 金属回収方法、金属回収装置、排気系及びこれを用いた成膜装置
CN201470229U (zh) * 2009-09-01 2010-05-19 中国石油集团西部钻探工程有限公司吐哈钻井工艺研究院 环保抑尘器
CN201589723U (zh) * 2009-12-15 2010-09-22 东莞市环境保护监测站 粒子采样用分级冲撞器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0972291A (ja) * 1995-09-04 1997-03-18 Ulvac Japan Ltd ドライ真空ポンプ前段用のトラップ
JPH10140357A (ja) * 1996-11-13 1998-05-26 Tokyo Electron Ltd トラップ装置
JP2000045073A (ja) * 1998-07-29 2000-02-15 Kokusai Electric Co Ltd 排気トラップ及び処理装置
JP2007208042A (ja) * 2006-02-02 2007-08-16 Tokyo Electron Ltd 減圧処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220114815A (ko) * 2021-02-09 2022-08-17 주식회사 저스템 기류 균일화 장치를 구비한 efem
KR102442234B1 (ko) 2021-02-09 2022-09-13 주식회사 저스템 기류 균일화 장치를 구비한 efem

Also Published As

Publication number Publication date
TWI551721B (zh) 2016-10-01
TW201329282A (zh) 2013-07-16
CN102989238B (zh) 2015-06-03
US20130061969A1 (en) 2013-03-14
CN102989238A (zh) 2013-03-27
JP2013062362A (ja) 2013-04-04
KR20130029011A (ko) 2013-03-21
JP5728341B2 (ja) 2015-06-03

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