JP4677871B2 - 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成 - Google Patents

感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成 Download PDF

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JP4677871B2
JP4677871B2 JP2005289472A JP2005289472A JP4677871B2 JP 4677871 B2 JP4677871 B2 JP 4677871B2 JP 2005289472 A JP2005289472 A JP 2005289472A JP 2005289472 A JP2005289472 A JP 2005289472A JP 4677871 B2 JP4677871 B2 JP 4677871B2
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Prior art keywords
dicarboximide
hept
ene
bicyclo
film
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JP2005289472A
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Japanese (ja)
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JP2007101763A (ja
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英司 米田
謙一 濱田
浩司 志保
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JSR Corp
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JSR Corp
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Priority to JP2005289472A priority Critical patent/JP4677871B2/ja
Priority to CN2006101728596A priority patent/CN101154041B/zh
Priority to KR1020060097042A priority patent/KR101289163B1/ko
Priority to TW095136721A priority patent/TWI410667B/zh
Publication of JP2007101763A publication Critical patent/JP2007101763A/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2005289472A 2005-10-03 2005-10-03 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成 Active JP4677871B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2005289472A JP4677871B2 (ja) 2005-10-03 2005-10-03 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成
CN2006101728596A CN101154041B (zh) 2005-10-03 2006-09-29 放射线敏感性树脂组合物、层间绝缘膜和微透镜的形成
KR1020060097042A KR101289163B1 (ko) 2005-10-03 2006-10-02 감방사선성 수지 조성물, 및 층간 절연막 및마이크로렌즈의 형성
TW095136721A TWI410667B (zh) 2005-10-03 2006-10-03 Sensing linear resin composition, interlayer insulating film and method for forming the same, microlens and method for forming the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005289472A JP4677871B2 (ja) 2005-10-03 2005-10-03 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成

Publications (2)

Publication Number Publication Date
JP2007101763A JP2007101763A (ja) 2007-04-19
JP4677871B2 true JP4677871B2 (ja) 2011-04-27

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JP2005289472A Active JP4677871B2 (ja) 2005-10-03 2005-10-03 感放射線性樹脂組成物ならびに層間絶縁膜およびマイクロレンズの形成

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JP (1) JP4677871B2 (zh)
KR (1) KR101289163B1 (zh)
CN (1) CN101154041B (zh)
TW (1) TWI410667B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5003375B2 (ja) * 2007-09-20 2012-08-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5003376B2 (ja) * 2007-09-20 2012-08-15 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP5105073B2 (ja) * 2008-03-24 2012-12-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、ならびに層間絶縁膜およびマイクロレンズの製造方法
JP5279353B2 (ja) * 2008-06-09 2013-09-04 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
JP5476490B2 (ja) * 2013-01-18 2014-04-23 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体およびパターン形成方法
KR20170039560A (ko) * 2015-10-01 2017-04-11 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이를 이용한 유기 절연막
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びｃｍｏｓイメージセンサ

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029535A (ja) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
JP2004139070A (ja) * 2002-09-27 2004-05-13 Sumitomo Chem Co Ltd 感放射線性樹脂組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3650985B2 (ja) * 1997-05-22 2005-05-25 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物およびパターン製造法
JP3835120B2 (ja) * 2000-05-22 2006-10-18 Ｊｓｒ株式会社 感放射線性樹脂組成物並びに層間絶縁膜およびマイクロレンズ
JP2001343743A (ja) * 2000-05-31 2001-12-14 Jsr Corp 感放射線性樹脂組成物およびその硬化物の素子への使用
JP3965868B2 (ja) * 2000-06-12 2007-08-29 Ｊｓｒ株式会社 層間絶縁膜およびマイクロレンズ
JP4524944B2 (ja) * 2001-03-28 2010-08-18 Ｊｓｒ株式会社 感放射線性樹脂組成物、その層間絶縁膜およびマイクロレンズの形成への使用、ならびに層間絶縁膜およびマイクロレンズ
JP4631081B2 (ja) * 2001-07-16 2011-02-16 ナガセケムテックス株式会社 ポジ型感放射線性樹脂組成物
JP2003082042A (ja) * 2001-09-07 2003-03-19 Jsr Corp 隔壁形成用感放射線性樹脂組成物、隔壁、および表示素子。
TW200415438A (en) * 2002-09-27 2004-08-16 Sumitomo Chemical Co Radiosensitive resin composition
TWI281095B (en) * 2002-11-01 2007-05-11 Sumitomo Chemical Co Radiation sensitive resin composition
JP3733946B2 (ja) 2002-11-19 2006-01-11 Ｊｓｒ株式会社 層間絶縁膜形成用およびマイクロレンズ形成用の感放射線性樹脂組成物
JP4493938B2 (ja) * 2003-06-06 2010-06-30 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターン形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029535A (ja) * 2002-06-27 2004-01-29 Sumitomo Chem Co Ltd 感放射線性樹脂組成物
JP2004139070A (ja) * 2002-09-27 2004-05-13 Sumitomo Chem Co Ltd 感放射線性樹脂組成物

Also Published As

Publication number Publication date
CN101154041B (zh) 2011-11-23
TW200730863A (en) 2007-08-16
CN101154041A (zh) 2008-04-02
KR20070037688A (ko) 2007-04-06
TWI410667B (zh) 2013-10-01
JP2007101763A (ja) 2007-04-19
KR101289163B1 (ko) 2013-07-23

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