KR101523293B1 - 레이저 가공 장치 - Google Patents

레이저 가공 장치 Download PDF

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Publication number
KR101523293B1
KR101523293B1 KR1020080038670A KR20080038670A KR101523293B1 KR 101523293 B1 KR101523293 B1 KR 101523293B1 KR 1020080038670 A KR1020080038670 A KR 1020080038670A KR 20080038670 A KR20080038670 A KR 20080038670A KR 101523293 B1 KR101523293 B1 KR 101523293B1
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KR
South Korea
Prior art keywords
optical axis
imaging
image
spatial modulation
modulation element
Prior art date
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Expired - Fee Related
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KR1020080038670A
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English (en)
Korean (ko)
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KR20080097340A (ko
Inventor
다쓰야 나카무라
고이치 다카하시
준코 아루가
Original Assignee
올림푸스 가부시키가이샤
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Publication of KR20080097340A publication Critical patent/KR20080097340A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020080038670A 2007-05-01 2008-04-25 레이저 가공 장치 Expired - Fee Related KR101523293B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007120812A JP5086687B2 (ja) 2007-05-01 2007-05-01 レーザ加工装置
JPJP-P-2007-00120812 2007-05-01

Publications (2)

Publication Number Publication Date
KR20080097340A KR20080097340A (ko) 2008-11-05
KR101523293B1 true KR101523293B1 (ko) 2015-05-27

Family

ID=40051446

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080038670A Expired - Fee Related KR101523293B1 (ko) 2007-05-01 2008-04-25 레이저 가공 장치

Country Status (4)

Country Link
JP (1) JP5086687B2 (enrdf_load_stackoverflow)
KR (1) KR101523293B1 (enrdf_load_stackoverflow)
CN (1) CN101298117B (enrdf_load_stackoverflow)
TW (1) TWI405633B (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5301955B2 (ja) * 2008-11-13 2013-09-25 オリンパス株式会社 欠陥修正装置
JP5346690B2 (ja) * 2009-05-26 2013-11-20 オリンパス株式会社 レーザ照射装置
DE102010020183B4 (de) * 2010-05-11 2013-07-11 Precitec Kg Laserschneidkopf und Verfahren zum Schneiden eines Werkstücks mittels eines Laserschneidkopfes
TWI642507B (zh) 2011-12-16 2018-12-01 應用材料股份有限公司 用於雷射處理設備的輻射源及多重光束組合器
CN102608875A (zh) * 2012-03-27 2012-07-25 深圳市华星光电技术有限公司 基于修补机台的玻璃基板补刻号方法及玻璃基板补刻号装置
CN103203541B (zh) * 2013-02-04 2015-05-13 张立国 一种激光加工装置
CN104375383B (zh) * 2013-08-13 2017-08-29 上海微电子装备有限公司 用于光刻设备的调焦调平检测装置及方法
JP6321932B2 (ja) * 2013-09-24 2018-05-09 株式会社小糸製作所 車両用前照灯
CN104227243A (zh) * 2014-09-11 2014-12-24 深圳英诺激光科技有限公司 一种硬质材料激光深加工设备及加工方法
CN106141457B (zh) * 2016-07-19 2018-01-12 张立国 一种激光钻孔系统及激光钻孔方法
CN106735875B (zh) * 2017-02-20 2019-01-18 湖北工业大学 一种基于液晶空间光调制器的激光柔性微加工系统及方法
CN107824968A (zh) * 2017-11-08 2018-03-23 深圳泰德激光科技有限公司 Ccd视觉定位的激光焊接装置
US12145214B2 (en) * 2018-10-30 2024-11-19 Hamamatsu Photonics K.K. Laser machining head and laser machining device
CN111098043B (zh) * 2020-01-19 2024-12-27 中国科学院宁波材料技术与工程研究所 水导激光加工装置和加工系统

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09206965A (ja) * 1996-01-26 1997-08-12 Keyence Corp レーザマーク装置
JP2006227198A (ja) * 2005-02-16 2006-08-31 Olympus Corp レーザ加工装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2220936Y (zh) * 1995-04-07 1996-02-28 中国科学院长春光学精密机械研究所 一种新型激光照排机
JP4429974B2 (ja) * 2005-06-17 2010-03-10 オリンパス株式会社 レーザ加工方法および装置
TWI367800B (en) * 2005-06-17 2012-07-11 Olympus Corp Laser beam machining method and apparatus
JP4947933B2 (ja) * 2005-07-26 2012-06-06 オリンパス株式会社 レーザリペア装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09206965A (ja) * 1996-01-26 1997-08-12 Keyence Corp レーザマーク装置
JP2006227198A (ja) * 2005-02-16 2006-08-31 Olympus Corp レーザ加工装置

Also Published As

Publication number Publication date
KR20080097340A (ko) 2008-11-05
JP2008272806A (ja) 2008-11-13
TW200932409A (en) 2009-08-01
CN101298117A (zh) 2008-11-05
JP5086687B2 (ja) 2012-11-28
TWI405633B (zh) 2013-08-21
CN101298117B (zh) 2013-04-10

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