KR101289163B1 - 감방사선성 수지 조성물, 및 층간 절연막 및마이크로렌즈의 형성 - Google Patents

감방사선성 수지 조성물, 및 층간 절연막 및마이크로렌즈의 형성 Download PDF

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KR101289163B1
KR101289163B1 KR1020060097042A KR20060097042A KR101289163B1 KR 101289163 B1 KR101289163 B1 KR 101289163B1 KR 1020060097042 A KR1020060097042 A KR 1020060097042A KR 20060097042 A KR20060097042 A KR 20060097042A KR 101289163 B1 KR101289163 B1 KR 101289163B1
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KR
South Korea
Prior art keywords
film
sulfonic acid
resin composition
acid ester
sensitive resin
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KR1020060097042A
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English (en)
Korean (ko)
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KR20070037688A (ko
Inventor
에이지 요네다
겐이찌 하마다
히로시 시호
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제이에스알 가부시끼가이샤
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Publication of KR20070037688A publication Critical patent/KR20070037688A/ko
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Publication of KR101289163B1 publication Critical patent/KR101289163B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020060097042A 2005-10-03 2006-10-02 감방사선성 수지 조성물, 및 층간 절연막 및마이크로렌즈의 형성 KR101289163B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005289472A JP4677871B2 (ja) 2005-10-03 2005-10-03 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成
JPJP-P-2005-00289472 2005-10-03

Publications (2)

Publication Number Publication Date
KR20070037688A KR20070037688A (ko) 2007-04-06
KR101289163B1 true KR101289163B1 (ko) 2013-07-23

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KR1020060097042A KR101289163B1 (ko) 2005-10-03 2006-10-02 감방사선성 수지 조성물, 및 층간 절연막 및마이크로렌즈의 형성

Country Status (4)

Country Link
JP (1) JP4677871B2 (zh)
KR (1) KR101289163B1 (zh)
CN (1) CN101154041B (zh)
TW (1) TWI410667B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5003375B2 (ja) * 2007-09-20 2012-08-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5003376B2 (ja) * 2007-09-20 2012-08-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5105073B2 (ja) * 2008-03-24 2012-12-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズの製造方法
JP5279353B2 (ja) * 2008-06-09 2013-09-04 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
JP5476490B2 (ja) * 2013-01-18 2014-04-23 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
KR20170039560A (ko) * 2015-10-01 2017-04-11 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이를 이용한 유기 절연막
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びｃｍｏｓイメージセンサ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040030311A (ko) * 2002-09-27 2004-04-09 스미또모 가가꾸 고교 가부시끼가이샤 감방사선성 수지 조성물
KR20040038826A (ko) * 2002-11-01 2004-05-08 스미또모 가가꾸 고교 가부시끼가이샤 감방사선성 수지 조성물
JP2004170566A (ja) 2002-11-19 2004-06-17 Jsr Corp 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズ

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3650985B2 (ja) * 1997-05-22 2005-05-25 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物およびパターン製造法
JP3835120B2 (ja) * 2000-05-22 2006-10-18 Ｊｓｒ株式会社 感放射線性樹脂組成物並びに層間絶縁膜およびマイクロレンズ
JP2001343743A (ja) * 2000-05-31 2001-12-14 Jsr Corp 感放射線性樹脂組成物およびその硬化物の素子への使用
JP3965868B2 (ja) * 2000-06-12 2007-08-29 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ
JP4524944B2 (ja) * 2001-03-28 2010-08-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズの形成への使用、ならびに層間絶縁膜およびマイクロレンズ
JP4631081B2 (ja) * 2001-07-16 2011-02-16 ナガセケムテックス株式会社 ポジ型感放射線性樹脂組成物
JP2003082042A (ja) * 2001-09-07 2003-03-19 Jsr Corp 隔壁形成用感放射線性樹脂組成物、隔壁、および表示素子。
JP2004029535A (ja) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
JP2004139070A (ja) * 2002-09-27 2004-05-13 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
JP4493938B2 (ja) * 2003-06-06 2010-06-30 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040030311A (ko) * 2002-09-27 2004-04-09 스미또모 가가꾸 고교 가부시끼가이샤 감방사선성 수지 조성물
KR20040038826A (ko) * 2002-11-01 2004-05-08 스미또모 가가꾸 고교 가부시끼가이샤 감방사선성 수지 조성물
JP2004170566A (ja) 2002-11-19 2004-06-17 Jsr Corp 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズ

Also Published As

Publication number Publication date
JP4677871B2 (ja) 2011-04-27
CN101154041B (zh) 2011-11-23
TW200730863A (en) 2007-08-16
CN101154041A (zh) 2008-04-02
KR20070037688A (ko) 2007-04-06
TWI410667B (zh) 2013-10-01
JP2007101763A (ja) 2007-04-19

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